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Free Digital Forum
Online Only
21 - 25 September 2020
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Photomask Technologies + EUV Lithography Digital Forum 2020

SPIE Photomask Technology + EUV Lithography Digital Forum

Participate in the free Digital Forum 21-25 September
The event remains the premier technical meeting for mask makers, EUVL, emerging technologies, and the future of mask business.

Learn the latest through live plenary presentations and on-demand technical talks, and enjoy networking with colleagues through online events. Mark your calendar and plan to connect with your community and advance your research.

Check back often in the weeks ahead as we continue to update the program content.

Register now
 
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Check back often as we continue to update the program

View the details for the Photomask Technologies conference and EUVL conference
Learn more about the 2020 Photomask Technologies and EUVL Exhibition
See the 2020 Plenary Speaker
View the 2020 special events

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Photomask Technology 2020 Chairs

Moshe E. Preil

Moshe E. Preil
KLA-Tencor Corp. (USA)
Conference Chair

Stephen P. Renwick

Stephen P. Renwick
Nikon Research Corp. of America (USA)
Conference Co-Chair

International Conference on Extreme Ultraviolet Lithography 2020 Chairs

Patrick P. Naulleau

Patrick P. Naulleau
Lawrence Berkeley National Lab. (United States)
Conference Chair

Paolo A. Gargini

Paolo A. Gargini
Stanford Univ. (United States)
Conference Chair

Toshiro Itani

Toshiro Itani
Osaka Univ. (Japan)
Conference Chair

Kurt G. Ronse

Kurt G. Ronse
imec (Belgium)
Conference Chair

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