Frits Zernike Award

Donis Flagello to receive Frits Zernike Award for Microlithography.

01 January 2017

The 2017 SPIE Frits Zernike Award for Microlithography will be presented in February at SPIE Advanced Lithography to SPIE Fellow Donis Flagello, president, CEO, and COO of the Nikon Research Center (USA).

A prominent member of the microlithography community since the early 1980s and a past symposium chair at SPIE Advanced Lithography, Flagello is being recognized for progress in the understanding and improvement of image formation in optical lithography for semiconductor manufacturing.

Throughout his career, which has included stints at IBM and ASML, Flagello has made contributions mostly focused on the rigorous application of physics to lithography modeling and problem solving.

At IBM’s T.J. Watson Research Center, he developed the first practical test for measuring flare in optical lithography tools and made major contributions to high numerical aperture (NA) modeling of imaging tools, including vector and polarization effects, and radiometric correction.

At ASML in The Netherlands, he helped create a culture to complement data collection for characterizing and specifying lithographic tools. Later, as director of ASML’s Advanced Technology Development Center in Arizona (USA), his leadership resulted in advances in lithography capabilities for ASML tools, and his role in providing analysis of aberrations for new systems and high NA imaging effects due to polarization was critical.

Acquainted with Flagello for more than 30 years, 2006 Zernike Award recipient and SPIE Fellow Timothy A. Brunner noted that Flagello’s contributions to the microlithography industry stand out as one of the key aspects of his career.

“His unusual career trajectory has made a large impact on the technical and the business success of the worldwide microlithography industry,” Brunner said in supporting Flagello for the award.

A second notable aspect of his career, Flagello’s presentations at lithography conferences and papers in various journals, have inspired a better understanding of optics and resist behavior and helped drive optical lithography forward.

SPIE Fellow David M. Williamson, the recipient of the 2007 Frits Zernike Award who also supported giving the 2017 award to Flagello, said Flagello’s conference presentations are known for their “combination of humor with a deep understanding of the complex interactions between physical optics and lithographic process.”

He called Flagello’s theoretical and practical production experience and knowledge rare in the field.

Flagello served on the SPIE Board of Directors from 2009 to 2011. He has an MS and PhD in optical science from University of Arizona (USA).

SPIE presents the Frits Zernike Award annually for outstanding accomplishments in microlithographic technology, especially those furthering the development of semiconductor lithographic imaging solutions.

Learn more about Frits Zernike and the history of the SPIE award.

Read more about SPIE Awards.

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