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San Jose Convention Center
San Jose, California, United States
23 - 27 February 2020
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Join the premier event for the lithography community

SPIE Advanced Lithography 2020

Review the program
Check the conference lineup frequently to stay up to date. As the leading global lithography event, the technical program will focus on works in optical lithography, metrology, and EUV. Leaders come to solve challenges in lithography, patterning technologies, and unique materials, while sharing the latest advancements in the semiconductor industry.

Registration will open in November. 

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Important Dates

Abstracts due
30 August 2019

Author Notification
21 October 2019

Hotel Rates Available
16 October 2019

Manuscripts Due
29 January 2020

Registration Increase
7 February 2020

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2020 Conference topics

SPIE Advanced Lithography 2020 call for paper topical areas
• Extreme Ultraviolet (EUV) Lithography
• Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS
• Metrology, Inspection, and Process Control for Microlithography
• Advances in Patterning Materials and Processes
• Optical Microlithography
• Design-Process-Technology Co-optimization for Manufacturability
• Advanced Etch Technology for Nanopatterning

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