• Individual Members
  • Early Career Members
  • Student Members
  • Corporate Members
  • SPIE Professional Magazine
  • SPIE Professional Archives and Special Content
    Contact SPIE Professional
    Photonics for a Better World
    Open Access SPIE Professional
    Entrepreneurs SPIE Professional
  • Visiting Lecturers
  • Women In Optics
  • BACUS Technical Group
 
Print PageEmail Page
SPIE Professional January 2014

Seeking alternative technologies at SPIE Advanced Lithography

Logo for Advanced Lithography

Hybrid and other “alternative” technologies for faster, smaller, and cheaper chips required by the semiconductor industry will be highlighted at SPIE Advanced Lithography, 23-27 February in San Jose, CA (USA).

The annual symposium will include seven complementary conferences as well as panel discussions, seminars, and an exhibition devoted to applications, tools, patterning materials, and topics related to EUV lithography, metrology for microlithography, and alternative lithographic techniques.

The SPIE event provides a forum for industry and academic experts in all areas of lithographic patterning technology who are challenged with cost-effectively extending lithography to the next node while also striving to bring newer technologies to production readiness.

Conference sessions on EUV lithography will likely have the most presentations this year; however, the growing number of papers reporting advances in optical (non-EUV) and next-generation lithography (NGL), metrology, and inspection illustrate the interest in directed self-assembly (DSA), smart resists, and combinations of novel lithographic techniques in chip manufacturing of the future.

The all-conference plenary session will open with a talk from 2013 SPIE President William H. Arnold, chief scientist and vice president of ASML’s Technology Development Center. Other plenary speakers are:

  • Joseph Sawicki, vice president and general manager of the Design-to-Silicon division at Mentor Graphics, will discuss advances in electronic design automation (EDA) and working with patterns throughout the design and manufacturing flow.
  • Akihisa Sekiguchi, corporate vice president and deputy general manager at Tokyo Electron Ltd. (TEL), will give a talk on the future and alternative forms of scaling.

Special events include the announcement of the 2014 Frits Zernike Award for advances in optical microlithography, discussions on nanotechnology and managing EUV masks, and a panel discussion on non-EUV solutions.

Among the 13 courses offered onsite are new ones on computational lithography and management of metrology toolset.

SPIE Fellows Harry J. Levinson of GLOBALFOUNDRIES and Mircea V. Dusa of ASML US are symposium chair and co-chair, respectively.

Read more about SPIE Advanced Lithography.


DOI: 10.1117/2.4201401.30

Ready for the benefits of individual SPIE membership?
Join or Renew
Already a member? Get access to member-only content.
Sign In

SPIE Professional supports the NPI

NPI supporter badge


January 2014 Advertisers

        Applied Optics Research

 American Elements

Photon Engineering logo

logo for Software Spectra

Synopsys logo 

Build visibility in the optics and photonics community and reach a highly qualified audience by advertising in SPIE Professional


Like SPIE on Facebook

SPIE Facebook page

The SPIE Facebook page is a great place to find and share news on optics programs and photonics events.