• Advanced Lithography
    2018 Onsite News
    For Authors and Presenters
    For Chairs and Committees
    For Exhibitors
San Jose Convention Center
San Jose, California, United States
24 - 28 February 2019
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SPIE Advanced Lithography, the leading global lithography event

Register for SPIE Advanced Lithography 2018 in San Jose, California

SPIE Advanced Lithography
Thank you for joining us at the leading global lithography event. We look forward to seeing you in 2019 where we will once again solve challenges in lithography, patterning technologies, and materials for the semiconductor industry.

See what happed in February
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Download the 2018 Final Program PDF
Advanced Lithography 2018 Exhibitors
Paid conference registration includes online Proceedings of SPIE

Call for Papers open in May. Over 200 papers in 2018

600 technical papers in 2017
• Extreme Ultraviolet (EUV) Lithography
• Novel Patterning Technologies
• Metrology, Inspection, and Process Control for Microlithography
• Advances in Patterning Materials and Processes
• Optical Microlithography
• Design-Process-Technology Co-optimization for Manufacturability
• Advanced Etch Technology for Nanopatterning

2018 Plenary speakers

Yan Borodovsky

Yan Borodovsky
Intel Senior Fellow, retired (USA)

G. Dan Hutcheson

G. Dan Hutcheson
CEO and Chairman VSLI Research, Inc. (USA)

Stephen Hsu

Stephen Hsu

Featured Sponsor, Canon

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