Share Email Print


Soft X-Ray and EUV Imaging Systems
Editor(s): Winfried M. Kaiser; Richard H. Stulen

*This item is only available on the SPIE Digital Library.

Volume Details

Volume Number: 4146
Date Published: 8 November 2000

Table of Contents
show all abstracts | hide all abstracts
DUV or EUV: that is the question
Author(s): David M. Williamson
Show Abstract
Trends in optical design of projection lenses for UV and EUV lithography
Author(s): Wilhelm Ulrich; Susanne Beiersdoerfer; Hans-Juergen Mann
Show Abstract
Illumination optics design for EUV lithography
Author(s): Martin Antoni; Wolfgang Singer; Jorg Schultz; Johannes Wangler; Isabel Escudero-Sanz; Bob Kruizinga
Show Abstract
Mirror substrates for EUV lithography: progress in metrology and optical fabrication technology
Author(s): Udo Dinger; Frank Eisert; Holger Lasser; Maximilian Mayer; A. Seifert; Guenther Seitz; Siegfried Stacklies; Franz-Josef Stickel; Martin Weiser
Show Abstract
Present status of the ASET at-wavelength phase-shifting point diffraction interferometer
Author(s): Katsumi Sugisaki; Yucong Zhu; Yoshio Gomei; Masahito Niibe; Takeo Watanabe; Hiroo Kinoshita
Show Abstract
Mo/Si multilayer coating technology for EUVL: coating uniformity and time stability
Author(s): Eric Louis; Andrey E. Yakshin; Peter C. Goerts; Sebastian Oestreich; Edward L. G. Maas; M. J. H. Kessels; Detlef Schmitz; Frank Scholze; Gerhard Ulm; Stefan Muellender; Markus Haidl; Fred Bijkerk
Show Abstract
Multilayer reflectance during exposure to EUV radiation
Author(s): Sebastian Oestreich; Roman Klein; Frank Scholze; Jeroen Jonkers; Eric Louis; Andrey E. Yakshin; Peter C. Goerts; Gerhard Ulm; Markus Haidl; Fred Bijkerk
Show Abstract
New PTB beamlines for high-accuracy EUV reflectometry at BESSY II
Author(s): Frank Scholze; Burkhard Beckhoff; G. Brandt; R. Fliegauf; Roman Klein; Bernd Meyer; D. Rost; Detlef Schmitz; M. Veldkamp; J. Weser; Gerhard Ulm; Eric Louis; Andrey E. Yakshin; Sebastian Oestreich; Fred Bijkerk
Show Abstract
Design, fabrication, and characterization of broadband multilayer mirrors for EUV optics at normal incidence
Author(s): Zhanshan Wang; Changjun Kun; Yueying Ma; Bin Chen; Jianlin Cao; Zhuying Zhou; Xingdan Chen; Alan G. Michette
Show Abstract
Laser-generated water plasma source for extreme-ultraviolet lithography and at-wavelength interferometry
Author(s): Raluca C. Constantinescu; Jeroen Jonkers; Petra Hegeman; Matthieu Visser
Show Abstract
Extreme-ultraviolet source development: a comparison of different concepts
Author(s): Guido Schriever; Manfred Rahe; Ulrich Rebhan; Dirk Basting; Wojciech J. Walecki; Hans Lauth; Rainer Lebert; Klaus Bergmann; Dieter Hoffmann; Oliver Rosier; Willi Neff; Reinhart Poprawe; Roland A. Sauerbrey; H. Schwoerer; S. Duesterer; C. Ziener; Peter Viktor Nickles; H. Stiehl; Ingo Will; Wolfgang Sandner; Guenther A. Schmahl; Dietbert M. Rudolph
Show Abstract
Portable diagnostics for EUV light sources
Author(s): R. Stuik; Raluca C. Constantinescu; Petra Hegeman; Jeroen Jonkers; H. F. Fledderus; Vadim Banine; Fred Bijkerk
Show Abstract
Compact debris shutter design of a laser-produced plasma source for high-NA application
Author(s): Masaki Yamamoto; Minaji Furudate; Norio Sato; Hirochi Takagi
Show Abstract
Optical layout of BACH: a beamline for advanced dichroism at Elettra
Author(s): Marco Zangrando; Marco Finazzi; Fulvio Parmigiani; G. Paolucci; Daniele Cocco
Show Abstract
High-precision measurements of the groove density of diffraction gratings
Author(s): Daniele Cocco; Rudi Sergo; Giovanni Sostero; Marco Zangrando
Show Abstract
Optimization of air gap for two-dimensional imaging system using synchrotron radiation
Author(s): Tsutomu Zeniya; Tohoru Takeda; Quanwen Yu; Kazuyuki Hyodo; Tetsuya Yuasa; Yuji Aiyoshi; Yukio Hiranaka; Yuji Itai; Takao Akatsuka
Show Abstract
Varied-line-spacing laminar-type holographic grating for the standard soft x-ray flat-field spectrograph
Author(s): Masato Koike; Takeshi Namioka; Eric M. Gullikson; Yoshihisa Harada; Sadayuki Ishikawa; Takashi Imazono; Stanley Mrowka; Noboru Miyata; Mihiro Yanagihara; James H. Underwood; Kazuo Sano; Tokuo Ogiwara; Osamu Yoda; Shiro Nagai
Show Abstract
Si-based multilayers with high thermal stability
Author(s): Norbert Kaiser; Sergey A. Yulin; Torsten Feigl
Show Abstract
High-resolution soft x-ray microscopy
Author(s): Weilun Chao; Erik H. Anderson; Gregory Denbeaux; Bruce D. Harteneck; Mark A. LeGros; Angelic L. Pearson; Deirdre L. Olynick; David T. Attwood Jr.
Show Abstract
XM-1: the high-resolution soft x-ray microscope at the Advanced Light Source
Author(s): Angelic L. Pearson; Weilun Chao; Gregory Denbeaux; Thomas Eimueller; Peter Fischer; Lewis E. Johnson; Matthias Koehler; Carolyn Larabell; Mark A. LeGros; Deborah Yager; David T. Attwood Jr.
Show Abstract

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?