• Photomask Technology + Extreme Ultraviolet Lithography
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Monterey Conference Center and Monterey Marriott
Monterey, California, United States
15 - 19 September 2019
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Thank you for a great 2019 event, we hope to see you next year

SPIE Photomask Technology + EUV Lithography 2019

It was a great week
This key technical meeting is for mask makers, EUVL, emerging technologies, and the future of mask business. SPIE Photomask Technology and the International Conference on Extreme Ultraviolet Lithography are co-located conferences. 

Download Final Program PDF

Mark your calendar
20-24 Sept. 2020

Two conferences, one location

SPIE Photomask Technology and Extreme Ultraviolet Lithography are collocated in Monterey, California. 

Photomask Technology Extreme Ultraviolet Lithography
Photomask Technology
Design automation and data prep (DFM, OPC, SMO)
Mask write, corrections, process compensation (MPC)
Mask blanks, defects and metrology (materials, process, control)
Mask process (resist, devlop, etch, cleans)
Metrology (CD, placement, AFM, AIMS)
Defects and defect control: inspection, repair, verification strategies, pellicles, in fab
Simulation and imaging: mask transfer to wafer (LER, SWA, surface roughness)
Nanoimprint lithography tools, mask, transfer, and resists
Deep learning mask technology applications
Extreme Ultraviolet Lithography
EUV readiness and insertion in manufacturing
EUV tools, including sources and optics
EUV mask metrology, inspection and lifetime
EUV mask and imaging
EUV mask pellicles
EUV resist materials/process and contamination
EUV process control and stochastics
EUV patterning and process enhancement
EUV lithography extendibility
Learn more about Photomask Technology Learn more about Extreme Ultraviolet Lithography

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