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PROCEEDINGS VOLUME 11323

Extreme Ultraviolet (EUV) Lithography XI
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Volume Details

Volume Number: 11323
Date Published: 13 April 2020

Table of Contents
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Front Matter: Volume 11323
Author(s): Proceedings of SPIE
High-NA EUV lithography exposure tool: program progress
Author(s): Jan Van Schoot; Eelco van Setten; Kars Troost; Sjoerd Lok; Judon Stoeldraijer; Rudy Peeters; Jos Benschop; Joerg Zimmerman; Paul Graeupner; Lars Wischmeier; Peter Kuerz; Winfried Kaiser
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High-NA EUV lithography optics becomes reality
Author(s): Lars Wischmeier; Paul Graeupner; Peter Kuerz; Winfried Kaiser; Jan van Schoot; Joerg Mallmann; Joost de Pee; Judon Stoeldraijer
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Perspectives and tradeoffs of novel absorber materials for high NA EUV lithography (Conference Presentation)
Author(s): Andreas Erdmann; Hazem Mesilhy; Peter Evanschitzky; Vicky Philipsen; Frank Timmermans; Markus Bauer
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Lithographic pattern formation in the presence of aberrations in anamorphic optical systems
Author(s): Zac A. Levinson; Bruce W. Smith
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How we are making the 0.5-NA Berkeley mirco-field exposure tool stable and productive
Author(s): Chris Anderson; Arnaud Allezy; Weilun Chao; Lucas Conley; Carl Cork; Will Cork; Rene Delano; Jason DePonte; Michael Dickinson; Geoff Gaines; Jeff Gamsby; Eric Gullikson; Gideon Jones; Lauren McQuade; Ryan Miyakawa; Patrick Naulleau; Seno Rekawa; Farhad Salmassi; Brandon Vollmer; Daniel Zehm; Wenhua Zhu
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Progress in EUV resists status towards high-NA EUV lithography
Author(s): Xiaolong Wang; Li-Ting Tseng; Timothee Allenet; Iacopo Mochi; Michaela Vockenhuber; Chia-Kai Yeh; Lidia van Lent-Protasova; Jara Garcia Santaclara; Rolf Custers; Yasin Ekinci
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Calibration of a MOx-specific EUV photoresist lithography model
Author(s): Craig D. Needham; Amrit Narasimhan; Ulrich Welling; Lawrence S. Melvin III; Peter De Schepper; Joren Wouters; Joren Severi; Danilo De Simone; Stephen Meyers
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Cluster of correlated reactions as a cause for various types of stochastic defects in extreme ultraviolet lithography
Author(s): Hiroshi Fukuda
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Modeling photon, electron, and chemical interactions in a model hafnium oxide nanocluster EUV photoresist
Author(s): Patrick L. Theofanis; James M. Blackwell; Marie E. Krysak; Florian Gstrein
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On the dependencies of the stochastic patterning-failure cliffs in EUVL lithography
Author(s): P. De Bisschop; E. Hendrickx
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Prediction of EUV stochastic microbridge probabilities by lithography simulations
Author(s): Erik Verduijn; Ulrich Welling; Jiuzhou Tang; Hans-Jürgen Stock; Ulrich Klostermann; Wolfgang Demmerle; Peter De Bisschop
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Probability prediction of EUV process failure due to resist-exposure stochastic: applications of Gaussian random fields excursions and Rice's formula
Author(s): Azat Latypov; Gurdaman Khaira; Germain Fenger; John Sturtevant; Chih-I Wei; Peter De Bisschop
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High-Z metal-based underlayer patterning for improving EUV stochastics (Conference Presentation)
Author(s): Anuja De Silva; Jennifer Church; Dominik Metzler; Luciana Meli; Nelson M. Felix; Phil Friddle; Bhaskar Nagabhirava; Siva Kanakasabapathy; Rich Wise
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Fundamental characterization of stochastic variation for improved single-expose EUV patterning at aggressive pitch
Author(s): Jennifer Church; Luciana Meli; Jing Guo; Martin Burkhardt; Chris Mack; Anuja DeSilva; Karen Petrillo; Mary Breton; Ravi Bonam; Romain Lallement; Eric Miller; Brad Austin; Shravan Matham; Nelson Felix
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Leveraging sub-E0 dose assessment methodology to improve EUV lithography cluster dose performance
Author(s): Chris Robinson; Cody Murray; Luciana Meli; Anuja De Silva; Dario Goldfarb; Conor Thomas; Madhana Sunder; Mary Ann Zaitz; Guoda Lian; Yiping Yao; Leo Tai; Jay Bunt; Jim Rosa; Malik Ali; Steven Boettcher; Mark Stalter
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EUVL mask process development and verification using advanced modeling and characterization techniques
Author(s): Michael Green; Romain Lallement; Mohamed Ramadan; Derren Dunn; Henry Kamberian; Stuart Sieg; Young Ham; Chris Progler
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Novel monitoring of EUV litho cluster for manufacturing insertion
Author(s): Vincent Truffert; Kit Ausschnitt; Vineet V. Nair; Koen D'Havé
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Extending EUV lithography for DRAM applications
Author(s): Gijsbert Rispens; Claire Van Lare; Dorothe Oorschot; Rik Hoefnagels; Shih-Hsiang Liu; Willem Van Mierlo; Nadia Zuurbier; Zoi Dardani; Ziyang Wang; Mark John Maslow; Jo Finders; Roberto Fallica; Andreas Frommhold; Eric Hendrickx; Ardavan Niroomand; Scott Light
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Strategies for aggressive scaling of EUV multi-patterning to sub-20 nm features
Author(s): Ashim Dutta; Jennifer Church; Joe Lee; Brendan O’Brien; Luciana Meli; Chi Chun Liu; Saumya Sharma; Karen Petrillo; Cody Murray; Eric Liu; Katie Lutker-Lee; Qiaowei Lou; Chris Cole; Angélique Raley; Akiteru Ko; Subhadeep Kal; Jake Kaminsky; Aelan Mosden; Henan Zhang; Shan Hu; Lior Huli; Naoki Shibata; Dave Hetzer; Chia-Yun (Sharon) Hsieh
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Progress in availably of NXE:3400B EUVL sources in the field and power scaling towards 500W (Conference Presentation)
Author(s): David C. Brandt; Igor Fomenkov; Jayson Stewart
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Challenge of >300W high power LPP-EUV source with long collector mirror lifetime for semiconductor HVM
Author(s): Hakaru Mizoguchi; Hiroaki Nakarai; Tamotsu Abe; Hiroshi Tanaka; Yukio Watanabe; Tsukasa Hori; Yutaka Shiraishi; Tatsuya Yanagida; Georg Soumagne; Tsuyoshi Yamada; Takashi Saitou
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Understanding EUV-induced plasma and application to particle contamination control in EUV scanners
Author(s): Mark van de Kerkhof; Andrei Yakunin; Vladimir Kvon; Ferdi van de Wetering; Selwyn Cats; Luuk Heijmans; Andrey Nikipelov; Adam Lassise; Vadim Banine
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EUV mask infrastructure and actinic pattern mask inspection
Author(s): Ted Liang; Yoshihiro Tezuka; Marieke Jager; Kishore Chakravorty; Safak Sayan; Eric Frendberg; Srinath Satyanarayana; Firoz Ghadiali; Guojing Zhang; Frank Abboud
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Development of high reflective phase shift type absorber for future generation EUV mask blank (Conference Presentation)
Author(s): Yohei Ikebe; Osamu Nozawa; Takahiro Onoue
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Directional and selective patterning of Ni for next generation EUV absorber (Conference Presentation)
Author(s): Xia Sang; Jane P. Chang
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Mask characterization studies of new alternative thin EUV absorber (Conference Presentation)
Author(s): Henry H. Kamberian
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EUV mask polarization effects on sub-7nm node imaging
Author(s): Lilian Neim; Bruce W. Smith; Germain Fenger
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Quantitative phase retrieval for EUV photomasks
Author(s): Stuart Sherwin; Isvar Cordova; Ryan Miyakawa; Laura Waller; Andrew Neureuther; Patrick Naulleau
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Pathfinding the perfect EUV mask: the role of the multilayer
Author(s): H. Mesilhy; P. Evanschitzky; G. Bottiglieri; E. van Setten; T. Fliervoet; A. Erdmann
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Machine learning techniques for OPC improvement at the sub-5 nm node
Author(s): Changsoo Kim; Seungjong Lee; Sangwoo Park; No-Young Chung; Jungmin Kim; Narae Bang; Sanghwa Lee; SooRyong Lee; Robert Boone; Pengcheng Li; Jiyoon Chang; Xinxin Zhou; YoungMi Kim; MinSu Oh; Minsung Kim; Rachit Gupta; Jun Ye; Stanislas Baron
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Rigorous stochastic lithography modelling for defectivity reduction in EUV single expose patterning (Conference Presentation)
Author(s): Ulrich Welling
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Advanced characterization techniques for nanoscale photoresist structure (Conference Presentation)
Author(s): Miquel Salmeron
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One metric to rule them all: new k4 definition for photoresist characterization
Author(s): J. G. Santaclara; B. Geh; A. Yen; T. A. Brunner; D. De Simone; J. Severi; G. Rispens
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EUV sensitization mechanisms of carboxylic acids used as ligands of metal oxide nanocluster resists (Conference Presentation)
Author(s): Takahiro Kozawa; Yusa Muroya
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Measurement of latent image in resist using scanning probe techniques
Author(s): Luke T. Long; Andrew R. Neureuther; Patrick P. Naulleau
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Determination of secondary electron attenuation length to characterize electron blur (Conference Presentation)
Author(s): Oleg Kostko; Jonathan Ma; Patrick Naulleau
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An application study on the stochastic effect of EUV photons
Author(s): Jongsu Kim; Hyekyoung Jue; Hyungju Ryu; Sang-Jin Kim; Joon-Soo Park; Kyoungsub Shin; Ulrich Welling; Jürgen Preuninger; Ulrich Klostermann; Hans-Jürgen Stock; Wolfgang Demmerle; Eun-Soo Jeong; Sang-Yil Chang; Jung-Hoe Choi
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Excitation selectivity in model tin-oxo resist: a computational chemistry perspective
Author(s): Jonathan H. Ma; Han Wang; David Prendergast; Andrew Neureuther; Patrick Naulleau
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The EUV CNT pellicle: balancing material properties to optimize performance
Author(s): Ivan Pollentier; Marina Y. Timmermans; Cedric Huyghebaert; Steven Brems; Emily E. Gallagher
Show Abstract
Quantitative phase imaging of EUV masks
Author(s): Ryan H. Miyakawa; Stuart Shwerwin; Wenhua Zhu; Markus Benk; Patrick Naulleau
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Illumination control in lensless imaging for EUV mask inspection and review
Author(s): Iacopo Mochi; Hyun-Su Kim; Uldis Locans; Atoosa Dejkameh; Ricarda Nebling; Dimitrios Kazazis; Yasin Ekinici
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Optical defect inspection solution for EUV stochastics detection
Author(s): Vidyasagar Anantha; Raghav Babulnath; Veikunth Kannan; Garima Sharma; Shubham Kumar; Kaushik Sah; Andrew Cross; Rahul Lakhawat; Hari Pathangi; Peter De Bisschop
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Enabling EUVL high-volume manufacturing with actinic patterned mask inspection
Author(s): Anna Tchikoulaeva; Hiroki Miyai; Tsunehito Kohyama; Kiwamu Takehisa; Haruhiko Kusunose
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Simulation investigation of enabling technologies for EUV single exposure of Via patterns in 3nm logic technology
Author(s): Weimin Gao; Tsann-Bim Chiou; Shih-En Tseng; Pieter Wöltgens; Moyra K. McManus; Nak Seong; Anthony Yen
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Resistless EUV lithography: patterning with EUV-induced surface reactions (Conference Presentation)
Author(s): Li-Ting Tseng; Dimitrios Kazazis; Procopios Constantinou; Taylor Stock; Neil Curson; Steven Schofield; Gabriel Aeppli; Yasin Ekinci
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Projecting EUV photo-speeds for future logic nodes
Author(s): Mark Neisser; Harry J. Levinson
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Probing buried structures in Inorganic-organic hybrid resists with energy-tunable X-rays (Conference Presentation)
Author(s): Isvar A. Cordova; Luke Long; Guillaume Freychet; Cheng Wang; P. Naulleau
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Novel high-contrast phase-shifting masks for EUV interference lithography
Author(s): B. Lüttgenau; S. Brose; S. Danylyuk; J. Stollenwerk; P. Loosen
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Application of alternative developer solutions for EUV lithography
Author(s): Julius Joseph Santillan; Masahiko Harumoto; Harold Stokes; Chisayo Mori; Yuji Tanaka; You Arisawa; Tomohiro Motono; Masaya Asai; Toshiro Itani
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Additional real-time diagnostics on the EBL2 EUV exposure facility
Author(s): Peter van der Walle; Jetske Stortelder; Chien-Ching Wu; Henk Lensen; Norbert Koster
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Spectral purity performance of high-power EUV systems
Author(s): Mark van de Kerkhof; Fei Liu; Marieke Meeuwissen; Xueqing Zhang; Robert de Kruif; Natalia Davydova; Guido Schiffelers; Felix Wählisch; Eelco van Setten; Wouter Varenkamp; Kees Ricken; Laurens de Winter; John McNamara; Muharrem Bayraktar
Show Abstract
Defect improvement for an EUV process
Author(s): Masahiko Harumoto; Harold Stokes; Shu Hao Chang; Moeen Ghafoor; Brian Cardineau; Jason K. Stowers; Michael Kocsis; Stephen T. Meyers; Pieter Vanelderen; Saika Muntaha Bari
Show Abstract
Compact modeling to predict and correct stochastic hotspots in EUVL
Author(s): Zachary Levinson; Yudhishthir Kandel; Yunqiang Zhang; Qiliang Yan; Makoto Miyagi; Xiaohai Li; Kevin Lucas
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A plausible approach for actinic patterned mask inspection using coherent interferometric imaging
Author(s): Steven M. Ebstein
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Impact of EUV resist thickness on local critical dimension uniformities for <30 nm CD via patterning
Author(s): B. Vincent; M. J. Maslow; J. Bekaert; M. Mao; J. Ervin
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Update of development progress of the high power LPP-EUV light source using a magnetic field
Author(s): Gouta Niimi; Shinji Nagai; Tsukasa Hori; Yoshifumi Ueno; Tatsuya Yanagida; Kenichi Miyao; Hideyuki Hayashi; Yukio Watanabe; Tamotsu Abe; Hiroaki Nakarai; Takashi Saito; Hakaru Mizoguchi
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Analysis of trade-off relationships between resolution, line edge roughness, and sensitivity in extreme ultraviolet lithography using machine learning
Author(s): Kazuki Azumagawa; Takahiro Kozawa
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CLEAN TRACK solutions for defectivity and CD control towards 5 nm and smaller nodes
Author(s): Arnaud Dauendorffer; Takahiro Shiozawa; Keisuke Yoshida; Noriaki Nagamine; Yuya Kamei; Shinichiro Kawakami; Satoru Shimura; Kathleen Nafus; Akihiro Sonoda; Philippe Foubert
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Realization of thermally stable transmissive optical elements for the EUV wavelength range
Author(s): G. Hergenhan; J. Taubert; D. Grimm; M. Tilke; M. Panitz; C. Ziener
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Impact of flare on source mask optimization in EUVL for 7nm technology node
Author(s): Lisong Dong; Rui Chen; Taian Fan; Rongbo Zhao; Yayi Wei; Jianjun Jia; Zac Levinson; Thuc Dam; Jay Lee; Yongdong Wang; Larry Melvin
Show Abstract
EUV OPC methodology for beyond 20nm memory cell by simulation data
Author(s): Jiunhau Fu; Chiang Lin Shih; Chun Cheng Liao; Eric Huang; Elsley Tan; John Tsai; Ming Yun Chen; Yuan Pin Liao; Seung Hee Baek
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Compressive sensing method for EUV source optimization using different bases
Author(s): Jiaxin Lin; Lisong Dong; Taian Fan; Xu Ma; Rui Chen; Xiaoran Zhang; Hans-Juergen Stock; Yayi Wei
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Particle contamination control by application of plasma
Author(s): Job Beckers; Boy van Minderhout; Paul Blom; Gerrit Kroesen; Ton Peijnenburg
Show Abstract
Intersecting the Quantum Future and the Semiconductor Industry (Conference Presentation)
Author(s): Bryan M. Barnes; Erik R. Hosler; R. Joseph Kline
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EUV Lithography Perspective: from the beginning to HVM (Conference Presentation)
Author(s): Nelson M. Felix; David T. Attwood Jr.
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A toast to Lithography's past: what we learned from technologies not used in HVM (Conference Presentation)
Author(s): Chris A. Mack; Harry J. Levinson
Show Abstract
ASML EUV Pioneers Photo Montage
Author(s):
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