SPIE Scanning Microscopies, a multidisciplinary conference for advancing scanning microscopy technologies and applications. This event brings microscopists from all phase of scanning microscopies (from scanned optics to scanned particle beams) together in a single forum to discuss current research and new advancements in the field.
Many ways to shrink: The right moves to 10 nanometer and beyond Martin van den Brink, President and CTO, ASML
With mobile devices such as smartphones outpacing other market segments, the demand for low-power chips, enabled by continued device shrink, continues to be strong. The semiconductor industry’s drive to innovate is relentless, R&D pipelines are filled, and IC manufacturers have multiple options to continue scaling. This presentation will examine the different technology options for the 10 nanometer node and beyond.
More than 50 presentations in these areas
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Optical, Particle Beam (ion and electron), and Scanned Probe
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Forensics
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Biological and Pharmaceutical
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Food Analysis: Microstructure, Identification, and Counterterrorism
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Environment, Health, and Safety
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Nanofabrication and Nanolithography
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Photomask Imaging, Metrology, and Characterization
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Nanomaterials
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Instrument Calibration, Evaluation, and Standards
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Industrial Semiconductor Applications
Co-located with SPIE Photomask Technology 2014
New in 2014 - SPIE Scanning Microscopies was co-located with SPIE Photomask 2014, the premier worldwide technical meeting for the photomask industry. Two conferences for one registration, plus access to multidisciplinary connections and information.
SPIE Photomask Technology Monterey Conference Center and Monterey Marriott Monterey, California, United States 16 - 18 September 2014
