• Individual Members
  • Early Career Members
  • Student Members
  • Corporate Members
  • SPIE Professional Magazine
  • SPIE Professional Archives and Special Content
    Contact SPIE Professional
    Photonics for a Better World
    Open Access SPIE Professional
    Entrepreneurs SPIE Professional
  • Visiting Lecturers
  • Women In Optics
  • BACUS Technical Group
Print PageEmail Page
SPIE Professional October 2014

40th year for SPIE Advanced Lithography

SPIE Advanced Lithography, 22-26 February 2015 in San Jose, CA (USA), will celebrate its 40th year as one of the top forums for presenting interdisciplinary research on state-of-the-art lithographic tools, optical metrology, design-process technology for chip manufacturing, and related technologies.

More than 2300 lithography experts from 30 countries are expected at the 2015 symposium, where seven conferences will cover traditional and alternative lithographic technologies, extreme ultraviolet lithography, and other tools to meet the challenges presented by the continuous scaling of the semiconductor industry.

Participants come from a broad array of backgrounds to share and learn about state-of-the-art lithographic tools, resists, metrology, materials characterization, etch, design, and process integration.

Also, through a series of provocative panel discussions and seminars, the symposium probes current issues being faced in the semiconductor industry in extending technologies such as immersion patterning and EUV lithography; switching to alternative technologies such as directed self-assembly; or identifying ways to complement one technology with another.

Chaired in 2015 by SPIE Fellow Mircea Dusa of ASML US, SPIE Advanced Lithography will also include an exhibition 24-25 February at the San Jose Marriott and Convention Center.

Co-chair is SPIE Fellow Bruce W. Smith of Rochester Institute of Technology (USA).

More information on SPIE Advanced Lithography: spie.org/AL.

DOI: 10.1117/2.4201410.28

Ready for the benefits of individual SPIE membership?
Join or Renew
Already a member? Get access to member-only content.
Sign In

October 2014 Advertisers

        Applied Optics Research

 American Elements

 DRS Technologies

Optimax logo

Photon Engineering logo

logo for Software Spectra

Synopsys logo

University of Rochester logo 

Build visibility in the optics and photonics community and reach a highly qualified audience by advertising in SPIE Professional

Official IYL Media Partner

logo, IYL

SPIE Professional supports the NPI

NPI supporter badge

Like SPIE on Facebook

SPIE Facebook page

The SPIE Facebook page is a great place to find and share news on optics programs and photonics events.