On-scanner high-spatial-frequency overlay control using a distortion manipulator

Friso Klinkhamer; Bart Smeets; Theo Thijssen; Francis Fahrni; Wim de Boeij; Mohamed El Kodadi; Thilo Pollak; Wolfgang Emer

doi:10.1117/12.2614031

26 May 2022 On-scanner high-spatial-frequency overlay control using a distortion manipulator

Friso Klinkhamer, Bart Smeets, Theo Thijssen, Francis Fahrni, Wim de Boeij, Mohamed El Kodadi, Thilo Pollak, Wolfgang Emer

Author Affiliations +

Proceedings Volume 12051, Optical and EUV Nanolithography XXXV; 120510K (2022) https://doi.org/10.1117/12.2614031
Event: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States

Abstract

As overlay tolerances tighten node-over-node, the measurement and control of overlay has progressed from the low (spatial) frequent domain toward higher spatial frequencies. At present up to 3rd order in the (non-scanning) slit direction can be addressed on high end systems. With the introduction of an advanced distortion-manipulator on an ArFi immersion scanners a significant improvement in the spatial frequency of overlay control can be achieved. This actuator will now enable at least up to 9th order lens distortion manipulation and control in the (non-scanning) slit direction, with future extendibility to on-the-fly adjustments while scanning. The manipulator setup and distortion control is fully incorporated in the scanner software and allows for lens fingerprint optimization, better dynamic lens heating control, and scanner stability control to maintain overlay performance over time. Also an external scanner overlay optimization interface is made available that enables machine-to-machine matching within the immersion platform as well as for cross-matching to the EUV platform. Via this interface also high spatial-frequent process corrections can be send to the scanner. In this paper, we will show the capability of the scanner-integrated distortion manipulator on abovementioned aspects using on-scanner aberration metrology, and in-resist distortion and overlay metrology.

Conference Presentation

Citation Download Citation

Friso Klinkhamer, Bart Smeets, Theo Thijssen, Francis Fahrni, Wim de Boeij, Mohamed El Kodadi, Thilo Pollak, and Wolfgang Emer "On-scanner high-spatial-frequency overlay control using a distortion manipulator", Proc. SPIE 12051, Optical and EUV Nanolithography XXXV, 120510K (26 May 2022); https://doi.org/10.1117/12.2614031

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