Harry Levinson plenary presentation: Evolution in the Concentration of Activities in Lithography

Presented at SPIE Advanced Lithography 2016

03 March 2016

Harry Levinson, Senior Director at GLOBALFOUNDRIES, reviews the history of multiple concentrations of activities in lithography. "Advancement doesn't happen at a uniform pace," he says. "Instead, we see periods of intense advancements."

Beginning with the early era of more practical lithographic solutions, like the invention of pellicles and reducing edge bead with beveled edges, Levinson takes the audience on a journey through decades of development spurts reflected in the literature from the SPIE Advanced Lithography conference.

From the Fred Dill paper in the mid-'70s, to Alexander Starikov's 1989 serifs paper, Obert Wood's personal notes in 1992, and LaFontaine's 2008 demonstration of EUV, Levinson shows how successive concentrations of work on simulation and modeling, RET, OPC, lithography-design co-optimization, and EUV have characterized their times and built on preceding advances.

All of this prior experience will be drawn upon as we move toward technologies where meso-molecular and molecular-level length scales are significant. Issues at the molecular scale will need to be addressed to realize the optical resolution "entitlement" of EUV lithography.

Levinson spent most of his career working in the field of lithography, starting at AMD. He then spent some time at Sierra Semiconductor and IBM before returning to AMD -- now GLOBALFOUNDRIES -- in 1994. During the course of his career, he has applied lithography to many different technologies, including bipolar memories, 64Mb and 256Mb DRAM development, the manufacturing of applications-specific integrated circuits, thin film heads for magnetic recording, flash memories and advanced logic. He is a Fellow of SPIE.

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