Laser-induced contamination on dielectric coatings in sub-ps MHz regime at 515 nm

Marek Stehlik; Frank Wagner; Janis Zideluns; Fabien Lemarchand; Julien Lumeau; Laurent Gallais

doi:10.1117/12.2598856

12 October 2021 Laser-induced contamination on dielectric coatings in sub-ps MHz regime at 515 nm

Marek Stehlik, Frank Wagner, Janis Zideluns, Fabien Lemarchand, Julien Lumeau, Laurent Gallais

Proceedings Volume 11910, Laser-Induced Damage in Optical Materials 2021; 119101Q (2021) https://doi.org/10.1117/12.2598856
Event: SPIE Laser Damage, 2021, Online Only

Conference Poster

Abstract

Laser-induced contamination (LIC) can lead to optical losses or laser-induced damage on optical components and limits the reliable operation of high repetition rate industrial lasers. In our work, we used MHz sub-ps laser source at 515 nm to test dielectric oxide materials in air environment in terms of LIC formation. We found significant difference in the LIC deposit rate in dependence on coating material and deposition technique. The results could be used for new designs of optical components that will be more resistant to LIC formation.

Conference Presentation

Citation Download Citation

Marek Stehlik, Frank Wagner, Janis Zideluns, Fabien Lemarchand, Julien Lumeau, and Laurent Gallais "Laser-induced contamination on dielectric coatings in sub-ps MHz regime at 515 nm", Proc. SPIE 11910, Laser-Induced Damage in Optical Materials 2021, 119101Q (12 October 2021); https://doi.org/10.1117/12.2598856

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