Print PageEmail Page

    Past Event Overview

    Monterey, home of Photomask Technology

    Thanks to everyone who joined us at the 2013 conference and exhibition.
    We look foward to seeing you at SPIE Photomask 2014.

    2013 Program Overview
    Final Technical Program (PDF 1.6 MB)
    Technical Abstracts (PDF 1.0 MB)
    Photomask Presentation Topics
    Mask Making:
    Mask data preparation • Substrates and materials • Patterning tools and processes • Resist and resist processing • Etch techniques • Metrology • Inspection • Repair • Cleaning, contamination, and haze • Simulation of mask making
    9-inch Glass:
    Impact of 450mm wafers on reticle and infrastructure • Tool developments to support larger blanks • Material developments
    Emerging Mask Technologies:
    EUV mask making • EUV mask inspection and repair • EUV mask infrastructure • EUV mask application • Nanoimprint mask making • Nanoimprint mask application • Pixelated masks • Alternative mask technologies • Grey-scale masks • Direct-write, ML²
    Mask Business:
    Mask manufacturing control • Mask shop management • Mask management in wafer fabs • Business aspects of masks • Infrastructure challenges





    SPIE logo