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SPIE Photomask Technology 2016 photos and highlights

Paul Ackmann and Naoya Hayashi at SPIE Photonics Technology 2016

Paul Ackmann (Global Foundries) presents
the 2016 Lifetime Achievement Award
to Naoya Hayashi (Dai Nippon Printing).
Technology choices at SPIE Photomask Technology 2016

Which technology will will?
Entertainment at the reception
placed the question front and center.

Symposium chairs Bryan Kasprowicz (Photronics, Inc.) and Peter Buck (Mentor Graphics Corporation) congratulated Naoya Hayashi of Dai Nippon Printing Co., Ltd., as the 2016 winner of the 2016 Photomask Lifetime Achievement Award.

Dr. Hayashi was honored for his decades of contribution to the field, including leadership and guidance in developing cooperation between Photomask Japan, SPIE Photomask Technologies, and the Bay Area Chromium Users Society (BACUS). This cooperation has created the most successful avenue for communication of technical advancements in photomask technology, the award citation noted.

Xiaoqing Xu, a PhD candidate in Electrical and Computer Engineering at the University of Texas at Austin, was awarded the 2016 BACUS Scholarship. Xu works under the supervision of David Pan in the UT Design Automation Group, focusing on physical design and design for manufacturability which tackle emerging lithographic and manufacturing constraints in advanced semiconductor technology nodes, with the overarching goal of enabling design‐manufacturing co‐optimization in extreme IC scaling and beyond.

Best Paper Awards were announced following the event, after a vote by steering and program committee members. This year's prizes went to:

  • 1st place: Christof Klein and Elmar Platzgummer, IMS Nanofabrication AG, "World’s first high-throughput multi-beam mask writer" (9985-4)
  • 2nd place: Michael Lercel, ASML Fishkill, and Bryan Kasprowicz, Photronics, Inc., "The costs of masks: hiding or revealing the real solution" (9985-27)
  • 3rd place: Brian Grenon and David Brinkley, RAVE, LLC, "Identification of a new source or reticle contamination" (9985-39).

Best Poster Awards went to:

  • 1st place: Amy Zweber, Global Foundries Inc., et al., "7nm e-beam resist sensitivity characterization"
  • 2nd place: Hyun-Ju Lee, Hanyang University, et al., "Mechanical stress induced by external forces in the extreme-ultraviolet"
  • 3rd place: Shunsuke Ochiai, Yamaguchi University, et al., "Investigation of fabrication process for sub-20nm dense pattern of non-chemically amplified electron-beam resist based on acrylic polymers".

First-place for the Photronics Award, with a $1,000 prize, went to In-Seon Kim, Hanyang University, et al., "Influence of non-uniform intensity distribution of locally deformed pellicle for N7 patterning". Finalists, who each received $500, were:

  • Akihiro Konda, Osake University, et al., "Dependence of dissolution behavior of main-chain scission type resists on molecular weight"
  • Yow-Gwo Wang, University of California, Berkeley, et al., "Phase contrast pupil engineering for EUV actinic pattern inspection"
  • Aamod Shank, University of California, Berkeley, et al., "Feature size dependence of mask topography induced phase effects measured with an aerial imaging tool".

The Zeiss Award, with a $1,000 prize, went to Yow-Gwo Wang, University of California, Berkeley, et al., "Phase contrast pupil engineering for EUV actinic pattern inspection". The award was presented in memory of semiconductor industry leader Oliver Kienzle, who died in 2014.

Emily Gallagher, Principal Member of Technical Staff at IMEC, will step into the role of symposium co-chair for 2017. The event will move back to Monterey, California, co-located with the 2017 International Symposium on Extreme Ultraviolet Lithography. Abstracts are due 27 February.


Photos courtesy Bernd Geh


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