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Exhibition photo gallery

Advanced Lithography Exhibition − Tuesday 28 February − Wednesday 1 March

Featured technologies included:

  • Etch technology for nanoprinting
  • Lithography: immersion, double patterning, e-beam, EUV, optical/laser, and RET
  • Metrology, inspection, OPC, and process control
  • Design and manufacturing software
  • Materials and chemicals
  • Imaging equipment
  • Lasers
  • Resist materials and processing
  • Nano-imprint
  • IC and chip fabrication
  • Nanoscale imaging

...