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PROCEEDINGS VOLUME 1924

Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III
Editor(s): David O. Patterson

*This item is only available on the SPIE Digital Library.


Volume Details

Volume Number: 1924
Date Published: 24 June 1993

Table of Contents
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Photoresist process latitude optimization for synchrotron x-ray lithography
Author(s): Andrew T.S. Pomerene; David E. Seeger; Patricia G. Blauner
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Resist performance in soft x-ray projection lithography
Author(s): Glenn D. Kubiak; Daniel A. Tichenor; Weng W. Chow; William C. Sweatt; Marc D. Himel
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Soft x-ray (14 nm) lithography with ultrathin imaging layers and selective electroless metallization
Author(s): Jeffrey M. Calvert; Tim S. Koloski; Walter J. Dressick; Charles S. Dulcey; Martin C. Peckerar; Franco Cerrina; James Welch Taylor; Doowon Suh; Obert R. Wood II; Alastair A. MacDowell; Raissa M. D'Souza
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Mixed e-beam/optical lithography process for the fabrication of sub-0.25-um poly gates
Author(s): Keith T. Kwietniak; Michael G. Rosenfield; Philip J. Coane; Christopher R. Blair; David P. Klaus
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Silylation and dry development of e-beam resist
Author(s): Lothar Bauch; Monika Boettcher; A. Wolff; Ulrich A. Jagdhold; I. Ludwig; Georg G. Mehliss
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Film life enhancement of chemically amplified electron-beam resists
Author(s): Theodore H. Fedynyshyn; Michael Francis Cronin; James W. Thackeray
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Chemically assisted focused-ion-beam etching for tungsten x-ray mask repair
Author(s): Lloyd R. Harriott; R. R. Kola; George K. Celler
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Fabrication of x-ray masks with 0.15-um level two-dimensional patterns by using highly accurate FIB lithography
Author(s): Shuji Fujiwara; Y. Yamaoka; M. Harada; Junichi Nishino; R. Yuasa; M. Inai; S. Suzuki; T. Tanaka; M. Morigami; Takeo Watanabe; Yoshio Yamashita
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Process latitude study of focused ion-beam-deposited gold for clear x-ray mask repair
Author(s): Patricia G. Blauner; Andrew D. Dubner; Alfred Wagner
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0.25-um x-ray mask repair with focused ion beams
Author(s): Diane K. Stewart; Thomas K. Olson; Billy Ward
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Proximity effect correction in electron-beam lithography II
Author(s): Gerry Owen
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Effects of electron energy in nanometer-scale lithography
Author(s): T. J. Stark; Thomas M. Mayer; Dieter P. Griffis; Phillip E. Russell
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Thin silicon nitride films to increase resolution in e-beam lithography
Author(s): Elizabeth A. Dobisz; Christie R. Marrian; R. E. Salvino; Mario G. Ancona; Kee Woo Rhee; Martin C. Peckerar
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Advanced transformational analysis applied to e-beam proximity effect correction
Author(s): Eytan Barouch; Ronald Raphael Coifman; Jimmy T. Ma; Martin C. Peckerar; Vladimir Rokhlin
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Fully-scaled 0.25-micron bipolar technology using variable shaped electron-beam lithography
Author(s): Philip J. Coane; Kaolin Grace Chiong; Mary Beth Rothwell; James Warnock; John D. Cressler; Fritz J. Hohn; Michael G.R. Thomson
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Highly accurate calibration method of electron-beam cell projection lithography
Author(s): Yoshinori Nakayama; Yasunari Sohda; Norio Saitou; Hiroyuki Itoh
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EBES4: performance of a new e-beam reticle generator
Author(s): Darryl Peters; D. C. Fowlis; C. M. Rose; A. R. von Neida; Herbert A. Waggener; William P. Wilson
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Suppression of resist heating effect by multiple electron-beam exposure on GaAs substrates
Author(s): Hiroyuki Minami; Hirofumi Nakano; Kazuhiko Sato; Hirozo Takano
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Dual exposure (e-beam and i-line) of OCG-895i resist
Author(s): Richard J. Bojko; Graham M. Pugh
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Performance of the Hampshire Instruments Model 5000 proximity x-ray stepper
Author(s): John Frackoviak; George K. Celler; Charles W. Jurgensen; R. R. Kola; Anthony E. Novembre; Lee E. Trimble; David N. Tomes
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Resolution limitation of x-ray proximity lithography--secondary electron and waveguide effects
Author(s): Taro Ogawa; Seiichi Murayama; Kozo Mochiji; Eiji Takeda
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Impact of chuck flatness on wafer distortion and stepper overlay
Author(s): Klaus Simon; H.-U. Scheunemann; Hans L. Huber; F. Gabeli
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Exposure and resist-process condition dependence of replicated-pattern accuracy in SR lithography
Author(s): M. Morigami; T. Tanaka; Takeo Watanabe; Yoshio Yamashita; Shuji Fujiwara; Junichi Nishino; M. Harada; Y. Yamaoka; R. Yuasa; M. Inai; S. Suzuki
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Mask-to-wafer alignment using x-ray-printed alignment marks in x-ray lithography
Author(s): S. E. Liang; Alex L. Flamholz; John F. Conway
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Fabrication of high-density SRAM chips using mix-and-match x-ray lithography
Author(s): John F. Conway; C. N. Alcorn; D. D. Patel; James A. Ricker; R. C. Yandow; S. E. Liang; Alex L. Flamholz
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Absorber roughness effect in XRL image formation
Author(s): Jerry Z.Y. Guo; Franco Cerrina
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Effects of illumination system aberrations on proximity XRL images
Author(s): Jerry Z.Y. Guo; Jiabei Xiao; Franco Cerrina; Whitson G. Waldo
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Helios compact synchrotron x-ray source: one year of operation at ALF
Author(s): David E. Andrews; Charles N. Archie
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Image formation in capillary arrays: the Kumakhov lens
Author(s): Guan-Jye Chen; Richard K. Cole III; Franco Cerrina
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Characteristics of the spherical pinch plasma radiation source (SPX II) for x-ray, UV, and deep-UV lithography
Author(s): Shridar Aithal; Emilio Panarella; M. Lamari; B. Hilko; Robert B. McIntosh
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What is required for collimated point-source x-ray lithography to achieve an economically viable throughput?
Author(s): Edward D. Franco; Michael J. Boyle; Jonathan A. Kerner; Louis N. Koppel; Robert D. Ormond
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0.35-um rule, high-density, full-chip x-ray mask patterning
Author(s): Tatsuo Chijimatsu; Ken'ichi Kawakami; Masafumi Nakaishi; Kazuaki Kondo; Masaaki Nakabayashi; Masaki Yamabe; Kenji Sugishima
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Electrical and SEM testing of absorber defectivity in the plated-gold process for x-ray masks
Author(s): Arnold W. Yanof; William J. Dauksher; Jack Livingston; L. Genduso
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Effects of absorber topography and multilayer coating defects on reflective masks for soft x-ray/EUV projection lithography
Author(s): Khanh B. Nguyen; Alfred K. K. Wong; Andrew R. Neureuther; David T. Attwood Jr.
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X-ray mask metrology: the development of linewidth standards for x-ray lithography
Author(s): Michael T. Postek Jr.; Jeremiah R. Lowney; Andras E. Vladar; William J. Keery; Egon Marx; Robert D. Larrabee
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Properties of thin SiC membrane for x-ray mask
Author(s): Tsutomu Shoki; Hiroyuki Nagasawa; Hiroyuki Kosuga; Yoichi Yamaguchi; Noromichi Annaka; Isao Amemiya; Osamu Nagarekawa
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Accelerated radiation damage testing of x-ray mask membrane materials
Author(s): Philip A. Seese; Kevin D. Cummings; Douglas J. Resnick; Arnold W. Yanof; William A. Johnson; Gregory M. Wells; John P. Wallace
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Achieving superior MEBES performance through the use of SPC programs and state-of-the-art facilities
Author(s): Linda A. Braz
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Comparative study of MEBES III and CORE 2564 performance in a manufacturing environment
Author(s): Theron L. Felmlee; Vijaya N.V. Raghavan
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Optimization of low-voltage electron optics
Author(s): Laurence S. Hordon; Zhirong Huang; Raymond Browning; Nadim I. Maluf; Roger Fabian W. Pease
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Development of a polycapillary collimator for point-source x-ray lithography
Author(s): Michael H. Vartanian; David M. Gibson; Robert D. Frankel; Jerry P. Drumheller
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