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SPIE Professional January 2009

SPIE Advanced Lithography

Industry Issues to Be Addressed

 

SPIE Advanced Lithography, the foremost annual forum of the lithography community, will bring worldwide experts working in EUV, smart metrology, resist materials, processing technology, semiconductors, and related technologies to San Jose, CA, 22-27 February.

The event, now in its 34th year, is expected to draw more than 4,000 attendees to the San Jose Convention Center and Marriott Hotel.

“For the past 33 years, SPIE Advanced Lithography has played a key role in bringing the lithography community together to solve challenges required by the semiconductor industry,” says Christopher J. Progler of Photronics Inc., the 2009 symposium chair. “If you can attend only one conference this year, SPIE Advanced Lithography is the obvious choice, as it brings the whole community to one place to solve today’s problems and plan for the future.”

Indeed, numerous experts will discuss the future of this changing industry in several panel discussions during the week. SPIE members receive registration discounts for the symposium and are invited to special networking events such as the SPIE Women in Optics lunch at 12 noon on Tuesday and a student networking lunch on Wednesday.

Three top industry leaders will give plenary presentations Monday morning on business models, the effect of Moore’s Law on photovoltaics and other technologies, and embedded electronics:

Lisa T. Su, senior vice president and CTO for Freescale Semiconductor, Inc., presents “Embedded Electronics and the Semiconductor Industry”

Gilad Almogy, senior vice president and general manager for the Display and Thin-Film Solar Products Business Group, Applied Materials, Inc., presents “Moore’s Law Extension: From Integrated Circuits to Flat Panel Displays and Photovoltaic Solar Power”

Bernard S. Meyerson, vice president for Strategic Alliances and CTO for IBM Systems and Technology Group, presents “Semiconductor Technology: A Convergence of Technology and Business Models”

Technical papers will be presented in five conferences:

• Alternative Lithographic Technologies

• Metrology, Inspection, and Process Control for Microlithography

• Advances in Resist Materials and Processing Technology

• Optical Microlithography

• Design for Manufacturability through Design-Process Integration

In addition to the technical program, an exhibition featuring about 100 companies involved with lithography will run Tuesday and Wednesday during the week. Companies will show the latest technologies for applications and systems in:

• Lithography: immersion, double patterning, e-beam, EUV, optical/laser, RET

• Metrology, inspection, OPC, and process control

• Electronic imaging components, equipment, and systems

• Resist materials and processing

• Design for Manufacturability/DPI

• IC and chip fabrication/DPI

A suite of 21 professional development courses and workshops will be offered on topics ranging from lithography and semiconductor fundamentals to emerging techniques and approaches, at introductory, intermediate, and advanced levels.

Four panel discussions with lithography industry leaders will explore metrology, reticles, nanotechnology, Moore’s law, and other challenges to this evolving industry during the week:

• 7:30 p.m. Monday, “The Future: Where Will Reticles Be by the End of 2013?” by the BACUS Technical Group

• 7 p.m. Tuesday, “Is the End of CMOS Near? Nanotechnology Alternatives to CMOS Scaling”

• 6:30 p.m. Wednesday, “Design for Manufacturability”

• 3:30 p.m. Thursday, “Global Collaboration in Reference Metrology”

• 7 p.m. Thursday, “Shaping Up: Frontiers and Challenges in Contour Metrology” by NIST

Several Best Paper presentations will be made, and technical papers will be published in the SPIE Digital Library (spiedigitallibrary.org) immediately as approved following the event. During the week, SPIE will also be providing daily news summaries at spie.org/al.

Registration and other information are available at spie.org/al.


Lithography Updates In SPIE Professional And SPIE Newsroom

Keep up with the latest research developments, news, and discussions about optical lithography in SPIE Professional magazine and the SPIE Newsroom.

For a recent discussion about future challenges for the lithography industry, see the October 2008 issue of SPIE Professional.

Articles in the October 2008 issue of SPIE Professional magazine:

  • Fab Future? Litho Guru Chris Mack takes a dim view of lithography remaining a top dog in semiconductor manufacturing.
  • Fab Expectations: Bill Arnold of ASML is optimistic that future semiconductor manufacturing will be “litho friendly.”
  • Sensitive Photoresists: Studies of photoresist sensitivity for EUV lithography have major implications for semiconductor manufacturing.
  • LCD Challenges: The manufacture of LCD displays has challenges to overcome to increase production and reduce price.

Sign up for free monthly e-alerts on lithography topics at the SPIE Newsroom (spie.org/newsroom) and receive technical articles and news headlines about microlithography, nanolithography, and fabrication.

The SPIE Newsroom contains numerous concise reports on technical developments written by those doing the research, all for free. The online news site also offers industry news, product announcements, and multimedia content such as video interviews with researchers and newsmakers and Webinars on technical topics. The content is keyword-searchable and continually updated. See spie.org/news-micro.

In addition, there is an SPIE.TV Micro/Nano Lithography channel in the SPIE Newsroom where you can watch presentations from past years at SPIE Advanced Lithography, access workshops on the latest techniques, and learn more about EUV, double patterning, and immersion from top experts in video interviews. Cost for Webcasts varies. See SPIE.TV


Lithography Journal: Journal of Micro/Nanolithography, MEMS, and MOEMSl

The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) is published quarterly by SPIE and contains peer-reviewed papers on the development of lithographic, fabrication, packaging, and integration technologies. Edited by Burn J. Lin of Taiwan Semiconductor Manufacturing Co., JM3 publishes state-of-the-art research addressing the needs of the electronics, micro-optoelectromechanical systems, and photonics industries.

Key topics include optical lithography, RET, metrology, binary and phase-shifting mask technology, etching, patterning, and plating technologies, and antireflection coatings. spie.org/jm3


Have a question or comment about this article? Write to us at SPIEprofessional@spie.org. 


DOI: 10.1117/2.4200901.09

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