Share Email Print


Instrumentation, Metrology, and Standards for Nanomanufacturing II
For the purchase of this volume in printed format, please visit external link icon

Volume Details

Volume Number: 7042
Date Published: 28 August 2008

Table of Contents
show all abstracts | hide all abstracts
All links to SPIE Proceedings will open in the SPIE Digital Library. external link icon
Front Matter: Volume 7042
Author(s): Proceedings of SPIE
Metrology at the nanoscale: what are the grand challenges?
Author(s): Kevin W. Lyons; Michael T. Postek
Show Abstract
Ultra low capacitance high frequency IC probe
Author(s): M. E. Jacob; D. A. Miller; L. Forbes
Show Abstract
High-speed AFM probe with micromachined membrane tip
Author(s): Byungki Kim; Byung Hyung Kwak; Faize Jamil
Show Abstract
Improved performance of an ultrastable measurement platform using a field-programmable gate array for real-time deterministic control
Author(s): Allison B. Churnside; Gavin M. King; Ashley R. Carter; Thomas T. Perkins
Show Abstract
Self-calibration of a dual-actuated single-axis nanopositioner using measurement transitivity with extensions to calibration of two-axis systems
Author(s): Young Hun Jeong; Jingyan Dong; Placid P. Ferreira
Show Abstract
Measurement of optical near field of a nanoscale aperture
Author(s): Rui Guo; Wenhao Huang; Edward C. Kinzel; Arvind Raman; Xianfan Xu
Show Abstract
Test objects with right-angled and trapezoidal profiles of the relief elements
Author(s): Yu. A. Novikov; V. P. Gavrilenko; A. V. Rakov; P. A. Todua
Show Abstract
Check of the quality of fabrication of test objects with a trapezoidal profile
Author(s): P. A. Todua; V. P. Gavrilenko; Yu. A. Novikov; A. V. Rakov
Show Abstract
Accuracy considerations for critical dimension semiconductor metrology
Author(s): N. G. Orji; R. G. Dixson; B. D. Bunday; J. A. Allgair
Show Abstract
Extraction of trench geometry and linewidth of nanoscale grating targets in (110)-oriented silicon using angle-resolved scatterometry
Author(s): Heather J. Patrick; Thomas A. Germer; Michael W. Cresswell; Bin Li; Huai Huang; Paul S. Ho
Show Abstract
Measurement of the parameters of the electron beam of a scanning electron microscope
Author(s): V. P. Gavrilenko; Yu. A. Novikov; A. V. Rakov; P. A. Todua
Show Abstract
Cellulose nanocrystals the next big nano-thing?
Author(s): Michael T. Postek; Andras Vladar; John Dagata; Natalia Farkas; Bin Ming; Ronald Sabo; Theodore H. Wegner; James Beecher
Show Abstract
Measurement of oxide barrier-film thickness of Al alloy by electrochemical impedance spectroscopy at the nanometre scale
Author(s): K. Habib
Show Abstract
Toward in situ x-ray diffraction imaging at the nanometer scale
Author(s): Nadia A. Zatsepin; Ruben A. Dilanian; Andrei Y. Nikulin; Brian M. Gable; Barry C. Muddle; Osami Sakata
Show Abstract
Laser diagnostics for flame synthesis of nanostructured materials: instrumentation, metrology, and process control (Retraction Notice)
Author(s): Xiaofei Liu
Show Abstract
Three-dimensional x-ray diffraction nanoscopy
Author(s): Andrei Y. Nikulin; Ruben A. Dilanian; Nadia A. Zatsepin; Barry C. Muddle
Show Abstract
Silica nanoparticle inline size measurement using refractive index gradient in a microfluidic cell
Author(s): Yi Qiao; Dave Hofeldt; Brian Graebel; John Ramthun; Michael Dolezal
Show Abstract

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research