Share Email Print
cover

PROCEEDINGS VOLUME 7042

Instrumentation, Metrology, and Standards for Nanomanufacturing II
For the purchase of this volume in printed format, please visit Proceedings.com external link icon

Volume Details

Volume Number: 7042
Date Published: 28 August 2008

Table of Contents
show all abstracts | hide all abstracts
All links to SPIE Proceedings will open in the SPIE Digital Library. external link icon
Front Matter: Volume 7042
Author(s): Proceedings of SPIE
Metrology at the nanoscale: what are the grand challenges?
Author(s): Kevin W. Lyons; Michael T. Postek
Show Abstract
Ultra low capacitance high frequency IC probe
Author(s): M. E. Jacob; D. A. Miller; L. Forbes
Show Abstract
High-speed AFM probe with micromachined membrane tip
Author(s): Byungki Kim; Byung Hyung Kwak; Faize Jamil
Show Abstract
Improved performance of an ultrastable measurement platform using a field-programmable gate array for real-time deterministic control
Author(s): Allison B. Churnside; Gavin M. King; Ashley R. Carter; Thomas T. Perkins
Show Abstract
Self-calibration of a dual-actuated single-axis nanopositioner using measurement transitivity with extensions to calibration of two-axis systems
Author(s): Young Hun Jeong; Jingyan Dong; Placid P. Ferreira
Show Abstract
Measurement of optical near field of a nanoscale aperture
Author(s): Rui Guo; Wenhao Huang; Edward C. Kinzel; Arvind Raman; Xianfan Xu
Show Abstract
Test objects with right-angled and trapezoidal profiles of the relief elements
Author(s): Yu. A. Novikov; V. P. Gavrilenko; A. V. Rakov; P. A. Todua
Show Abstract
Check of the quality of fabrication of test objects with a trapezoidal profile
Author(s): P. A. Todua; V. P. Gavrilenko; Yu. A. Novikov; A. V. Rakov
Show Abstract
Accuracy considerations for critical dimension semiconductor metrology
Author(s): N. G. Orji; R. G. Dixson; B. D. Bunday; J. A. Allgair
Show Abstract
Extraction of trench geometry and linewidth of nanoscale grating targets in (110)-oriented silicon using angle-resolved scatterometry
Author(s): Heather J. Patrick; Thomas A. Germer; Michael W. Cresswell; Bin Li; Huai Huang; Paul S. Ho
Show Abstract
Measurement of the parameters of the electron beam of a scanning electron microscope
Author(s): V. P. Gavrilenko; Yu. A. Novikov; A. V. Rakov; P. A. Todua
Show Abstract
Cellulose nanocrystals the next big nano-thing?
Author(s): Michael T. Postek; Andras Vladar; John Dagata; Natalia Farkas; Bin Ming; Ronald Sabo; Theodore H. Wegner; James Beecher
Show Abstract
Measurement of oxide barrier-film thickness of Al alloy by electrochemical impedance spectroscopy at the nanometre scale
Author(s): K. Habib
Show Abstract
Toward in situ x-ray diffraction imaging at the nanometer scale
Author(s): Nadia A. Zatsepin; Ruben A. Dilanian; Andrei Y. Nikulin; Brian M. Gable; Barry C. Muddle; Osami Sakata
Show Abstract
Laser diagnostics for flame synthesis of nanostructured materials: instrumentation, metrology, and process control (Retraction Notice)
Author(s): Xiaofei Liu
Show Abstract
Three-dimensional x-ray diffraction nanoscopy
Author(s): Andrei Y. Nikulin; Ruben A. Dilanian; Nadia A. Zatsepin; Barry C. Muddle
Show Abstract
Silica nanoparticle inline size measurement using refractive index gradient in a microfluidic cell
Author(s): Yi Qiao; Dave Hofeldt; Brian Graebel; John Ramthun; Michael Dolezal
Show Abstract

© SPIE. Terms of Use
Back to Top
PREMIUM CONTENT
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research