• Photomask Technology + Extreme Ultraviolet Lithography
    Special Events
    For Authors and Presenters
    For Chairs and Committees
    For Exhibitors
Monterey Convention Center and Monterey Marriott
Monterey, California, United States
17 - 20 September 2018
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SPIE Photomask Technology + EUV Lithography 2018 Call for Papers

SPIE Photomask Technology + EUV Lithography Call for Papers, abstracts due 2 May 2018

Present your research at the semiconductor mask industry’s largest and most important annual event.

This is the key technical meeting for mask makers, emerging mask technologies, and EUV lithography addressing a number of critical topics, including current technical issues, emerging technologies, EUVL technology and infrastructure readiness, and future trends.

Abstracts Due
2 May 2018

Author Notification
25 June 2018

Manuscripts Due
22 August 2018

Hotel Reservations
May 2018

2018 Call for Papers is now open

Abstracts due 2 May 2018. Click on a conference below to submit your abstract online:

 • Photomask Technology
 • Extreme Ultraviolet Lithography

Or download the PDF

Download the 2018 SPIE Photomask Technology + EUV Lithography Call for Papers PDF

Two conferences coming together

We are pleased SPIE Photomask Technology and Extreme Ultraviolet Lithography will again be collocated in Monterey, California. 

Photomask Technology Extreme Ultraviolet Lithography
Photomask Technology
  • Computational Lithography
  • Mask Technology
  • Imaging and Emerging Mask Technologies
  • Mask Application
  • Mask Business
Extreme Ultraviolet Lithography
  • Integration in manufacturing
  • Tools, including sources and optics
  • Masks, mask inspection/repair and review
  • Pellicles, mask cleaning and thermal expansion
  • Resist materials/process and contamination
  • Patterning and process enhancement
  • Lithography extendibility
Learn more about Photomask Technology Learn more about Extreme Ultraviolet Lithography

Proceedings of SPIE

SPIE conference papers are published in the Proceedings of SPIE and available via the SPIE Digital Library, the world’s largest collection of optics and photonics research.  

The Proceedings are indexed in Web of Science, Scopus, Ei Compendex, Inspec, Google Scholar, Astrophysical Data System (ADS), DeepDyve, ReadCube, CrossRef, and other scholarly indexes, and are widely accessible to leading research organizations, conference attendees, and individual researchers. 

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