Editor's Recommendation: Journal of Biomedical Optics
Ruikang K. Wang, an editorial board member of the Journal of Biomedical Optics, recommends "Cancer-cell microsurgery using non-linear optical endomicroscopy," published in JBO Letters in October 2010.
Australian researchers Min Gu, Hong Chun Bao, and Jing Liang Li report on near-infrared, laser-based microsurgery as a promising new minimally invasive cancer treatment. Including a video with their article, the authors show how they used a miniaturized nonlinear optical endomicroscope to achieve microtreatment of cancer cells labeled with gold nanorods.
They propose that with the strong photoluminescence of gold nanorods, cancer cells can be imaged and selected for apoptosis and necrosis induction by controlling the laser energy.
Source: Journal of Biomedical Optics 15, 050502 (2010); doi: 10.1117/1.3502566.
Editor's Recommendation: Journal of Nanophotonics
SPIE Fellow Akhlesh Lakhtakia, editor-in-chief of the Journal of Nanophotonics, recommends "Laser emission from self-assembled active photonic crystal matrix," published online in October 2010.
Authors Sunita Kedia, Ramarao Vijaya, Alok Kumar Ray, and Sucharita Sinha have found an inexpensive and quick self-assembly route to fabricate photonic crystals from Rhodamine B dye-doped polymeric colloids.
Each colloid is made from dye-doped polystyrene, thus providing an ordered matrix arrangement for the emitter in the crystal, unlike the standard practice of infiltration of the active medium into the voids of a passive photonic crystal.
The large number of ordered layers yields the high reflectance needed for efficient feedback in a laser oscillator. Both stimulated emission and possible suppression of spontaneous emission were observed.
Source: Journal of Nanophotonics 4, 049506 (2010); doi: 10.1117/1.3506524.
Chris Mack named editor of journal
Lithography expert and SPIE Fellow Chris A. Mack will become editor of the Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) in January 2012.
Mack, adjunct faculty member at the University of Texas at Austin, developed the PROLITH Toolkit™ of lithography simulation and analysis programs and has authored more than 140 technical publications, two books, and several book chapters on lithography. Known as the Litho Guru and the Gentleman Scientist, Mack received the SPIE Frits Zernike Award for Microlithography in 2009.
He will succeed JM3 founding editor Burn Lin of Taiwan Semiconductor Manufacturing Co.
JM3 publishes peer-reviewed papers on the development of semiconductor fabrication, packaging, and integration technologies. It was founded in 2002 and publishes quarterly.
"Since its founding, JM3 has become the preeminent journal in the various fields of microfabrication," Mack says. "I'm thrilled to be continuing the work of Burn Lin and to carry on the tradition of excellence at this journal."
Mack received multiple undergraduate degrees from Rose-Hulman Institute of Technology, a master of science degree in electrical engineering from the University of Maryland, College Park, and a PhD in chemical engineering from the University of Texas.
"We are very pleased that Chris Mack has accepted the position of editor of JM3," said SPIE Publications Committee Chair John Greivenkamp (College of Optical Sciences, University of Arizona). "Dr. Mack is an internationally recognized expert in lithography who brings a wealth of knowledge, insight and enthusiasm that will be a great benefit to the journal and the entire technical community."
Mack began working with lithography while at the Microelectronics Research Laboratory of the National Security Agency. After an assignment to Sematech, he left the NSA and founded FINLE Technologies to commercialize PROLITH, the simulator he had developed to model optical and chemical aspects of photolithography. FINLE Technologies was purchased in 2000 by KLA-Tencor, and Mack served as Vice President of Lithography Technology until 2005.
In addition to being on the faculty at the University of Texas at Austin, Mack frequently writes, teaches, and consults on semiconductor lithography.
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