Share Email Print


Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays
Editor(s): John C. Stover

*This item is only available on the SPIE Digital Library.

Volume Details

Volume Number: 2862
Date Published: 4 November 1996

Table of Contents
show all abstracts | hide all abstracts
Silicon wafer specifications and characterization capabilities: another perspective
Author(s): Randal K. Goodall
Show Abstract
Proposed methodology for characterization of microroughness-induced optical scatter instrumentation
Author(s): Thomas A. Germer; Clara C. Asmail
Show Abstract
Morphology of silicon wafer surfaces: a comparative study with atomic force microscopy and other techniques
Author(s): Peter Wagner; H. A. Gerber; D. Graef; R. Schmolke; M. Suhren
Show Abstract
Fast and accurate roughness characterization techniques for wafers and hard disks
Author(s): Hendrik Rothe; Andre Kasper
Show Abstract
Method to improve the accuracy of super-smooth surface scatter data
Author(s): Yoshitate Takakura; Mohamed Tahar Sehili; Patrick Meyrueis
Show Abstract
Application of off-specular x-ray reflectivity for surface characterization
Author(s): Wen-li Wu
Show Abstract
Surface haze in the Stokes-Mueller representation
Author(s): Eugene L. Church; John C. Stover
Show Abstract
Requirements and suggestions for an industrial smooth surface microroughness standards
Author(s): John C. Stover
Show Abstract
Development of a physical haze and microroughness standard
Author(s): Bradley W. Scheer
Show Abstract
Confocal microscope 3D visualizing method for fine surface characterization of microstructures
Author(s): Yoshiharu Ichikawa; Jun-ichiro Toriwaki
Show Abstract
Selection of calibration particles for scanning surface inspection systems
Author(s): George W. Mulholland; Nelson Bryner; Walter Liggett; Bradley W. Scheer; Randal K. Goodall
Show Abstract
Utilization of near specular energy in the detection of surface defects
Author(s): Kevin Welch
Show Abstract
Comparison of experimentally measured differential scattering cross sections of PSL spheres on flat surfaces and patterned surfaces
Author(s): Greg W. Starr; E. Dan Hirleman
Show Abstract
Modeling of light scattering from structures with particle contaminants
Author(s): Brent Martin Nebeker; Greg W. Starr; E. Dan Hirleman
Show Abstract
Requirements of measurement equipment for silicon wafers
Author(s): Peter Wagner; H. A. Gerber; R. Schmolke; R. Velten
Show Abstract
Large flat panel profiler
Author(s): Klaus R. Freischlad
Show Abstract
Flatness measurement by reflection moire technique
Author(s): Hisatoshi Fujiwara; Yukitoshi Otani; Toru Yoshizawa
Show Abstract
New method of surface characterization with a single-mode fiber to thin film coupler
Author(s): Alok Kumar Das; Amar K. Ganguly; Anawar Hussain; Shila Ghosh; Bharat P. Choudhury
Show Abstract
Instrument for measuring flatness by using laser and CCD
Author(s): Qun Hao; Mang Cao; Dacheng Li
Show Abstract

© SPIE. Terms of Use
Back to Top