Anaheim Convention Center
Anaheim, California, United States
26 - 30 April 2020
Conference SI112
Dimensional Optical Metrology and Inspection for Practical Applications VIV
Important
Dates
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Abstract Due:
16 October 2019

Author Notification:
20 December 2019

Manuscript Due Date:
1 April 2020

Conference
Committee
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Conference Chairs
Program Committee
Program Committee continued...
  • Gunther Notni, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
  • Kemao Qian, Nanyang Technological Univ. (Singapore)
  • Prem Rachakonda, National Institute of Standards and Technology (United States)
  • Rajesh Ramamurthy, GE Global Research (United States)
  • Edward W. Reutzel, Pennsylvania State Univ. (United States)
  • Brian Simonds, National Institute of Standards and Technology (United States)
  • Lei Tian, Boston Univ. (United States)
  • Yajun Wang, Wuhan Univ. (China)
  • Zhaoyang Wang, The Catholic Univ. of America (United States)
  • Daniel J. L. Williams, Quality Vision International, Inc. (United States)
  • Jiangtao Xi, Univ. of Wollongong (Australia)
  • Jing Xu, Tsinghua Univ. (China)
  • Dongmin Yang, Apple Inc. (United States)
  • Xiangchao Zhang, Fudan Univ. (China)
  • Zonghua Zhang, Hebei Univ. of Technology (China)
  • Aurora A. Zinck, Lockheed Martin (United States)
  • Chao Zuo, Nanjing Univ. of Science and Technology (China)

Call for
Papers
This conference will focus on methods, analysis, and applications of optical metrology and inspection as applied to various industries, with particular emphasis on practical applications for non-optical parts. The field of optical metrology and inspection has grown to wide acceptance for many applications in industry. The advances in machine vision have provided compact, smart camera systems, new cameras and lighting systems, and better ways of communicating with the outside world. Two- and three-dimensional methods have seen wide use in the electronics industry, but have also made advances in traditional areas such as automotive and aerospace metrology and manufacturing. The growth of additive manufacturing methods is demanding new, fast measurement tools for both monitoring the build process as well as checking the final parts. Additive metrology tools are being used for defect inspection, precision measurements, and the monitoring of automated processes. Modern computing power has made analysis methods such as phase shifting a viable tool for fast on-line monitoring and metrology applications.

This conference is intended to address the latest advances and future developments in the areas of optical inspection and metrology as they are applied to practical applications. Imaging and calibration techniques used in industrial automation are also welcome to this conference.
  • machine/robot vision methods, architectures, and applications
  • lighting methods and systems for inspection
  • surface inspection methods and applications
  • special optical systems for inspection and measurements
  • 2D and 3D machine vision methods and applications
  • structured light methods and applications
  • image-based range measurement methods
  • micro- and nano-scale measurement methods
  • interferometric techniques applied to non-optical parts
  • phase shifting methods applied to industrial inspection of non-optical parts
  • optical methods for surface metrology
  • mechano-optics and photonics for metrology and inspection
  • system calibration and error analysis
  • dimensional standards and artifacts
  • 3D data manipulation
  • on-line and process control measurements
  • reverse engineering applications
  • on-machine measurements of shape and finish
  • metrology of additively manufactured parts
  • optical methods for monitoring additive manufacturing
  • high-resolution and high-speed inspection and monitoring applications.
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