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Conference 12051 > Paper 12051-52
Paper 12051-52

Construction and commissioning of cERL IR-FEL for realizing the EUV-FEL for future lithography

2 March 2022 • 5:30 PM - 7:30 PM PST

Abstract

An ERL-based EUV-FEL can provide EUV power of more than 1 kW for multiple scanners to overcome stochastic effects with a higher throughput. An IR-FEL project started at the KEK cERL in order to develop high-power IR lasers for high-efficiency laser processing, and it can demonstrate proof of concept of the EUV-FEL for future lithography. The IR-FEL was constructed in May 2020 and commissioned in June to July 2020 and in February to March 2021. We will briefly review the EUV-FEL and present the construction and commissioning of the cERL IR-FEL.

Presenter

High Energy Accelerator Research Organization, KEK (Japan)
Norio Nakamura is a professor and a leader of the beam dynamics and magnet group in Accelerator Division VI (light source division) of the Accelerator Laboratory at High Energy Accelerator Research Organization (KEK). He received his Ph. D in Physics from the University of Tokyo in 1987. He worked for the Photon Factory at KEK from 1987 to 1996 and then for the Synchrotron Radiation Laboratory of the Institute for Solid State Physics at the University of Tokyo from 1996 to 2011. He is studying advanced light sources based on accelerators including energy-recovery liniac(ERL)-based FELs.
Presenter/Author
High Energy Accelerator Research Organization, KEK (Japan)
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High Energy Accelerator Research Organization, KEK (Japan)
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High Energy Accelerator Research Organization, KEK (Japan)
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High Energy Accelerator Research Organization, KEK (Japan)
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High Energy Accelerator Research Organization, KEK (Japan)
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High Energy Accelerator Research Organization, KEK (Japan)
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High Energy Accelerator Research Organization, KEK (Japan)
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High Energy Accelerator Research Organization, KEK (Japan)
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High Energy Accelerator Research Organization, KEK (Japan)
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High Energy Accelerator Research Organization, KEK (Japan)