New Lithography Meeting

With Taiwan accounting for 17% of the global photonics market and Asia now accounting for a major portion of microelectronics manufacturing, the first SPIE Lithography Asia symposium promises to be a rich marketplace of ideas.

The new SPIE symposium, 4-6 November in Taipei, Taiwan, will host five conferences on the latest developments in microlithography techniques, nanofabrication, resist materials, process control, and semiconductor manufacturing.

The conference is chaired by Alek C. Chen of ASML Taiwan Ltd., with co-chairs Burn Lin and Anthony Chen, both from Taiwan Semiconductor Manufacturing Co. Ltd.

Plenary Speakers

Wen-yi Lin, director of L6A Fab, the main TV manufacturing facility at AU Optronics, whose article on LCD technology challenges is featured elsewhere in this issue, will give a plenary presentation on "Recent advancements and future challenges of photolithography of TFT-LCD for display applications" on Tuesday, 4 November.

Other plenary speakers include Jack Sun, vice president of research and development at Taiwan Semiconductor Manufacturing Corp., and Bill Arnold, chief scientist at ASML, whose lithography article is also featured in the October 2008 issue of SPIE Professional.

Courses relevant to the conference program and to the lithography industry will also be offered to conference attendees.

A poster session and reception at 6 p.m. on 4 November is open to all attendees. 

For more information, visit the SPIE Lithography Asian-Taiwan symposium site.