Print PageEmail Page

    Past Event Overview

    SPIE Photomask Technology 2015

    SPIE Photomask Technology 2015, the premier worldwide technical meeting for mask making, emerging mask technologies, and mask business.

    Review the 2015 Program
     • News and photos
     • Final Technical Program (5 MB PDF)
     • 2015 Exhibition Guide (3 MB PDF)
     • Technical Abstracts (1 MB PDF)
    2015 Keynote Presentation
    Harry J. Levinson

    Lithography and Mask Challenges at the Leading Edge

    Harry J. Levinson 
    Sr. Director Technology Research

    2015 Topics
    Mask Making:
    Mask data preparation • Substrates and materials • Patterning tools and processes • Resist and resist processing • Etch techniques • Metrology • Inspection • Repair • Cleaning, contamination, and haze • Simulation of mask making
    Anamorphic Masks for High-NA EUV:
    Lithograph, OPC, and SMO models • Magnification interactions • Impact of half-field reticles • Stitching for mask making/design
    Emerging Mask Technologies:
    EUV mask making • EUV mask inspection and repair • EUV mask infrastructure • EUV mask application • Nanoimprint mask making • Nanoimprint mask application • Pixelated masks • Alternative mask technologies • Grey-scale masks • Direct-write, ML²
    Mask Business:
    Mask manufacturing control • Mask shop management • Mask management in wafer fabs • Business aspects of masks • Infrastructure challenges
    Co-located with SPIE Scanning Microscopies 2015
    SPIE Photomask Technology is co-located with SPIE Scanning Microscopies 2015, a multidisciplinary conference for advancing scanning microscopy technologies and applications. Two conferences for one registration, plus access to multidisciplinary connections and information.
    SPIE Scanning Microscopies
    Monterey Conference Center and Monterey Marriott
    Monterey, California, United States
    29 September - 1 October 2015


    SPIE logo