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SPIE Frits Zernike Award for Microlithography

The SPIE Frits Zernike Award for Microlithography is presented for outstanding accomplishments in microlithographic technology, especially those furthering the development of semiconductor lithographic imaging and patterning solutions. Honorarium $2,000.

Frits Zernike (July 16, 1888 - March 10, 1966) was a Dutch chemist, physicist and mathematician who won the Nobel Prize for physics in 1953 for his invention of the phase-contrast microscope. He discovered that ghost lines that occur to the left and right of each primary line in spectra created by means of a diffraction grating, have their phase shifted from that of the primary line by 90 degrees, leading to his phase contrast technique in microscopy. His orthogonal circle polynomials provided a solution to the optimum 'balancing' problem of aberrations in optical instruments.

Current Winner

Bruce Smith, 2021 Frits Zernike Award winner   Bruce Smith, Rochester Institute of Technology, Rochester, New York, United States, is the 2021 recipient of the SPIE Frits Zernike Award for Microlithography in recognition of his many contributions as a researcher and leader in the microlithography community, and for his achievements in educating an entire generation of engineers who continue to advance academic research and industry understanding.

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Previous Recipients of the SPIE Frits Zernike Award for Microlithography

2020 - Winfried Kaiser
2019 - Obert Wood II, Akiyoshi Suzuki
2017 - Donis Flagello
2016 - Yan Borodovsky
2015 - Ralph Dammel
2014 - Mordechai Rothschild
2013 - David Markle
2012 - John Bruning
2011 - Andrew R. Neureuther
2010 - Marc D. Levenson
2009 - Chris Mack
2008 - Martin van den Brink
2007 - David Williamson
2006 - Timothy Brunner
2005 - C. Grant Willson
2004 - Burn J. Lin

 


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2020 - Winfried Kaiser

The SPIE Awards Committee has made this recommendation in recognition of exemplary contributions to advancing the state-of-the-art lithographic optical systems, including EUV, that have enabled the continuation of Moore's law.

2019 - Obert Wood II

The SPIE Awards Committee has made this recommendation recognition of pioneering contributions to EUV lithography, from conception to the threshold of high volume manufacturing.

2019 -Akiyoshi Suzuki

The SPIE Awards Committee has made this recommendation recognition of his innovative contributions made on all phases of lithography exposure tools from proximity printing, projection steppers, projection scanners, 1X and reduction types, reflective and refractive types, g-line, I-line, 248nm, 193nm, and 13.5nm.

2017 - Donis Flagello

The SPIE Awards Committee has made this recommendation recognition of his efforts in developing the understanding and improvement of image formation in optical lithography for semiconductor manufacturing.

SPIE Profile

2016 - Yan Borodovsky

The SPIE Awards Committee has made this recommendation recognition of his efforts towards the advancement of multi-generational lithography process solutions and as a key contributor of patterning approaches and layout design rules at Intel. 

SPIE Profile

SPIE Newsroom article

2015 - Ralph R. Dammel

The SPIE Awards Committee has made this recommendation recognition of his significant contributions to the development of photoresist, anti-reflective coating, and directed self-assembly materials for semiconductor microlithography.


SPIE Profile

Merck KGaA Press release


2014 - Mordechai Rothschild

The SPIE Awards Committee has made this recommendation recognition of his leadership in programs that have enabled the advancement of nanolithography in the deep‐UV (248nm and 193nm) and the vacuum‐UV (157nm and 121nm).

SPIE Professional 2014

SPIE Profile


2013 - David Markle

The SPIE Awards Committee has made this recommendation in recognition of his pivotal role in the development of numerous lithography tools, including the PerkinElmer Micralign and Micrascan tools and the Ultratech Stepper.

SPIE Professional 2013

SPIE Profile


2012 - John Bruning

The SPIE Awards Committee has made this recommendation in recognition of his vision and leadership in the production of metrology instrumentation for the microelectronics, automotive, and optics industries as well as his work in deep-UV excimer projection lithography, phase-measuring interferometry, and die-to-die mask inspection.

SPIE Professional 2012

SPIE Profile


2011 - Andrew R. Neureuther

The SPIE Awards Committee has made this recommendation in recognition of his work in lithography physics for semiconductor manufacturing, including electromagnetic scattering, optical imaging, resist profile evolution, defect printability, and phase-sifting masks for precision instruments.

SPIE Professional 2011

SPIE Profile


2010 - Marc D. Levenson

The SPIE Awards Committee has made this recommendation recognition of one of the most important developments in lithography resolution enhancement of the last twenty years, the phase shifting mask.

SPIE Press

SPIE Profile