Conference 11910 > Paper 11910-44
Paper 11910-44

Removal mechanism of cleaning surface organic contaminants on SiO2 sol-gel antireflection film by air low-pressure plasma

On demand starting 12 October 2021

Abstract

The problem of on-line removal of surface organic contaminants of large-aperture optical component in high energy laser systems has not been solved. In this work, an air low-pressure on-line plasma cleaning technique is proposed, which can remove organic contaminants and activate the surface of large-aperture optical component (430mm*430mm ). After air plasma cleaning, the transmittance and damage threshold are restored completely, and the damage of surface structure on optical components are not found. The interaction between air plasma species and organic contaminants was simulated by molecular dynamics to explain the mechanism of removing organic contaminants by air low-pressure plasma.

Presenter

Harbin Institute of Technology (China), China Academy of Engineering Physics (China)
Graduated from Harbin Institute of Technology with a master's degree in Mechanical Manufacturing and Automation in 2019; Graduated from Northeast Agricultural University with a bachelor's degree in Mechanical Design, Manufacturing and Automation in 2017
Presenter/Author
Harbin Institute of Technology (China), China Academy of Engineering Physics (China)
Author
Harbin Institute of Technology (China)
Author
Harbin Institute of Technology (China)
Author
Harbin Institute of Technology (China)
Author
China Academy of Engineering Physics (China)
Author
Xinxiang Miao
China Academy of Engineering Physics (China)
Author
China Academy of Engineering Physics (China)
Author
China Academy of Engineering Physics (China)
Author
China Academy of Engineering Physics (China)