Thank you for joining us in Monterey
Your participation helped make this an incredible event—the premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme UV lithography, and emerging technologies. We are grateful for the time you spent with us, talking with scientists and engineers to share the spontaneous ideas that only happen when we gather in person.
Save the dates for next year's event: 21 - 25 September 2025
| #SPIEPhotomaskEUV |  |
 |
 |
 |
 |
Watch the recording of this webinar to learn about innovative new optical system designs capable of providing the required Numerical Aperture of 0.55. This next-generation optics consists of a highly flexible illumination system and projection optics with NA 0.55 enabling 8nm half-pitch resolution in all orientations to allow scaling beyond the next decade.
Sign in to or create a free SPIE account to view all past webinar recordings from the photomask and lithography community.
Attend the premier exhibition for mask makers, EUVL, emerging technologies, and mask business. Connect with top suppliers showcasing the newest products, innovations, and latest technologies.
Find ways to learn about the technology, the industry, and make important connections for your future. This event includes special awards, sessions, and grants for students—learn how to attend for free in 2025!
Award recipients from SPIE Photomask Technology + Extreme Ultraviolet Lithography gain the recognition they deserve. Celebrate the important work being done and further help the industry support student participation. View previous recipients; this year's recipients will be shared soon.
