San Jose Convention Center
San Jose, California, United States
23 - 27 February 2020
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Join the premier event for the lithography community

SPIE Advanced Lithography 2020

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Check the conference lineup frequently to stay up to date. As the leading global lithography event, the technical program will focus on works in optical lithography, metrology, and EUV. Leaders come to solve challenges in lithography, patterning technologies, and unique materials, while sharing the latest advancements in the semiconductor industry. 

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Post-Deadline Abstracts
Submission Instructions

Manuscripts Due
29 January 2020

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2020 Conference topics

SPIE Advanced Lithography 2020 call for paper topical areas
• Extreme Ultraviolet (EUV) Lithography
• Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS
• Metrology, Inspection, and Process Control for Microlithography
• Advances in Patterning Materials and Processes
• Optical Microlithography
• Design-Process-Technology Co-optimization for Manufacturability
• Advanced Etch Technology for Nanopatterning

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