Share Email Print


14th Annual BACUS Symposium on Photomask Technology and Management
Editor(s): William L. Brodsky; Gilbert V. Shelden

*This item is only available on the SPIE Digital Library.

Volume Details

Volume Number: 2322
Date Published: 7 December 1994

Table of Contents
show all abstracts | hide all abstracts
Mask making: today's enabling technology
Author(s): Stephen E. Cooper
Show Abstract
Meeting the challenge of advanced lithography reticle inspection
Author(s): Larry S. Zurbrick; Stephen D. Kirkish
Show Abstract
Focused ion beam phase-shift mask repair (fib or fact?)
Author(s): Roswitha Remling
Show Abstract
Focused ion beam (FIB) repair of embedded shifter masks
Author(s): John C. Morgan; David C. Ferranti; Chris Pennelli; A. Saxonis; William C. Joyce
Show Abstract
High-resolution UV laser repair of phase-shifting photomasks
Author(s): Baorui Yang; Yung-Ho Chuang; Kuo-Ching Liu
Show Abstract
Technical performance of the ALTA-3000 laser writer
Author(s): Brian J. Grenon; D. C. Defibaugh; Donna M. Sprout; Henry Chris Hamaker; Peter D. Buck
Show Abstract
Advanced mask and reticle generation using EBES4
Author(s): David M. Walker; D. C. Fowlis; Sheldon M. Kugelmass; K. A. Murray; C. M. Rose
Show Abstract
Improved excimer laser pattern generator for photomask fabrication
Author(s): James L. Speidell; Steven A. Cordes; A. Ferry
Show Abstract
MEBES 4000 optimization and characterization of MEBES 4500
Author(s): Jim DeWitt; J. Millino; Joe Watson; Robert L. Dean; Frederick Raymond III; D. McClure; Leonard Gasiorek; Frank E. Abboud; Robert J. Naber
Show Abstract
Evaluation of image-placement distortion contributors of the EL-3+ electron-beam lithography system in x-ray mask fabrication
Author(s): Denise M. Puisto; Mark Lawliss
Show Abstract
PBS resist profile studies for submicron mask lithography
Author(s): Robert L. Dean; Homer Y. Lem; Charles A. Sauer; Hong Chang
Show Abstract
Initial results for a PBS replacement resist
Author(s): Barry Rockwell; Wolfgang Staud; Larry J. Watson
Show Abstract
Reticle processes for 256-Mbit DRAM
Author(s): Kazuhiko Sumi; Yutaka Miyahara
Show Abstract
Investigation of a negative i-line resist with the CORE-2564 laser writer
Author(s): Brian J. Grenon; Donna M. Sprout; William A. Aaskov; Peter D. Buck
Show Abstract
Mask industry quality assessment
Author(s): Al Strott; Larry Bassist
Show Abstract
Photomask cleaning: areas for future focus
Author(s): Rajeev R. Singh
Show Abstract
Design and fabrication of soft defect test reticles
Author(s): Steven J. Schuda; Donald Parker
Show Abstract
Effect of pressure differentials on pelliclized photomasks
Author(s): Robert W. Murphy; Rick Boyd
Show Abstract
Advanced pelliclization techniques
Author(s): Carl Johnson; Eric T. Chase
Show Abstract
CD data requirements for proximity effect corrections
Author(s): Richard C. Henderson; Oberdan W. Otto
Show Abstract
Optical proximity correction: a first look at manufacturability
Author(s): Lars W. Liebmann; Brian J. Grenon; Mark A. Lavin; Stephen Schomody; Thomas Zell
Show Abstract
Optimizing proximity correction for wafer fabrication processes
Author(s): John P. Stirniman; Michael L. Rieger
Show Abstract
Design optimization of optical proximity correction mask for device manufacturing
Author(s): Emiko Sugiura; Hisashi Watanabe; Tadashi Imoriya; Yoshihiro Todokoro
Show Abstract
Reticle correction technique to minimize lens distortion effects
Author(s): Warren W. Flack; Gary E. Flores; Alan D. Walther; Manny Ferreira
Show Abstract
Toppan's work on phase-shift mask for 64MDRAM
Author(s): Yoshiro Yamada; Kazuaki Chiba; Eisei Karikawa; Katsuhiro Kinemura; Masao Otaki
Show Abstract
Chromium-based attenuated phase shifter for DUV exposure
Author(s): Hiroshi Mohri; Masahiro Takahashi; Koichi Mikami; Hiroyuki Miyashita; Naoya Hayashi; Hisatake Sano
Show Abstract
Chromium-based attenuated embedded shifter preproduction
Author(s): Franklin D. Kalk; Roger H. French; H. Ufuk Alpay; Greg P. Hughes
Show Abstract
Phase-shift mask metrology using scatterometry
Author(s): Susan M. Wilson; Herschel M. Marchman; S. Sohail H. Naqvi; John Robert McNeil
Show Abstract
Quality assurance of focused ion beam (FIB) repaired areas
Author(s): Koji Hiruta; Hideyuki Kanemitsu; Akira Morishige
Show Abstract
Predicting mask yields through the use of a yield model
Author(s): Andrew D. Pond
Show Abstract
Optimizing 0.25-um lithography using confocal microscopy
Author(s): Robert E. Colgan; Herschel M. Marchman
Show Abstract
Implementation of high-contrast novolak resist process for sub-0.5-um e-beam lithography
Author(s): Dennis J. Williams
Show Abstract
Improving photomask linewidth measurement accuracy via emulated stepper aerial image measurement
Author(s): James E. Potzick
Show Abstract
Metrology test reticles for advanced optical lithography
Author(s): Herschel M. Marchman; Christophe Pierrat; Joseph E. Griffith; John L. Nistler; Alvina M. Williams
Show Abstract
Application of charge-dissipation material in MEBES phase-shift mask fabrication
Author(s): Zoilo C. H. Tan; Charles A. Sauer
Show Abstract
Large-area optical proximity correction using pattern-based corrections
Author(s): David M. Newmark; Sheila Vaidya; Jakub Segen; Andrew R. Neureuther
Show Abstract
Attenuated phase-shifting mask blanks for the deep ultraviolet
Author(s): Yasuo Tokoro; Susumu Kawada; Tsuneo Yamamoto; Yoshihiro Saito; Atsushi Hayashi; Akihiko Isao
Show Abstract
Two-level masks for increased depth of focus
Author(s): Rudolf M. von Buenau; Ricardo A. Diola; Paul DePesa; Stanney M. Kay; David A. Markle; Elizabeth Tai; Roger Fabian W. Pease
Show Abstract
National lithography roadmap: wafer requirements in the year 2000
Author(s): Karen H. Brown
Show Abstract
Importance of mask technical specifications on the lithography error budget
Author(s): Gary C. Escher
Show Abstract
Life after the 256-Mb DRAM: e-beam mask makers at the year 2000
Author(s): Keith P. Standiford; John C. Wiesner
Show Abstract
Overview of extreme ultraviolet lithography
Author(s): Frits Zernike
Show Abstract
SCALPEL system
Author(s): Steven D. Berger; Christopher J. Biddick; Myrtle I. Blakey; Kevin J. Bolan; Stephen W. Bowler; Kevin J. Brady; Ron M. Camarda; Wayne F. Connelly; Reginald C. Farrow; Joseph A. Felker; Linus A. Fetter; Lloyd R. Harriott; Harold A. Huggins; Joseph S. Kraus; James Alexander Liddle; Masis M. Mkrtchyan; Anthony E. Novembre; Milton L. Peabody Jr.; Thomas M. Russell; Wayne M. Simpson; Regine G. Tarascon-Auriol; Harry H. Wade; Warren K. Waskiewicz; Pat G. Watson
Show Abstract
Author(s): James Alexander Liddle; Myrtle I. Blakey; Kevin J. Bolan; Reginald C. Farrow; Linus A. Fetter; Leslie C. Hopkins; Harold A. Huggins; Herschel M. Marchman; Milton L. Peabody Jr.; Wayne M. Simpson; Regine G. Tarascon-Auriol; Pat G. Watson
Show Abstract

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?