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San Jose Marriott and San Jose Convention Center
San Jose, California, United States
21 - 25 February 2021
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The leading global lithography event

SPIE Advanced Lithography 2021 in San Jose, California

2021 Call for Papers; abstracts due 2 September

SPIE Advanced Lithography is the leading event for the lithography community. Share your latest advancements where leaders come to solve challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications.

As we plan for an in-person meeting next year, we recognize that travel conditions are uncertain. SPIE remains committed to providing a forum for information sharing, collaboration, and advancing research. If we determine that we are unable host an onsite meeting, we will host this event as an online Digital Forum. Please join your community and contribute to our shared effort to advance lithography research by submitting an abstract.

Learn more about our current approach to 2021 events.

Download Call for Papers PDF >

Abstract Due Date
2 September 2020

Author Notification Date
19 October 2020

Nick Cobb Scholarship
9 October 2020

Information for authors

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Explore the 2021 conference topics

SPIE Advanced Lithography 2021 call for paper topical areas
• Extreme Ultraviolet (EUV) Lithography
• Novel Patterning Technologies
• Metrology, Inspection, and Process Control for Semiconductor Manufacturing
• Advances in Patterning Materials and Processes
• Optical Lithography
• Design-Technology Co-optimization
• Advanced Etch Technology and Process Integration for Nanopatterning

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2020 Proceedings

Proceedings

Did you attend in 2020? Access the papers and presenations. 

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Download the technical program

2020 Program

View the 2020 program to see the papers, special events, and more.

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Watch the plenary presentation

2020 Plenary

Watch the open access recording of the presentation by John A. Rogers.

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Proceedings of SPIE

SPIE conference papers are published in the Proceedings of SPIE and available via the SPIE Digital Library, the world’s largest collection of optics and photonics research.  

The Proceedings are indexed in Web of Science, Scopus, Ei Compendex, Inspec, Google Scholar, Astrophysical Data System (ADS), DeepDyve, ReadCube, CrossRef, and other scholarly indexes, and are widely accessible to leading research organizations, conference attendees, and individual researchers. 

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