SPIE Advanced Lithography

The 40th annual symposium will be 22-26 February.

01 January 2015

The 40th annual SPIE Advanced Lithography symposium, 22-26 February in San Jose, CA (USA), features seven complementary conferences covering a full spectrum of lithography and patterning topics. Joint sessions between the conferences offer opportunities to cover topics common across these areas.

  • Extreme Ultraviolet (EUV) Lithography
  • Alternative Lithographic Technologies
  • Metrology, Inspection, and Process Control for Microlithography
  • Advances in Patterning Materials and Processes
  • Optical Microlithography
  • Design-Process-Technology Co-optimization for Manufacturability
  • Advanced Etch Technology for Nanopatterning

Technical events for the more than 2400 attendees from 30 countries include two panel discussions covering current issues in lithography and identifying new ways to complement one technology with another:

  • Nanotechnology in Microlithography Panel Discussion: Preparing for 3D 2.0: Metrology for the Next Wave of 3D Devices
  • Panel Discussion on Dimensional Scaling, Design Optimization, and Metrology: What are we missing?

The 12th Frits Zernike Award for Advances in Optical Microlithography will be presented by SPIE, and three leading researchers will give plenary talks on the latest directions and most promising breakthroughs during Monday's plenary sessions.

Plenary speakers are:

  • SPIE Fellow Alan Willner of the University of Southern California (USA) will discuss the National Photonics Initiative, the announcement in November of a $110 million matching funding commitment from the U.S. Department of Defense for a new Integrated Photonics Institute for Manufacturing Innovation, and other recent successes in advocacy and raising awareness of photonics research. .
  • Tsu-Jae King Liu of University of California, Berkeley (USA) will discuss challenges for transistor scaling and for cost effective 3D integration to sustain the growth of the semiconductor industry.
  • Xiaowei Shen of IBM Research (China) will discuss his research interests in computer architectures, and innovations for big data and cloud computing.

An exhibition at the San Jose Marriott and San Jose Convention Center will be held Tuesday and Thursday, with lithography suppliers demonstrating the latest equipment, software, and techniques in metrology, resist materials, chip fabrication, etch technology for nanopatterning, immersion, RET, and other devices and processes.

Exhibiting companies include ASML, Zeiss, Mentor Graphics, ShinEtsu, TOK, Synopsys, JSR Micro, Tokyo Electron, Physik Instrumente, and Brewer Science.

Symposium chair for SPIE Advanced Lithography is SPIE Fellow Mircea V. Dusa of ASML US Inc. Co-chair is SPIE Fellow Bruce W. Smith from Rochester Institute of Technology (USA).

More information.

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