This PDF file contains the front matter associated withe SPIE Proceedings Volume 7284, including the Title Page, Copyright information, Table of Contents, Introduction(if any), and the Conference Committee listing.

The change of the thickness of magnetic fluid which modulates light intensity is the display principle of magnetic-fluid microelectromechanical light modulator which has two display states - light state and dark state. As a kind of non-contacting, non-destructive, and real-time testing method, laser speckle technique can be used to character the display process of magnetic-fluid microelectromechanical light modulator. In this paper, during displaying the magnetic-fluid microelectromechanical light modulator, a collimated laser beam is illuminated on it. Meanwhile, a charge-couple device (CCD) camera capable of 480*640 square pixels is used to real-timely record speckle patterns which can be used to character the state of the magnetic-fluid microelectromechanical light modulator, and the time interval of adjacent speckle patterns is 20 ms which is chosen depending on the transition speed the device changes from a dark state to a light state. 160 frames adjacent speckle patterns are chosen to be analyzed. The 80th, 160th, 320th (the middle columns), 480th, and the 640th columns are taken out separately from the chosen speckle patterns to obtain five THSP (Time History speckle pattern) images 480*160 pixels. Based on these five THSP images, the relationship between the change of light intensity and the change of time is got. Change of light intensity with time shows that: the change of light intensity of speckle patterns has a good agreement with the display state of magnetic-fluid microelectromechanical light modulator. laser speckle pattern technique is an efficient way to be applied to real-time test and character modulator. In one word, as for microelectromechanical system (MEMS) test, the laser speckle pattern technique will be a non-contact, real-time, and non-destructive optical method which have a rapid developing speed and a wide application in the future.

In this paper a real-time signal process method is proposed for a new grating-based sensor LDGI (Liner Diffraction Grating Interferometer). The LDGI signal shows much higher frequency than conventional optical encoders. When the grating moves 416nm the LDGI system generates one wave cycle. The waveforms have some typical distortions: DC offsets, amplitude variation and phase error. For real-time measurement, in every millisecond the waveforms are normalized to eliminate DC offsets and amplitude variation. Then the phase error is corrected with an operation of coordinate rotation. After that, with zero-pass counting and phase subdivision the displacement can be worked out. If the displacement is too short to generate a whole wave cycle, which means there are not enough data to work out the signal distortions, an optimization method for sine curve fitting is used to calculate the displacement. If the displacement is shorter than 20nm, a group of empirical values are used in signal process. Experiments show that with the proposed method, the measurement repeatability of LDGI is within 5nm. Especially when this system is used for nanoscale measurement the uncertainty can hardly be detected with a laser interferometer. Besides, the proposed method helps to get higher resolution. Experiments show that the minimum displacement that the system can detect is 1nm.

Microstructure optical components in the form of Fresnel, TIR, microgroove, micro lens array provide a lot design freedom for high compact optical systems. It is a key factor which enables the cutting edge technology for telecommunication, surveillance and high-definition display system. Therefore, the demand of manufacturing such element is rapidly increasing. These elements usually contain high precision, tiny structure and complex form, which have posed many new challenges for tooling, programming as well as ultra-precision machining. To cope with the fast development of the technology and meet the increasing demand of the market, we have developed our own manufacturing process to fabricate microstructure optical components by way of Diamond tuning, Shaping, Raster cutting, Slow Slide Servo (SSS), Diamond milling and Post polishing. This paper is to focus on how we employed these methods to produce complex prototype of microstructure optical components and precision mold inserts which either contains aspheric lens array or freeform V grooves. The high quality finish of these surfaces meets application requirements. Measurement results are presented. Advantages and disadvantages of these methods are compared and discussed in the paper.

How to fabricate high aspect ratio microstructures with high precision has become a very concerned issue. In this paper, the pattern transfer accuracy of proximity lithography is investigated and the related distortion compensation method is presented. According to partial coherent light theory, the propagation of partial coherent light, which is from an extended quasi-monochronmatic source and transferring through the illumination system, is analyzed. And based on the complex degree of coherence for any two points on mask plane, a mathematical model is constructed to analysis the propagation of mutual intensity from mask to photo-resist and the intensity distribution is attained. With the aerial image of mask pattern, the photo-resist profile is simulated. Then the pattern distortion is investigated, especially on the edges and corners of the profile. And a mask optimization method using genetic algorithm is proposed to improve pattern transfer accuracy. Theoretical model indicates an effective way for resist shape distortion analysis and compensation.

Infrared emitter (IR) with photonic crystal structure formed by a hexagonal array of holes has been designed. The processes for fabricating the emitter are developed basing on using silicon-on-insulator (SOI) wafer. The emission spectrum of the IR emitter is measured with spectroradiometer. The experimental results show that the infrared emitter exhibits a strong narrow-band emission in middle infrared range. The wavelengths of the measured emission peaks agree well with the theoretical prediction.

This paper addresses different highly reflective optical coatings on micro mirrors for applications in the NIR-VIS-VUVspectral region. The optimized metal systems are applicable from VUV and DUV up to the NIR spectral region and can be integrated in the technology of MOEMS, such as spatial light modulators (SLM) and micro scanning mirrors (MSM). The developed concepts reconcile high reflectivity and low stress-load, and therefore an improved micromirror planarity. Aluminum-based DUV coatings provide 90% of reflectance at the 157 nm, 193 nm wavelength, and aluminum or silver with dielectric oxide enhanced optical coatings can provide reflectance above 99% for wavelengths at 248 nm, 308 nm, 633 nm and 1064 nm. Thicknesses of all these coatings vary from 200 - 950 nm. Due to the low total thickness and specially optimized deposition process, these highly-reflecting coatings have stresses lower than ± 60 MPa, which are very promising for stress-sensitive substrates, such as micro mirrors. Especially, these highlyreflective low-stress coatings at 1064 nm will enable new applications at high optical power density like laser marking and material treatment. As for the VIS and UV spectral region, metal enhanced HR-coatings have been favored, because they enable high reflectance of up to 99.7 % at 308 nm and 633 nm in combination with low stress, high mirror planarity and CMOS compatibility.

Ion-exchange technique in glass was developed to fabricate gradient refractive index optical devices. In this paper, the Finite Difference Method(FDM), which is used for the solution of ion-diffusion equation, is reported. This method transforms continual diffusion equation to separate difference equation. It unitizes the matrix of MATLAB program to solve the iteration process. The collation results under square boundary condition show that it gets a more accurate numerical solution. Compared to experiment data, the relative error is less than 0.2%. Furthermore, it has simply operation and kinds of output solutions. This method can provide better results for border-proliferation of the hexagonal and the channel devices too.

MEMS technology combines micromachining and integrated circuit fabrication technologies to produce highly reliable MEMS transducers. This paper presents an overview of MEMS transducers applications, particularly in automotive and aerospace industries, which includes inertia sensors for safety, navigation, and guidance control, thermal anemometer for temperature and heat-flux sensors in engine applications, MEMS atomizers for fuel injection, and micromachined actuators for flow control applications. Design examples for the devices in above mentioned applications are also presented and test results are given.

Based on Electro-Optical (E-O) effect, the interferometer is static and polarization-transparent. Using voltage scan to replace mechanical scan modulates the Optical Path Difference (OPD) without movement. Depending on the study of Tymon Barwicz, MIT, a special design makes the interferometer polarization-transparent. A method is given to compensate the optical dispersion of E-O material. In the end, a spectrometer composed of this interferometer is in the 550nm band with spectral resolution up to 1 nanometer.

Pure rutile TiO₂ nanorods are fabricated using TiCl₃ as the predecessor at 180°C for 24h. TiO₂ nanomaterials turn into pure anatase when KF serves as mineralizer and the concentration of KF solution is higher than a proper concentration. It is indicated that the fluorin-ion has a great effect on the phase transition of TiO₂ crysta1. The length and diameter of nanocrystal granules also change when changing the concentration of KF solution. The anatase TiO₂ nanocrystals are synthesized at 150°C for 24h with TiCl₃ and titanate sodium nanotubes as the predecessors at the filling factor of 68%.

In this paper, we present a novel laser direct writing system. Compared with conventional laser direct writing system, there are four key techniques in this system. They are illuminating system, leveling and focusing system, precise position work-stage system and diffractive focusing system. We introduce and analyze the four systems in this paper respectively. Through theoretic analysis and optical lithographic experiment, the results show that it provides a direction of higher resolution and lower cost optical lithographic technology. By proper design the structure of the whole system and the parameters of photon sieve, better resolution can be realized.

For the shortage and limitation of ruled grating that have ghost lines and stray light because of period error and ruling irregularity, a method for making a wavelength division multiplexer (WDM) based on Micro Electro-Mechanical System (MEMS) blazed grating is proposed. The basic composition of WDM based on MEMS blazed grating is introduced according to the method. The process realizing MEMS blazed grating and means for improving diffraction efficiency are also introduced. MEMS blazed grating is numerical simulated and analyzed in laboratory virtual instrument engineering workbench (LabVIEW), the diffraction intensity distribution of blazed grating is presented, it is shown that the blazed grating, period is 2000nm and blazed angle is 20 degree, have the best division effect for light wave with wavelength about 1.55μm by the results. At the same time, the 3D layout of WDM is provided in ZEMAX, and the rays in WDM are traced also. It is indicated by the results when the channel spacing is greater than or equal to 50nm, the division effect is in evidence. It achieves the capability of Coarse Wavelength Division Multiplexing (CWDM). It is proved that MEMS blazed grating can be applied well in WDM by all the results.

A 20× Schwarzschild projection optics (PO) designed for principle experiment of interferometry for extreme ultraviolet lithography (EUVL) is assembled and aligned utilizing a Fizeau-type interferometer. The design goal of the PO is to achieve a wavefront error (WFE) of less than 30mλ rms (λ = 632.8nm ) in an image side field diameter of 0.2mm. This paper presents the detailed design, assembly and alignment procedure of the PO. The PO is designed at 13.4nm wavelength for future EUV at-wavelength experiment and the original design could achieve a resolution of 100nm within a depth of focus of 75nm. Due to fabrication errors, the fabricated PO could only achieve a WFE of 28mλ rms (λ = 632.8nm ) simulated by CODE V in ideal alignment status. Tolerance analysis is performed by CODE V to determine the requirement of assembly mechanism and the tolerance of coarse alignment. In the coarse alignment process, a simple method based on the precise positioning of the curvature center of each mirror in Schwarzschild PO is used. In the fine alignment process, an effective computer aided alignment (CAA) method based on the singular value decomposition (SVD) of sensitivity matrix is used. Finally, alignment experiment is performed and a WFE of 28mλ rms (λ = 632.8nm ) is achieved after fine alignment.

In this paper, the effects of stress on the adhesive behavior of photoresist are described. The sources of internal stress of photoresist could be the shrinkage of photoresist during curing process and the shrinkage difference between the photoresist and the substrate. Due to high exothermicity of resin curing process, the temperature of photoresist is not uniform, which causes shrinkage difference in photoresist. Further more, when the substrate cools down, the difference of thermal expansion coefficients between the substrate and the photoresist would cause more stress. A digital phase-shifting interferometer is used to measure the curvature of substrate and then Stoney´s Formula is adopted to calculate stress. Then, a 2-D model is used to simulate temperature distribution, photoresist deformation and stress. Our results show that there is huge stress at the interface between photoresist and substrate and the stress can be reduced by anneal.

Since atmosphere turbulence has an effect on laser propagation, it causes wavefront error usually , changes intensity and coherence of laser, disturbs detection of lidar. The adaptive optical system has broad application in the field of laser transmission because it can adjust characters of optical system ,detect and correct the wavefront error at the same time. Adaptive optics technology uses deformable mirrors to perform dynamic phase modulation and endow optical system the ability to decrease the influence of dynamic wavefront errors. In this paper ,a correction method of the micro-miniature adaptive optical system based on Micro Electromechanical System (MEMS) technology is proposed by analyzing the working theory of the adaptive optical system. An experimental system including deformable mirror based on Micro Electromechanical System (MEMS) technology is designed to correct a factitious wavefront error.The influence function and voltage-deflection curve are researched, and the voltage control matrix is educed. By using the voltage control , the static wavefront aberration is corrected. Several important capabilities of deformable mirrors is tested. With the voltage control matrix, the corrected capability of the adaptive optical system is achieved successfully .The experimental results show that the adaptive optical system can preferably correct the wavefront error, that has small volume and steady capability, and greatly improve the capability of lidar detection.

Some primary simulation results on a deformable mirror actuated by microfluidic elements are introduced. Thickness of the membrane is determined firstly by the inner pressure of liquid element. The shape change of membrane with single droplet is analyzed. In a deformable mirror model that includes 91 liquid actuation units, the calculation result of several key points shows the mirror deformation capability. Some unfavorable phenomena in the simulation, such as the fragmentation and local outspread of liquid element, are also introduced because they are helpful for further design.

This paper presents an automatic alignment system based on machine vision method. A high-speed gray pattern match algorithms is proposed based on the combination of sequential similarity detection algorithm (SSDA) and multiresolution pagoda structure algorithm (MPSA). A dynamic system calibration model suitable for the algorithm automatic alignment system is established to relate the pixel coordinate in CCD to the physical coordinate, which is based on Tsai's two-step algorithm but with the help of precise positioning of the wafer stage in X-Y directions. A lot of experiments conducted on a machine vision experimental platform confirm that the proposed technique is feasible and effective. The pattern match algorithm is demonstrated to achieve an error less than one-twentieth pixels, while the computation time is shorter than 200ms when using a large pattern image with 320×320 pixels. The absolute alignment error is illustrated to be lower than 200nm within a large field of view of 1mm×1mm after the platform is calibrated using the proposed dynamic calibration method.

The effects of various design and fabrication parameters on the imaging characteristics of a photon sieve are analyzed. Specifically, the focusing characteristics on the focal plane of photon sieves with different arrangement of pinholes in terms of shape, orientation and angle of incidence were investigated using professional optical design software ZEMAX for the first time, which is otherwise difficult to calculate by the exact theory. The fabrication tolerances of different parameters of the photon sieves were evaluated using Monte-Carlo method.

A system-level behavioral model of micro-fuze resonator is accomplished by utilizing integrated design platform for MEMS CAD. Its validity and veracity are verified using both finite element method and theoretical method. The structural parametric design of micro-fuze resonator is finished and the performance parameters are obtained by systemlevel simulation. Results show that system-level method can be applied for the design of other MEMS devices to greatly improve the efficiency, reduce the period and decrease the cost while maintaining a considerable computing accuracy. And the performances of the designed micro-fuze resonator can meet the requirements for common safety system applications.

is paper demonstrates a 2D (two-dimensional) electrostatic MEMS scanning mirror. This scanner rotates on both axis X and Y, giving a two degrees of freedom. Finite element analysis has shown that optical scanning angle on axis X is 5.0° at 120V and axis Y is 4.4°at 160V. The structure has been optimized to achieve good dynamic performance.

Through combination of multi-beam coherent SPPs which are excited by p-polarized wide light which illuminates the interface between prism and metal with resonance angle for interference exposure with, and optimizes exposal parameter of interference lithography, we can obtain high differentiate and high contrast of periodicity nanometer structure by using SPPs of shortwave and near field with enhanced. In this paper,we set up interferential model of SPPs using equation groups of Maxwell below Kretschmann structure, and simulate SPPs interferns and receive nanometer lattice and discuss the influence of refractive index of prism and resist .The method is suitable for fabricating nanometer photonic crystal and deep sub-micrometer periodic patterns in large field size used in opto-eletronical components and it can effectively debase got-up cost.

We report a metallic nanolens that can focus light into region comparable to wavelength. According to the finite different time domain (FDTD) method numerical calculation, it was found that the relative phase of emitting light scattered by surface plasmon in a single subwavelength metallic groove can be modulated by the groove depth. Consequently, the focal length of the slit-groove-based focusing structures can thus be adjusted in certain value if the groove depths are arranged in traced profile. With the regulation of the groove depth profile, it is possible to modify the focus position in the precision of nanoscale without increasing the size of the nanodevice. The numerical simulation results verify that the method is effective for the design of nano-optical devices such as optical microprobes. Advantages of the proposed nanolens are apparent. (i) The element is miniaturized and the modulating the groove depth trace profile would not increase the corrugation area and hence make the element compact, making it an excellent candidate for integrated optics. (ii) The obtained focal length is comparable to the wavelength and the focal width is less than a wavelength, which are difficult to obtain via conventional refractive element. (iii) The element's dimension is subwavelength in thickness, which may prove useful to act as surface device that integrated into other optical and optoelectronic elements.

A localized surface plasmon nanolithography (LSPN) technique using tapered structure is proposed and demonstrated to produce patterns with sub-wavelength feature size. The special masks with periodic taper tips are employed to excite surface plasmon polaritons (SPPs) on the illuminated side, and the SPP waves propagate toward the tips along the taper surface, which causes most of energy accumulation at the tips and gives rise to high local field enhancement in a nearfield region around the tips. Highly efficient nanolithography with sub-50nm feature size has been demonstrated by using the FDTD simulation results at different tip widths, at the same time, the variation of tip angel has been proved to have great influence on transmission efficiency, and also affects the line width.

157nm deep-ultraviolet laser is considered as one of good 3D micro-structuring tools. In this study, a micro-fabrication system based on the 157 nm laser is conducted to micro-structuring experiments of photonic materials. For laser ablation of fused silica, the ablation rate is about 80nm/pulse under laser fluence of 5 J/cm2. A micro-hole array is produced in silica glass chip, and several 3D microstructures are ablated into SMF-28 optical fibers. Experiments and analysis show that, material removal is dominantly photon-chemical process in case of 157nm laser machining.

Organic light emitting diodes (OLEDs) have been paid lots of attention for its potential lighting and display applications. The fabrication of separator to serve the metallic cathode effectively is a crucial process to obtain high resolution OLEDs display panel. In this work, both negative type photoresist photosensitive polyimide and positive photoresist AZ5214 with image reversal characteristic are used to fabricate the cathode separator with an easy-processing photolithography method. The exposure and developing process are simulated, and then the separator pattern with reversal trapezoid profile is fabricated for high resolution devices.

The F-P cavity is the main structure of many optical components which relate to wavelength. From the research of micro-machine F-P cavity based on MEMS technology , we can obtain basic method and technical process of many kinds of MOEMS components for mode selection. In this article, basic structure and basic principle of silicon micro-machine F-P cavity are described. Influence of optical characteristics of the two mirrors on the F-P cavity property is analyzed, including influence of the reflectance of the two mirrors on the insertion loss and working range, the relationship between the F-P cavity length and the mode selection. A kind of method of laser mode selection based on silicon micro-machine F-P cavity is introduced. Through the movement of the elastic membrane as the upper mirror, the cavity length is adjusted, then the optical length of fixing wavelength is changed, the phase difference of different beams is varied, the reflectivity of micro-machine F-P Cavity is changed, so the method of laser mode selection is realized. The experimental process is expatiated in detail. It has advantages of minuteness volume, small insertion loss, high adjustment precision. The method of laser mode selection based on silicon micro-machine F-P cavity has laid firm foundation for the future research of laser mode selection.

DMD used as SLM modulation area array CCD design is proposed in the paper. It can Solve a problem in exposing high-contrast scenes by ordinary CCD camera, with images appearing over-exposure or under exposure, bringing a loss of the details of the photo. The method adoptes a forecast imaging scene, CCD is purposely designed by way of more exposure regions and exposure times. Through modulation function of DMD micro-mirror, CCD is exposed with sub-region and time-sharing, at the same time a purposely designed structure of image data enhances the area CCD dynamic range. Experiments shows: This method not only improves visible quality of an image and clear details in the backlighting or highlight, but also enhances the dynamic range of image data. The high-quality image and high dynamic range data are real-time captured, the "fused" software is no longer required.

Because of the Bragg selectivity of volume holographic gratings, it helps VHI system to optically segment the object space. In this paper, properties of point-source diffraction imaging in terms of the point-spread function (PSF) are investigated, and characteristics of depth and lateral resolutions in a VHI system is numerically simulated. The results show that the observed diffracted field obviously changes with the displacement in the z direction, and is nearly unchanged with displacement in the x and y directions. The dependence of the diffracted imaging field on the z-displacement provides a way to possess 3-D image by VHI.

The fabrication and application of micro- and nanoscale containers and devices are recently attracted much attention. The top profiles of these nanoscale patterns are very important for nano-devices integration. The morphologies of small containers, nanopit and nanopore fabricated with focused ion beam (FIB) milling tool, are explored by atomic force microscopy (AFM). The topography of every pattern looks like a volcano. The protruded ring-shaped structures surrounding the crater are attributed to the swelling due to the amorphization when FIB processed the crystal silicon nitride (Si3N4) substrate. In addition, the morphologies of anodic alumina oxide (AAO) membranes fabricated by anodizing of metallic aluminum are discussed.

An important character of Micro Spectrometer with intelligence is that the spectrometer has the function of quickly qualitative analysis. The key of qualitative analysis is automatic spectral recognition technology. Though many efforts have been made, it is still not very satisfactory in practice because of small-sample and non-linearity of the spectral recognition problem. Support vector machines (SVM ) is gaining popularity as a simple and effective pattern recognition technique that can solve the small-sample and non-linearity learning problem better. The paper discusses support vector machines in the application of automatic spectral recognition, summarizes support vector machines method, puts forward a plan based on SVM and many features according to need of spectral recognition, builds basic model, gives a example to explain in the end.

The interaction between femtosecond laser and silicon nitride crystal film(β- Si₃N₄)was theoretical analyzed and numerical studied in detail with Fokker-Planck (F-P) equation. The F-P equation was studied with the Difference Method which mainly considers that the laser intensity is, distributes in time and space, absorbed by target. In the calculating, the important factors such as the radius of the laser beam r₀ (which is defined as the distance from the center at which the intensity drops to 1/e of the maximum intensity) were 10μm, 30μm and 50μm, the values of the laser fluence were 6.0 J/cm², 9.0 J/cm² and 12.0 J/cm², respectively. The damage threshold and crater shape of Si₃N₄ film under different laser pulse were analyzed. The effect of ablation verse the pulse duration and the laser intensity distributing in time and space were also discussed.

Integral imaging (II) is a technique capable of displaying 3-D images with continuous parallax in full natural color through micro-lens array. II was firstly proposed by Lippmann about one century ago. With recent progress in the theory and micro-lens manufacturing, it is becoming the most practical and prospective 3D display technique in developing next generation three-dimensional TV (3DTV) and visualization fields. Among many problems of II the resolution issue is still the focus. The resolution of the reconstructed 3D image is determined by many parameters. Up to now various factors such as the size and the pitch of lens array, the distance between the apertures, the resolution of the CCD camera and the display device have been analyzed. How the non-ideal display lens array will affect the reconstructed 3-D image in geometrical position and quality is discussed in this paper. The non-ideal display lens array with equal gap and surface refraction in integral image reconstruction are analyzed. The relation between image shift, diffusion length in depth direction and the ideal original position are derived. Analysis results prove that the farther the 3-D image is reconstructed from the lens array, the more significant the image shift and diffusion become. Moreover, a reconstructed 3-D image diffuses in depth direction is more remarkable with the just refractive lens array. Based on the theoretical analysis, preliminary simulated experiments are conducted to confirm our conclusions with optical software ASAP and spot diagram. The results will play an important role in optimum parameters designing and further data processing of the next generation II-based 3DTV.

We design a dual axis rotary mirror based on microelectromechanical system technology used for the endoscopic optical coherence tomography (OCT) application. With the inherent advantages of the micromachined device such as small size, low consumption and high reliability, it allows the miniaturization of conventional bulky OCT probe. The dimension of the micro-mirror is 140um×270um. Through use of finite element method, the simulation results show that the scanning mirror is capable of high frequency out-of-plane rotation in two mutually independent axes. The natural frequencies of the first two modes, corresponding to tip and tilt modes, are 65.74 KHz and 65.75 KHz respectively. The MEMS scanning mirror is electrostatically actuated with the supply voltage ranging from 30v to 40v. Via 2-axis scanning, a three-dimensional image of biological tissue can be acquired when the MEMS mirror is integrated with the OCT probe system. The entire MEMS scanner can be fabricated using the proposed surface-micromachining process, capable of mass production.

A modified spin coating method is utilized to prepare waveguide layers of Love Wave devices. The thickness of PMMA waveguide layer up to 3.0 μm is obtained with a smooth surface. The properties of these sensors, such as, mass sensitivity, insertion loss are studied as a function of layer thickness. Mass sensitivity up to 705cm2g-1 is demonstrated.

this paper, the poly-yne poly-2,5-dimethoxyethynylbenzene/SnO₂ nanocomposite is in-situ synthesized as gas sensing materials. The composite is accessed by two procedures both relying on Pd catalysis: (1) The reaction of ethynyltri-n-buyltin replacing Br belonged to 1,4-dibromo-2,5-dimethoxy benzene, and (2) The step-growth polymerization of PDMEB through heating up the mixer, at the same time adding appropriate SnO₂ nanoparticle. The materials are characterized by FT-IR and the morphology of films is characterized by laser scanning confocal microscope (LSCM). Compared with pure PDMEB, it clearly appears that SnO₂ components influence morphology of the nanocomposite film, which leads to variation of sensor response-recovery behavior. The poly-ynes nanocomposite is deposited on quartz crystal microbalance (QCM, whose corresponding operation frequency of baseline is 8.0MHz) to fabricate a gas sensor by drop-coating method. The PDMEB/SnO2 based QCM gas sensor has been investigated towards methane (CH₄, in the range of 500-5000 ppm) gas. The sensor is exposed to various concentrations of CH₄ gas and operated at room temperature. The frequency shift as the response of PDMEB/SnO₂ based QCM gas sensor is charaterized. A fast response and recovery with good repeatability in a stable baseline condition is observed.

Lanthanum hexaboride(LaB₆) is a new and exciting field emitter material due to its special properties. In this paper, LaB₆ field emission microtriodes have been fabricated on n-type(100) single crystal silicon substrates by Spindt method. Such cathodes are produced in closely packed arrays containing 2.7×10⁴ cones that are about 1.0 μm tall in an area of 1mm². The field emission characteristics are studied in a conventional triode test cell in vacuum system. The turn-on voltage of LaB₆-FEAs is 60V, and the emitters draw about 5.58mA total emission at the gate voltage of 145V. Furthermore, the Fower-Nordheim plot obtained from the current-voltage characteristic is found to be nearly linear in accordance with the quantum mechanical tunneling phenomenon.

Conventionally, the finest pattern obtained in optical lithography is determined by wavelength and numerical aperture of optical system, due to diffraction effect. This principle delivers theoretical obstacles for nano lithography using conventional light source, like Hg lamp. According to theory, this obstacle can be circumvented with near field lithography (NFL) technique, just by confining the mask and photo resist into sub-wavelength dimensions. Sub-wavelength patterns with features down to 100nm can be realized in the NFL, as demonstrated numerically and experimentally in many papers. One obvious problem associated with NFL is that low efficiency in the lithography process, since it is difficult to transmit through sub-wavelength scaled apertures in the mask. This usually results in the deleterious effect to the patterns on photo resist. In this paper, we demonstrate that the extraordinary optical transmission (EOT) effect helps to solve this problem. It is found that noble metal, instead of chromium, usually gives much greater transmission when employed as mask material. The enhancement is contributed to resonant excitation of surface plasmon mode. Further, the transmission can be enhanced by appropriately design of patterns. The polarization of illumination light affects lithography efficiency as well. As illustrative examples, mask patterns like lines group, grating structure and holes array are designed and simulated with greatly improved lithography efficiency. This method is believed to have potential applications in nano lithography.

Soft and flexible grating sensing waveguides is urgently demanded in application of micro-bending sensing and surface distortion sensing in medical catheter and smart skin sensing unit etc. Based on Nano-imprint Lithography and micro-replication process, polymer grating waveguides with core size 4μm×20μm and pitch 0.75μm are fabricated successfully in this paper. This novel grating waveguides is soft and flexible enough for related application and with the bio-medical safe feature when used in human body catheter. Fabricated processes are presented including the fabrication of micro mould and UV-replication process, and relative skills are discussed also in this paper.

As an important index, the characterization of nano-materials' topography is directly related with their competitive ability in micro-mechanical or information industries in which surface roughness and film's thickness play significant roles. With the developments of semiconducting materials and devices, the requirements for testing instruments are been changing from low accuracy, high accuracy to broad measuring range. To satisfy higher demands, the optical profiler method was introduced with different working principle which is briefly described in this paper. As real samples of nano-materials, such as multilayer films, their surface roughness and thickness were measured. In summary, this technique has excellent performance in its fast, non-contact, accurate and repeatable features.

Bonding conditions between PZT thin film and sample holder greatly affect the strain measurement of the PZT sample. The influence of various bonding conditions on the measured displacement were analyzed using finite element analysis (FEA). One-end fixed sample induces the maximum bending displacement. Experiments were performed on sol-gel derived PZT thin film. The voltage-displacement curve and "butterfly" loop were measured using laser Doppler method with phase detection. Experimental results agreed well with the simulated ones. The measured frequency dependence of piezoelectric response of PZT thin film indicated that, if the operating frequency was lower than 2 kHz, good bonding effect could be obtained when the entire back surface of the sample was glued to a rigid supporter using epoxy resin. A simple bonding model which considered the adhesives as a spring was used to estimate the frequency response of PZT thin film sample.

Regarding to researches on manufacturing process, the fabrication of nano structures on SWS (subwavelength structured) grating are mainly produced by photo lithography. We find that UV light transmission efficiency of PET film significantly drops 50% when we put nano structures on the surface of material. In this paper, we add nano structures on the surface of PET film and create a UV band filter. Decent optical filtering effects can be achieved by combining the characteristics of PET materials with nano structures on their surfaces.

With the development of MEMS and MOEMS technology, digital gray-toned maskless lithography will meet the demand on devices manufacturing with its advantage of low cost, flexible and high efficiency. A kind of novel projection lithography based on Digital Micromirror Device (DMD) was introduced in this paper. and the gray-tone and imaging principle were analysed too. A projection optical system was designed based on DMD technology in this paper. Experiments show that digital gray-tone projection lithography technology has advantage of high flexibility and convenience, especially for the manufacturing of small production of specific structures.

In 45nm technology node and beyond with hyper NA and Off-axis Illumination(OAI) lithography simulation, mask topography effect is not ignorable, for calculating near-field distribution based on scalar diffraction theory is insufficient on accuracy. Real three-dimensional (3D) simulation is required for precise evaluation of printing performance and the accuracy of 3D mask model on simulation is a key issue, especially for the mask with contact holes, corners or island patterns, even for 3D defect detection. In this paper, a general 3D mask model on simulation is presented and its near-field diffraction distributions can be described by the thickness of mask, the oblique incident angle, azimuth angle and polarization. Example of simulations are implemented on 3D mask with contact hole without or with optical proximity correction (OPC) assistant patterns, we get the same results as those from rigorous electromagnetic field simulation (REMFS).