Plenary Event
Welcome and Plenary Presentations
icon_on-demand.svgOn demand | Presented Live 25 April 2022 
Plenary Presentations Introduction of New SPIE Fellows Presentation of the Zernike Award Presented for outstanding accomplishments in microlithographic technology, especially those furthering the development of semiconductor lithographic imaging and patterning solutions. ..//headshots/Levinson-Harry.jpg Harry J. Levinson, HJL Lithography, Saratoga, California, United States, is the 2022 recipient of the SPIE Frits Zernike Award for Microlithography in recognition of his outstanding achievements contributing to our fundamental understanding of advanced lithography process control, especially in the concepts of Image-Log-Slope, Mask defect printability, and thin-film optics optimization. Presentation of the Nick Cobb Memorial Scholarship These plenary presentations sponsored by ../conferencelogo/canon-100.jpg The endless progression of Moore’s law ..//headshots/Van-den-hove-Luv.jpg Luc Van den Hove President & CEO, imec Belgium Today, we are at the dawn of the 5th disruptive innovation wave. This emerging fifth wave, the deeptech wave, builds on the convergence of technologies such as AI, material science, biology, semiconductors … to disrupt virtually every aspect of the physical world we live in. Semiconductors will be the core of many deeptech innovations thanks to their massive integration power, accessible mass production and low cost. To enable these deeptech innovations, Moore’s law will have to continue to address insatiable demands for more computation and more storage. We will realize Moore’s law by a multitude of approaches: continue traditional scaling, new devices, new switches, leverage the use of the third dimension, and paradigm shifts on how to build future systems. The challenges to bring these innovations to the market are huge. Therefore, we will have to approach this evolution through a major ecosystem, bringing together the right companies, the right R&D resources, perform this in leading-edge infrastructure, with the right funding and government support. Luc Van den hove is President and Chief Executive Officer (CEO) of imec since July 1st, 2009. Before holding this position, he was Executive Vice President and Chief Operating Officer. He joined imec in 1984. Under his guidance imec has grown to an organization with a staff of around 4500 people, operating with an annual budget of around 680M€ (2020) and with offices in Belgium, the Netherlands, US, Japan, Taiwan, China and India. Currently, Luc Van den hove is also professor of Electrical Engineering at the University of Leuven. He is also a member of the Technology Strategy Committee of ASML and Member of the board of Proximus. He has authored or co-authored more than 150 publications and conference contributions. He is a frequently solicited speaker on technology trends and applications for nano-electronics at major top conferences. He has presented more than 50 keynote presentations. Luc Van den hove received his Ph.D. in Electrical Engineering from the University of Leuven, Belgium. Does Lithography Still Matter After High NA EUV? ..//headshots/Wong-H-S-Phillip.jpg H.S. Philip Wong Department of Electrical Engineering, Stanford University. United States The semiconductor industry has been extremely successful in integrating discrete components into billion-transistor chips. Future electronic systems will continue to rely on, and increasingly benefit from, the advances in semiconductor technology as they have had for more than five decades. Applications such as AI, machine learning, 5G, and even quantum computing, will not fulfill their promises without the continual advancements of semiconductor technology that is anticipated. Advancement of lithography has always been viewed as one of the most important, if not the most important, technologies that enables generations after generations of semiconductor technologies. With EUV and the upcoming high NA tools, it appears that there will be enough patterning resolution to pattern anything we want, unless we need to carve individual atoms. What is the future of lithography? What problems can lithography solve for the semiconductor industry? I will present industry and technology trends as a seed corn for discussion. H.-S. Philip Wong is the Willard R. and Inez Kerr Bell Professor in the School of Engineering at Stanford University. He joined Stanford University as Professor of Electrical Engineering in September, 2004. From 1988 to 2004, he was with the IBM T.J. Watson Research Center. From 2018 to 2020, he was on leave from Stanford and was the Vice President of Corporate Research at TSMC, the largest semiconductor foundry in the world. Since 2020, he has been the Chief Scientist of TSMC. He is a Fellow of the IEEE and received the IEEE Electron Devices Society J.J. Ebers Award for “pioneering contributions to the scaling of silicon devices and technology.” He served as General Chair of the International Electron Devices Meeting (IEDM), subcommittee chair of the ISSCC, and is currently the Chair of the IEEE Executive Committee of the Symposia on VLSI Technology and Circuits. He is the founding Faculty Co-Director of the Stanford SystemX Alliance – an industrial affiliate program focused on building systems, and the faculty director of the Stanford Non-Volatile Memory Technology Research Initiative (NMTRI).