2021 Call for Papers; abstracts due 2 September

SPIE Advanced Lithography is the leading event for the lithography community. Share your latest advancements where leaders come to solve challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications.

As we plan for an in-person meeting next year, we recognize that travel conditions are uncertain. SPIE remains committed to providing a forum for information sharing, collaboration, and advancing research. If we determine that we are unable host an onsite meeting, we will host this event as an online Digital Forum. Please join your community and contribute to our shared effort to advance lithography research by submitting an abstract.

Learn more about our current approach to 2021 events.