San Jose Convention Center
    San Jose, California, United States
    23 - 27 February 2020
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    The premier event for the lithography community

    Call for Papers for SPIE Advanced Lithography in San Jose, California, USA

    Present and publish your research at SPIE Advanced Lithography 2017, the premier event for the lithography community. For over 40 years, SPIE has brought together industry leaders to solve the latest challenges in lithography, EUV, and patterning in the semiconductor industry.

    Call for Papers 2017
    Late submissions will still be considered for acceptance. Please submit as soon as possible to Pat Wight, SPIE Conference Program Coordinator.
     • See the list below to submit a paper online
     • Download the 2017 Call for Papers PDF (1 MB PDF)

    Conference topics for semiconductor lithography

    Click on the 2017 topics below for more information:
    Extreme Ultraviolet (EUV) Lithography
    Emerging Patterning Technologies
    Metrology, Inspection, and Process Control for Microlithography
    Advances in Patterning Materials and Processes
    Optical Microlithography
    Design-Process-Technology Co-optimization for Manufacturability
    Advanced Etch Technology for Nanopatterning

    SPIE conference papers are published in the Proceedings of SPIE and available via the SPIE Digital Library, the world’s largest collection of optics and photonics research.  

    The Proceedings are indexed in Web of Science, Scopus, Ei Compendex, Inspec, Google Scholar, Astrophysical Data System (ADS), DeepDyve, ReadCube, CrossRef, and other scholarly indexes, and are widely accessible to leading research organizations, conference attendees, and individual researchers. 


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    Important Dates

    Abstracts Due
    28 August 2017

    Author Notification
    23 October 2017

    Manuscripts Due
    29 January 2018


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