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SPIE Professional July 2016

Photomask makers meet in September

logo for SPIE Photomask Technology SPIE Photomask Technology, the annual forum for mask-making technologies used in computer chip manufacturing, will be held 12-14 September in San Jose, CA (USA).

The conference features a keynote presentation from SPIE Fellow Christopher Progler, CTO and vice president of strategic planning at Photronics (USA). The title of his talk is "Make Lithography Great Again," which Progler says is not meant to imply or encourage endorsement of any particular political candidate.

photo of Chris ProglerProgler says he will take a cue from the title of a song written during the American Great Depression, "Brother, Can You Spare a Dime?" and devote his talk to a consideration of ways in which an incremental investment — so called found money — might be deployed to address emerging trends in lithography.

He will bring the song title up to date by accounting for inflation and semiconductor investment multiples to yield a conversion of 1 cent = $1 billion. That is, "Brother, Can You Spare $10 Billion?"

Symposium chair is SPIE member Bryan Kasprowicz of Photronics. Cochair is SPIE member Peter Buck of Mentor Graphics (USA).

In addition to numerous technical presentations, the event features a panel discussing the impact on photomask manufacturing of full-scale curvilinear inverse lithography technology for optical proximity correction; two evening poster sessions; best student paper awards; and invited talks from SPIE Fellow Luigi Capodeici, CTO of Knot Prime (USA), and Rama Divakaruni of IBM Research (USA).

The SPIE Photomask Technology exhibition will be 12-13 September in the San Jose Convention Center.

Papers from the conference will be published in the Proceedings of SPIE and available via the SPIE Digital Library, the world's largest collection of optics and photonics research.

The Proceedings are indexed in Web of Science, Scopus, Ei Compendex, Inspec, Google Scholar, Astrophysical Data System (ADS), DeepDyve, ReadCube, CrossRef, and other scholarly indexes, and are widely accessible to research organizations, conference attendees, and individual researchers.

Find more information on SPIE Photomask Technology.

DOI: 10.1117/2.4201607.29

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