• Photomask Technology + Extreme Ultraviolet Lithography
    Plan to Participate
    Conferences
    Exhibition
    Other Information:
    Sponsors
    SPIE Event Policies
    For Authors and Presenters
    For Exhibitors
Monterey Conference Center
Monterey, California, United States
26 - 30 September 2021
Search Open Calls:    go
Print PageEmail Page

Photomask Technology + Extreme Ultraviolet Lithography 2021

Photomask Technology + EUV Lithography Conference

2021 Call for Papers

Present your research at the premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme UV lithography, and emerging technologies.

A home for your research
As an author, don’t hesitate to submit an abstract. Although much in the world remains uncertain, the one constant is that your work is important. SPIE continues our commitment to providing a forum for information sharing, collaboration, and advancing research that is vital to your community. Prepare your abstract and by doing so you will guarantee that your research is ready to be shared. Find our response to COVID-19 here.

Sign up for email updates

Unless you opt in to receive email from SPIE, you will not be sent info about SPIE Photomask Technology + EUV Lithography. Sign up to stay informed.

Abstracts due
12 May 2021

Author notification
18 July 2021

Online Call for Papers
View 2021 details

Author information
and student grant opportunity

Download the Call for Papers PDF
View the abstract submission guidelines
Read the invitation from the Chairs

Explore the Call for Papers

Present your research at the premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme UV lithography, and emerging technologies.

Photomask Technology Extreme Ultraviolet Lithography
Photomask Technology
Design automation and data prep (DFM, OPC, SMO)
Mask write, corrections, process compensation (MPC)
Mask blanks, defects, and metrology (materials, process, control)
Mask process (resist, devlop, etch, cleans)
Metrology (CD, placement, AFM, AIMS)
Defects and defect control: inspection, repair, verification strategies, pellicles, in fab
Simulation and imaging: mask transfer to wafer (LER, SWA, surface roughness)
Nanoimprint lithography tools, mask, transfer, and resists
Deep learning mask technology applications
Extreme Ultraviolet Lithography
EUV readiness and insertion in manufacturing
EUV tools, including sources and optics
EUV mask metrology, inspection, and lifetime
EUV mask and imaging
EUV mask pellicles
EUV resist materials/process and contamination
EUV process control and stochastics
EUV patterning and process enhancement
EUV lithography extendibility
Learn more about Photomask Technology Learn more about Extreme Ultraviolet Lithography

Proceedings of SPIE

SPIE conference papers are published in the Proceedings of SPIE and available via the SPIE Digital Library, the world’s largest collection of optics and photonics research.  

The Proceedings are indexed in Web of Science, Scopus, Ei Compendex, Inspec, Google Scholar, Astrophysical Data System (ADS), DeepDyve, ReadCube, CrossRef, and other scholarly indexes, and are widely accessible to leading research organizations, conference attendees, and individual researchers. 

Connect with SPIE

#SPIEPhotomaskEUV Facebook Twitter Check out SPIE on Instagram SPIE.tv SPIE LinkedIn

Receive email updates about SPIE Photomask Technology + EUVL

Beautiful, free images to use as a backdrop for zoom or social media