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Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries
Editor(s): Ghanim A. Al-Jumaily; Angela Duparre; Bhanwar Singh

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Volume Details

Volume Number: 4099
Date Published: 2 November 2000

Table of Contents
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Lithography: a look at what is ahead
Author(s): Harry J. Levinson
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Development of an automated optical system for the analysis of etch pits density and distribution on semiconductor materials
Author(s): Berenice Anina Dedavid; Eleani Maria da Costa; Andre Borin Soares
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Optical microscopy at sub-0.1-um resolution for semiconductor applications
Author(s): Wolfgang Vollrath
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Optical characterization of doping profiles in silicon
Author(s): Romeo Bernini; Luigi Zeni; Rocco Pierri
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Nondestructive film thickness measurement using atomic force microscopy at ultrasonic frequencies
Author(s): Kenneth B. Crozier; Goeksenin G. Yaralioglu; F. Levent Degertekin; Jesse D. Adams; Stephen C. Minne; Calvin F. Quate
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Evaluating optical and supersmooth surface using AFM in optical maunfacturing technology
Author(s): Jianbai Li; Shaorong Xiao; Xiaoyun Li; Aihan Ying; Anqing Zhao
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Investigation on total scattering at 157 nm and 193 nm
Author(s): Puja Kadkhoda; Herbert Welling; Stefan Guenster; Detlev Ristau
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DUV/VUV light scattering measurement of optical components for lithography applications
Author(s): Stefan Gliech; Joerg Steinert; Marcel Flemming; Angela Duparre
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Multiscale mapping technique for the simultaneous estimation of absorption and partial scattering of optical coatings
Author(s): Alexandre Gatto; Mireille Commandre
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X-ray study of the roughness of surfaces and interfaces
Author(s): Igor V. Kozhevnikov; Victor E. Asadchikov; Inna N. Bukreeva; Angela Duparre; Yury S. Krivonosov; Christian Morawe; Vladimir I. Ostashev; Mikhail V. Pyatakhin; Eric Ziegler
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Microroughness analysis of thin film components for VUV applications
Author(s): Josep Ferre-Borrull; Angela Duparre; Joerg Steinert; Detlev Ristau; Etienne Quesnel
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Standardization in optics characterization
Author(s): Detlev Ristau
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New procedure for the optical characterization of high-quality thin films
Author(s): Salvador Bosch; Norbert Leinfellner; Etienne Quesnel; Angela Duparre; Josep Ferre-Borrull; Stefan Guenster; Detlev Ristau
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Optical testing of long cylindrical lenses by means of scanning deflectometry
Author(s): Willem D. van Amstel; Peter F.A. van de Goor; Jef L. Horijon; Peter G. J. M. Nuyens
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Methods, error influences, and limits for the ultraprecise measurement of slope and figure for large, slightly nonflat, or steep complex surfaces
Author(s): Ingolf Weingaertner; Michael Schulz; Peter Thomsen-Schmidt
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Calibration tool for a CCD-camera-based vision system
Author(s): Gan Xu; Siew Leng Tan; Siok Pheng Low; Yee Shuai Heng; Weng Chuen Lai; Xianhe Du
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Present and future interference microscope systems for magnetic head metrology
Author(s): Paul J. Caber; Artur G. Olszak; Chip Ragan; David J. Aziz
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2D-area/3D-volume holographic optical storage nanotechnology
Author(s): Michael E. Thomas
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Ellipsometry: a sophisticated tool for optical metrology
Author(s): Rasheed M. A. Azzam
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Variable angle spectroscopic ellipsometry in the vacuum ultraviolet
Author(s): John A. Woollam; James N. Hilfiker; Thomas E. Tiwald; Corey L. Bungay; Ron A. Synowicki; Duane E. Meyer; Craig M. Herzinger; Galen L. Pfeiffer; Gerald T. Cooney; Steven E. Green
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New purged UV spectroscopic ellipsometer to characterize thin films and multilayers at 157 nm
Author(s): Pierre Boher; Patrick Evrard; Jean-Philippe Piel; Jean-Louis P. Stehle
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In-situ ellipsometric measurements of thin film aluminum oxidation
Author(s): Eric K. Lindmark; Janusz J. Nowak; Mark T. Kief
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Rotating compensator spectroscopic ellipsometry (RCSE) and its application to high-k dielectric film HfO2
Author(s): JingMin Leng; Shifang Li; Jon L. Opsal; David E. Aspnes; Byoung Hun Lee; Jack C. Lee
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Numerical investigation of the resolution in solid immersion lens systems
Author(s): Joerg Bischoff; Robert Brunner
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Characteristics of tantalum oxynitride films prepared by rf magnetron sputtering
Author(s): Chao An Jong; Tsung Shune Chin
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Accuracy of the thin metallic wires diameter using Fraunhofer diffraction technique
Author(s): Ibrahim Serroukh; Juan Carlos Martinez-Anton; Eusebio Bernabeu
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X-ray investigations of a near surface layer of metal samples
Author(s): Oleg N. Gilev; Victor E. Asadchikov; Angela Duparre; Nikolai A. Havronin; Igor V. Kozhevnikov; Yury S. Krivonosov; Sergey P. Kuznetsov; Vitaly I. Mikerov; Vladimir I. Ostashev; Vladimir A. Tukarev
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Advanced methods for surface and subsurface defect characterization of optical components
Author(s): Joerg Steinert; Stefan Gliech; Andreas Wuttig; Angela Duparre; Horst Truckenbrodt
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Spectrophotometric determination of absorption in the DUV/VUV spectral range for MgF2 and LaF3 thin films
Author(s): Stefan Guenster; Detlev Ristau; Salvador Bosch
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Investigations of transmittance and reflectance in the DUV/VUV spectral range
Author(s): Puja Kadkhoda; Holger Blaschke; J. Kohlhaas; Detlev Ristau
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Calibration requirements for identifying and sizing wafer defects by scanner measurements
Author(s): John C. Stover; Craig A. Scheer
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Fast-scanning ellipsometry for thin film characterization
Author(s): Christopher Berge; Anna Krasilnikova; Enrico Masetti
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