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    Past Event Overview

    SPIE Photomask & Scanning Microscopies Final Program PDF

    SPIE Photomask Technology 2014, the premier worldwide technical meeting for the photomask industry. We look forward to SPIE Photomask Technology 2015.

    Registration pricing and details View registration pricing and details
    2014 Program Overview
    Final Technical Program (3 MB PDF)
    Technical Abstracts (300 KB PDF) Photomask only
    Press Release and Event Photos

    Keynote Presentation

     Martin van den Brink, President and CTO, ASML

    Many ways to shrink: The right moves to 10 nanometer and beyond
    Martin van den Brink,
    President and CTO, ASML

    With mobile devices such as smartphones outpacing other market segments, the demand for low-power chips, enabled by continued device shrink, continues to be strong. The semiconductor industry’s drive to innovate is relentless, R&D pipelines are filled, and IC manufacturers have multiple options to continue scaling. This presentation will examine the different technology options for the 10 nanometer node and beyond.

    More than 70 presentations in these areas
    Mask Making:
    Mask data preparation • Substrates and materials • Patterning tools and processes • Resist and resist processing • Etch techniques • Metrology • Inspection • Repair • Cleaning, contamination, and haze • Simulation of mask making
    9-inch Glass:
    Impact of 450mm wafers on reticle and infrastructure • Tool developments to support larger blanks • Material developments
    Emerging Mask Technologies:
    EUV mask making • EUV mask inspection and repair • EUV mask infrastructure • EUV mask application • Nanoimprint mask making • Nanoimprint mask application • Pixelated masks • Alternative mask technologies • Grey-scale masks • Direct-write, ML²
    Mask Business:
    Mask manufacturing control • Mask shop management • Mask management in wafer fabs • Business aspects of masks • Infrastructure challenges
    Co-located with SPIE Scanning Microscopies 2014
    New in 2014 - SPIE Photomask Technology was co-located with SPIE Scanning Microscopies 2014, a multidisciplinary conference for advancing scanning microscopy technologies and applications. Two conferences for one registration, plus access to multidisciplinary connections and information.
    SPIE Scanning Microscopies
    Monterey Conference Center and Monterey Marriott
    Monterey, California, United States
    16 - 18 September 2014


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