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SPIE Professional January 2017

Latest microlithography developments at SPIE Advanced Lithography 2017

logo for SPIE Advanced LithographyThe 42nd annual SPIE Advanced Lithography symposium held in San Jose, CA (USA), 26 February through 2 March, will feature seven conferences covering state-of-the-art lithographic topics, 14 courses led by recognized experts from industry and academia, three plenary presentations on the latest developments in lithographic technology, and an exhibition featuring over 35 companies.

The seven conferences at SPIE Advanced Lithography are on:

  • extreme ultraviolet (EUV) lithography
  • emerging patterning technologies
  • metrology, inspection, and process control for microlithography
  • advances in patterning materials and processes
  • optical microlithography
  • design-process-technology co-optimization for manufacturability
  • advanced etch technology for nanopatterning

Technical events include two poster sessions and a panel discussion on microlithography nanotechnologies for the “end” of Moore’s law. Moderators for the panel are Bryan M. Barnes and R. Joseph Kline of the National Institute of Standards and Technology (USA) and An Chen of Semiconductor Research Corp. (USA).

Optical lithography has always been a critical enabler of Moore’s law. By shrinking the size of features that can be printed on a wafer and improving the accuracy with which they are overlaid on each other, the number of transistors packed into a given area can be increased.

If the transistor density grows faster than the cost of processing the wafer, the result is lower cost per transistor.

Fifty years of Moore’s law has resulted in a drop in the cost of a transistor by a factor of over 1 billion as feature sizes have dropped from 25 microns to 25 nanometers.

PLENARY SPEAKERS ARE INDUSTRY EXPERTS

The three plenary speakers who will share developments and new directions of lithographic technology are:

  • Frank Abboud, a vice president at Intel mask operations (USA), discussing photomask challenges for upcoming technology node.
  • Ben “Bin-Ming” Tsai, CTO of KLA-Tencor (USA), discussing photolithography for the sub-10nm nodes
  • Nobu Koshiba, president and CEO of JSR Corp. (USA), discussing materials innovation

The plenary session on Monday, 27 February, will also include the presentation of the 2017 SPIE Frits Zernike Award to SPIE Fellow Donis Flagello, president, CEO, and COO of the Nikon Research Center (USA). See separate article on the Zernike Award.

The exhibition will be open in the San Jose Convention Center on Tuesday 28 February and Wednesday 1 March.

Symposium chair for SPIE Advanced Lithography is SPIE Fellow Bruce W. Smith from Rochester Institute of Technology (USA). Cochair is SPIE Fellow Will Conley of Cymer (USA).

Papers from SPIE Advanced Lithography will be published in the Proceedings of SPIE and available via the SPIE Digital Library.

The Proceedings are indexed in Web of Science, Scopus, Ei Compendex, Inspec, Google Scholar, Astrophysical Data System (ADS), DeepDyve, ReadCube, CrossRef, and other scholarly indexes, and are widely accessible to leading research organizations, conference attendees, and individual researchers.

Learn more about SPIE Advanced Lithography 2017.


DOI: 10.1117/2.4201701.30

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