• Photomask Technology + Extreme Ultraviolet Lithography
    Award Winners
    Plan to Participate
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    For Authors and Presenters
    Oral Presentation Guidelines
    For Exhibitors
Monterey Conference Center and Monterey Marriott
Monterey, California, United States
15 - 19 September 2019
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Author and Presenter Information

Follow these instructions to develop a successful abstract, presentation, and manuscript, for presentation at the conference and publication in the Proceedings of SPIE and the SPIE Digital Library.

1.  Review the Technical Program

Abstract Due Date: Late submissions will be considered by the conference chairs. Please contact SPIE Program Coordinator Aron Miller for instructions.

 Submission Guidelines (Conditions for Acceptance, Abstract Instructions, Program Placement, and Publication Information)

Submission Questions? Contact Aron Miller, the Photomask Conference Programs Coordinator.

2. Prepare to Present at the Conference

Presentation Questions? Contact Aron Miller

Present a Better Paper. Take one of these online courses from SPIE:

These courses are free for SPIE Members.

3. Prepare and Submit Your Manuscript  

Manuscript Questions? the SPIE Proceedings Coordinator will be assigned in June 2019.

Important Dates

Post-deadline Abstracts
Submission Instructions

Manuscripts Due
21 August 2019

Browse Defense, Security, and Sensing 2011 papers

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