Experts in EUV lithography, biomimicry, 3D metamaterials, MEMS sensors, IR detectors, signal processing, optogenetics, patent law, personalized medicine, functional MRI, and other medical imaging technologies are among the top speakers at several SPIE symposia in the first half of the year.
SPIE organizes and sponsors approximately 25 major technical forums, exhibitions, and education programs every year in North America, Europe, Asia, and the South Pacific to advance light-based technologies and foster collaboration among researchers and industry. Most plenary and keynote talks at meetings are free to attendees.
SPIE Photonics West and IS&T/SPIE Electronic Imaging start off the year in early February with nearly 20 plenary talks and numerous keynotes focused on lasers, biophotonics, optoelectronics, advanced imaging systems, nano-optics, and other optics and photonics topics. See below for information on speakers at those meetings.
SPIE Medical Imaging, 9-14 February in Lake Buena Vista, Florida (USA), will offer nine keynote talks in addition to a plenary session on volumetric analyses in the interpretation of computed tomography data by Geoffrey Rubin of Duke University Medical Center (USA).
Keynote speakers discussing various aspects of medical imaging are:
- Miguel Eckstein, Univ. of California, Santa Barbara (United States)
- Akira Saito, NEC Corp. (United States)
- Steven J. Schiff, The Pennsylvania State Univ.
- Peter A. Bandettini, National Institute of Health (United States)
- Dorin Comaniciu, Siemens Corporate Research (United States)
- Chris L. de Korte, Radboud Univ. Nijmegen Medical Ctr. (Netherlands)
- Jørgen Arendt Jensen, Technical Univ. of Denmark (Denmark)
- Nassir Navab, Technische Univ. München (Germany)
- Heinz U. Lemke, Computer Assisted Radiology and Surgery (Germany)
SPIE Advanced Lithography 2013
Also in February, SPIE Advanced Lithography 2013 will have three plenary speakers, including Charles Szmanda, a patent attorney from Massachusetts (USA) who works closely with electronics and semiconductor companies. Szmanda will discuss the new U.S. patent law and how it will affect photonics technology businesses.
According to Szmanda, publishing information about an innovative technology or device at the wrong time can destroy an inventor’s right to get a patent. However, “publishing at the proper time can enhance your competitive position,” he says.
Szmanda will also discuss the new first-to-file system which takes effect 16 March. (See more about the new U.S. patent law in this issue of SPIE Professional.)
Other speakers at SPIE Advanced Lithography, 24-28 February in San Jose, CA (USA), are:
- Bill Siegle, an independent consultant and ASML Advisory Board member (USA)
- Howard Ko, senior vice president and general manager at Synopsys Silicon Engineering Group (USA)
- SPIE President William Arnold, chief scientist at ASML USA
SPIE Smart Structures/NDE 2013
SPIE Smart Structures/NDE returns to San Diego, CA (USA) 10-14 March with five plenary speakers and 10 conferences on such topics as robotics systems, electroactive polymer devices, and nondestructive health monitoring of bridges and other civil and military infrastructure.
Larry Stambaugh, managing director of the Centre for Bioinspiration at the San Diego Zoo will give his plenary talk on the zoo being a resource for innovators working in biomimicry technologies. Other plenary speakers at SPIE Smart Structures/NDE are:
- Karlheinz Bock of Fraunhofer Research Institution for Modular Solid State Technologies EMFT (Germany)
SPIE Defense, Security, and Sensing
Arati Prabhakar, director of the U.S. Defense Advanced Research Projects Agency (DARPA) will be symposium wide plenary speaker at SPIE Defense, Security, and Sensing when it returns to Baltimore, MD (USA), at the end of April.
Prabhakar, a former director of the National Institute of Standards and Technology, has worked in private industry and was also the founding director of DARPA’s Microelectronics Technology Office.
Letitia Long, director of the U.S. National Geospatial-Intelligence Agency, will be the banquet speaker and receive the symposium’s Lifetime Achievement Award.
In addition to plenary talks, the event will have 62 conferences on sensors, detectors, displays, and photonic systems for security, defense, and the environment; a free job fair; three-day exhibition; and 50 courses and workshops for professional development.
SPIE Defense, Security, and Sensing opens 29 April in the Baltimore Convention Center and runs through 3 May.
Three European meetings in April and May
SPIE is organizing three major events in Europe this spring on microtechnologies, optoelectronics, metamaterials, metrology, high-energy lasers, holography, and related topics.
SPIE Optics + Optoelectronics, 15-18 April in Prague, will include the awarding of the 2011 Galileo Galilei Award to Jan Perina (Czech Republic), honorary chairman of SPIE Optics + Optoelectronics since 2007. The exhibition will be 16-17 April at the Clarion Congress Hotel.
Plenary speakers and their topics are:
- Roel Baets, professor at Ghent University (Belgium), silicon photonics as a technology platform for innovation in many markets
- Mikael Kaell, leader of the Bionanophotonics Research Division at Chalmers University of Technology (Sweden), nanoplasmonic antennas for spectroscopy and sensing
- Ed Moses, principal associate director of NIF (USA), status and future plans for the facility
An added attraction will be presentations on the future ELI Beamlines Facility, to be built in Prague.
SPIE Microtechnologies, 24-26 April in Grenoble, France, will have five conferences on such topics as medical microdevices, nanotechnology, smart sensors, MEMS, integrated photonics, and energy harvesting. Symposium chair is Thomas Becker (Germany).
Plenary speakers are Carol Featherston of Cardiff University (UK), Santiago Marco of University of Barcelona (Spain), and Markus Winkler from Fraunhofer Institute for Physical Measurement Techniques (Germany).
SPIE Optical Metrology is 13-16 May and will be co-located in Munich with Laser World of Photonics. Conferences and workshops will address the role of optics and lasers in optical sensors and measurement systems, range imaging, videometrics, autonomic navigation, preservation and restoration of art work, and more.
Wim M.J. Coene of ASML Research (Netherlands) is the plenary speaker for SPIE Optical Metrology. He will discuss challenges in optical metrology for photolithography on Wednesday, 15 May.
A SPIE Student Chapter Leadership Workshop will be held on Sunday, 12 May in conjunction with the event. Students interested in attending should RSVP to email@example.com.