• Advanced Lithography
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San Jose Marriott and San Jose Convention Center
San Jose, California, United States
21 - 25 February 2021
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The leading global lithography event

SPIE Advanced Lithography 2021

SPIE Advanced Lithography is the leading event for the lithography community. Share your latest advancements where leaders come to solve challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications.

As we plan for an in-person meeting next year, we recognize that travel conditions are uncertain. SPIE remains committed to providing a forum for information sharing, collaboration, and advancing research. If we determine that we are unable host an onsite meeting, we will host this event as an online Digital Forum. We'll make the determination and will send information about the final format of the event in mid-December.

Please join your community and contribute to our shared effort to advance lithography research by submitting an abstract.

Learn more about our current approach to 2021 events.

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21-25 February 2021

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Registration opens early January

Plan to attend SPIE Advanced Lithography 2021

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Technical programming for the semiconductor community

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Personal instruction from leading experts

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2021 Conference topics

SPIE Advanced Lithography 2020 call for paper topical areas
• Extreme Ultraviolet (EUV) Lithography
• Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS
• Metrology, Inspection, and Process Control for Microlithography
• Advances in Patterning Materials and Processes
• Optical Microlithography
• Design-Process-Technology Co-optimization for Manufacturability
• Advanced Etch Technology for Nanopatterning

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