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San Jose Marriott and San Jose Convention Center
San Jose, California, United States
21 - 25 February 2021
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To the lithography community: thank you for particpating in the 2020 event

SPIE Advanced Lithography 2020

As the primary global lithography event, the SPIE Advanced Lithography technical program focuses on works in optical lithography, metrology, and EUV. Industry and academic leaders come to solve challenges in lithography, patterning technologies, and unique materials, while sharing the latest advancements in the semiconductor industry.

To all 2020 attendees, thank you. You helped make this a successful event, and the knowledge shared amongst colleagues was inspiring. Peruse the photos from the event, read articles posted each day, and check out industry news that was shared − all available on the Event Highlights page. 

Save these dates for SPIE Advanced Lithography next year: 21-25 February 2021

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21-25 February 2021


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2020 Conference topics

SPIE Advanced Lithography 2020 call for paper topical areas
• Extreme Ultraviolet (EUV) Lithography
• Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS
• Metrology, Inspection, and Process Control for Microlithography
• Advances in Patterning Materials and Processes
• Optical Microlithography
• Design-Process-Technology Co-optimization for Manufacturability
• Advanced Etch Technology for Nanopatterning

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