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PROCEEDINGS VOLUME 5004

Poly-Silicon Thin Film Transistor Technology and Applications in Displays and Other Novel Technology Areas
Editor(s): Apostolos T. Voutsas

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Volume Details

Volume Number: 5004
Date Published: 16 May 2003

Table of Contents
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Future display market: Major discontinuities or more of the same?
Author(s): Michael Urwin
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Property of single-crystalline Si TFTs fabricated with u-Czochralski (grain filter) process
Author(s): Ryoichi Ishihara; Paul Ch. van der Wilt; Barry D. van Dijk; J. W. Metselaar; C. I. M. Beenakker
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High-resolution optics for thin Si-film crystallization using excimer lasers: present status and future development
Author(s): Hans-Juergen Kahlert; Berthold Burghardt; Frank Simon; Michael Stopka
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High-performance polycrystalline silicon TFTs fabricated by high-temperature process with excimer laser annealing
Author(s): Hiroaki Jiroku; Mitsutoshi Miyasaka; Satoshi Inoue; Yoshifumi Tsunekawa; Tatsuya Shimoda
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Novel high-performance TFTs fabricated by selectively enlarging laser x'tallization (SELAX) technology
Author(s): Shinya Yamaguchi; Mutsuko Hatano; Seong-kee Park; Mitsuharu Tai; Takeo Shiba
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N-shot SLS-processed polycrystalline silicon TFTs
Author(s): Mark A. Crowder; M. Moriguchi; Y. Mitani; Apostolos T. Voutsas
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Phase stepping microscopy for rapid control of laser crystallization of Si for flat panel display applications
Author(s): A. Benatmane; Paul C. Montgomery; Eric Fogarassy
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Modeling effects of laser beam shaping for projection laser crystallization
Author(s): Hidayat Kisdarjono; Apostolos T. Voutsas; Rajendra Solanki
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300 W XeCl excimer laser annealing and sequential lateral solidification in low temperature poly-silicon technology
Author(s): Ludolf Herbst; Hans-Juergen Kahlert; Burkhard Fechner; Ulrich Rebhan; Rustem Osmanow
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Location-controlled crystallization of Si films for TFT circuitapplications
Author(s): Mark A. Crowder; Apostolos T. Voutsas; Steven R. T. Droes; M. Moriguchi; Y. Mitani
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Low-temperature plasma-deposited microcrystalline silicon thin films: an emerging material for stable thin film transistors
Author(s): Pere Roca i Cabarrocas; Samir Kasouit; B. Kalache; Regis Vanderhaghen; Y. Bonnassieux; M. Elyaakoubi; I. D. French
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TFT threshold voltage adjustment with in-situ doped PVD silicon films
Author(s): Steven R. T. Droes; Mikel M. Atkinson; Patrick R. Guthrie; Mark A. Crowder; Apostolos T. Voutsas
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Low temperature processing of SiO2 thin films by HD-PECVD technique for gate dielectric applications
Author(s): Pooran C. Joshi; M. Moriguchi; Mark A. Crowder; Steven R. T. Droes; James S. Flores; Apostolos T. Voutsas; John W. Hartzell
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Application of high-efficiency phosphorescent OLEDs in both passive and active matrix displays
Author(s): Michael S. Weaver; Julie J. Brown; Raymond C. Kwong; Min-Hao M Lu; Michael Hack; Yeh-Jiun Tung; Anna B. Chwang; Theodore X Zhou
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Advanced poly-LED displays
Author(s): Mark Childs; Giovanni Nisato; D. Fish; Andrea Giraldo; A. J. Jenkins; Mark T. Johnson
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Novel small-molecule OLED with Alq3 derivative
Author(s): Jianbo Cheng; Gang Yang; Zulun Lin; Wenbing Chen; Quan Jiang; Xiaoqiang Wei; Zhankun Yang; Minggui Xie
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State of the art of fine-patterned Si TFT
Author(s): Takashi Noguchi
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Comparative analysis of advanced poly-silicon thin-film transistor architectures for drain field relief
Author(s): Guglielmo Fortunato; Antonio Valletta; Alessandra Bonfiglietti; Massimo Cuscuna; Paolo Gaucci; Luigi Mariucci; Alessandro Pecora; Stan D. Brotherton; J. Richard Ayres
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AC measurement for characterizing the trap processes in poly-silicon TFTs
Author(s): Feng Yan; Piero Migliorato; Tatsuya Shimoda
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LCD gamma correction by nonlinear digital-to-analogue converter
Author(s): Harry G. Walton; Michael Brownlow; Jeremey Lock; Mouhamed Rahal; Patrick Zebedee
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High-performance polysilicon circuits on thin metal foils
Author(s): Themis Afentakis; Miltiadis K. Hatalis; Apostolos T. Voutsas; John W. Hartzell
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Thin film transistors made of nanocrystalline silicon for CMOS on plastic
Author(s): I-Chun Cheng; Sigurd Wagner
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Poly-silicon TFT AM-OLED on thin flexible metal substrates
Author(s): Themis Afentakis; Miltiadis K. Hatalis; Apostolos T. Voutsas; John W. Hartzell
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