Share Email Print
cover

PROCEEDINGS VOLUME 10587

Optical Microlithography XXXI
Editor(s): Jongwook Kye
For the purchase of this volume in printed format, please visit Proceedings.com

Volume Details

Volume Number: 10587
Date Published: 23 May 2018

Table of Contents
show all abstracts | hide all abstracts
Front Matter: Volume 10587
Author(s): Proceedings of SPIE
Advances in MOEMS technologies for high quality imaging systems
Author(s): Harald Schenk; Michael Wagner; Jan Grahmann; André Merten
Show Abstract
Co-optimization of exposure dose and etch process for SAQP pitch walk control
Author(s): Mark John Maslow; Vadim Timoshkov; Ton Kiers; Tae Kwon Jee; Liesbeth Reijnen; Kaushik Kumar; Marc Demand; Carlos Fonseca; Florin Cerbu; Guillaume Schelcher; Christophe Beral
Show Abstract
Tunable bandwidth for application-specific SAxP process enhancement
Author(s): Paolo Alagna; Will Conley; Greg Rechtsteiner; Kathleen Nafus; Serge Biesemans; Gian Francesco Lorusso
Show Abstract
High-fidelity lithography against stochastic effects (Conference Presentation)
Author(s): Zhimin Zhu; Amanda G. Riojas; Trisha May
Show Abstract
Roughness power spectral density as a function of resist parameters and its impact through process
Author(s): Charlotte Cutler; James W. Thackeray; Jason DeSisto; John Nelson; Choong-Bong Lee; Mingqi Li; Emad Aqad; Xisen Hou; Tomas Marangoni; Joshua Kaitz; Rochelle Rena; Chris Mack
Show Abstract
Line edge roughness reduction for 7nm metals
Author(s): Zheng Chen; Steven McDermott; Christopher Ordonio; Ao Chen; Bradley Morgenfeld; Geng Han
Show Abstract
Cross-platform (NXE-NXT) machine-to-machine overlay matching supporting next node chip manufacturing
Author(s): Theo Thijssen; Marcel Beckers; Albert Mollema; Leon Levasier; Alexander Padi; Chia-Wei Hung; Hsiao-Lan Chen; Laurens van Bokhoven; Niels Lammers; Jean Phillippe van Damme; Floris Teeuwisse; Robin Tijssen; Wilson Tzeng; Cathy Wang; Marcel Mastenbroek; Harald Vos; Ting-Ju Yueh; Miao-Chi Chen ; Hsueh-Hung Wu; Shin-Rung Peng; Chun-Kuang Chen; L. J. Chen ; Kevin Cheng; John Lin
Show Abstract
Overlay control for 7nm technology node and beyond
Author(s): Nyan Aung; Woong Jae Chung; Pavan Samudrala; Haiyong Gao; Wenle Gao; Darius Brown; Guanchen He; Bono Park; Michael Hsieh; Xueli Hao; Yen-Jen Chen; Yue Zhou; DeNeil Park; Karsten Gutjahr; Ian Krumanocker; Kevin Jock; Juan Manuel Gomez
Show Abstract
Smart overlay metrology pairing adaptive deep learning with the physics-based models used by a lithographic apparatus
Author(s): Chan Hwang; Seung Yoon Lee; SeungHwa Oh; Emil Schmitt-Weaver; Jeonghyun Park; Daniel Park; Mohamed El Kodadi; Kaustuve Bhattacharyya
Show Abstract
Reduction in overlay error from mark asymmetry using simulation, ORION, and alignment models
Author(s): Boris Menchtchikov; Robert Socha; Chumeng Zheng; Sudhar Raghunathan; Igor Aarts; Krishanu Shome; Jonathan Lee; Chris de Ruiter; Manouk Rijpstra; Henry Megens; Ralph Brinkhof; Floris Teeuwisse; Leendertjan Karssemeijer; Irina Lyulina; Chung-Tien Li; Jan Hermans; Philippe Leray
Show Abstract
Model-based correction for local stress-induced overlay errors
Author(s): Ian Stobert; Subramanian Krishnamurthy; Hongbo Shi; Scott Stiffler
Show Abstract
Analysis of hotspots that impact defectivity from light source bandwidth variation using Lithography Manufacturability Checker (LMC) (Conference Presentation)
Author(s): Will Conley; Yi-Hsing Peng; Xiaolong Zhang; Stephen Hsu; Raphael La Greca
Show Abstract
Hot spot variability and lithography process window investigation by CDU improvement using CDC technique
Author(s): Thomas Thamm; Bernd Geh; Marija Djordjevic Kaufmann; Rolf Seltmann; Alla Bitensky; Martin Sczyrba; Aravind Narayana Samy
Show Abstract
Freeform mask optimization using advanced image based M3D inverse lithography and 3D-NAND full chip OPC application
Author(s): Yaobin Feng; Zhiyang Song; Moran Guo; Jun He; Longxia Guo; Gang Xu; Sam Liu; Jingjing Liu; Stephen Hsu; Austin Peng; Andy Yang; Rachit Gupta ; Junwei Lu; Victor Peng; Jun Wang; Xiaolong Shi; Leon Liu; Rafael Howell; Cuiping Zhang ; Zero Li; Ning-ning Jia
Show Abstract
Deep learning assisted fast mask optimization
Author(s): Song Lan; Jun Liu; Yumin Wang; Ke Zhao; Jiangwei Li
Show Abstract
Constraint approaches for some inverse lithography problems with pixel-based mask
Author(s): Sergey Kobelkov; Victoria Roizen; Sergei Rodin; Alexander Tritchkov; JiWan Han; Yuri Granik
Show Abstract
Exploration of resist effect in source mask optimization
Author(s): Ao Chen; Yee Mei Foong; Jae Yeol Maeng; Nikhil Jain; Steve McDermott
Show Abstract
Model based cell-array OPC development for productivity improvement in memory device fabrication
Author(s): Ahmed Seoud; Sherif Hany; Juhwan Kim; Jebum Yoon; Boram Jung; Sang-Jin Oh; Byoung-Sub Nam; Seyoung Oh; Chan-Ha Park
Show Abstract
Model-assisted template extraction SRAF application to contact holes patterns in high-end flash memory device fabrication
Author(s): Ahmed Seoud; Juhwan Kim; Yuansheng Ma; Srividya Jayaram; Le Hong; Gyu-Yeol Chae; Jeong-Woo Lee; Dae-Jin Park; Hyoung-Soon Yune; Se-Young Oh; Chan-Ha Park
Show Abstract
Rigorous ILT optimization for advanced patterning and design-process co-optimization
Author(s): Kosta Selinidis; Bernd Kuechler; Howard Cai; Kyle Braam; Wolfgang Hoppe; Vitaly Domnenko; Amyn Poonawala; Guangming Xiao
Show Abstract
Efficient full-chip SRAF placement using machine learning for best accuracy and improved consistency
Author(s): Shibing Wang; Stanislas Baron; Nishrin Kachwala; Chidam Kallingal; Dezheng Sun; Vincent Shu; Weichun Fong; Zero Li; Ahmad Elsaid; Jin-Wei Gao; Jing Su; Jung-Hoon Ser; Quan Zhang; Been-Der Chen; Rafael Howell; Stephen Hsu; Larry Luo; Yi Zou; Gary Zhang; Yen-Wen Lu; Yu Cao
Show Abstract
Inverse lithography OPC correction with multiple patterning and etch awareness
Author(s): Heon Choi; Ayman Hamouda
Show Abstract
Thread scheduling for GPU-based OPC simulation on multi-thread
Author(s): Heejun Lee; Sangwook Kim; Jisuk Hong; Sooryong Lee; Hwansoo Han
Show Abstract
A model-based approach for the scattering-bar printing avoidance
Author(s): Yaojun Du; Liang Li; Jingjing Zhang; Feng Shao; Christian Zuniga; Yunfei Deng
Show Abstract
A novel processing platform for post tape out flows
Author(s): Hien T. Vu; Soohong Kim; James Word; Lynn Y. Cai
Show Abstract
Sub-micron lines patterning into silica using water developable chitosan bioresist films for eco-friendly positive tone e-beam and UV lithography
Author(s): Mathieu Caillau; Céline Chevalier; Pierre Crémillieu; Thierry Delair; Olivier Soppera; Benjamin Leuschel; Cédric Ray; Christophe Moulin; Christian Jonin; Emmanuel Benichou; Pierre-François Brevet; Christelle Yeromonahos; Emmanuelle Laurenceau; Yann Chevolot; Jean-Louis Leclercq
Show Abstract
SEM contour based metrology for microlens process studies in CMOS image sensor technologies
Author(s): Amine Lakcher; Alain Ostrovsky; Bertrand Le-Gratiet; Ludovic Berthier; Laurent Bidault; Julien Ducoté; Clémence Jamin-Mornet; Etienne Mortini; Maxime Besacier
Show Abstract
'Double' displacement Talbot lithography: a new approach for periodic nanostructure patterning (Conference Presentation)
Author(s): Pierre Chausse; Philip A. Shields
Show Abstract
Mask-aligner Talbot lithography using a 193nm CW light source
Author(s): Andreas Vetter; Raoul Kirner; Dmitrijs Opalevs; Matthias Scholz; Patrick Leisching; Toralf Scharf; Wilfried Noell; Carsten Rockstuhl; Reinhard Voelkel
Show Abstract
Enhancement of ArF immersion scanner system for advanced device node manufacturing
Author(s): Yujiro Hikida; Akira Hayakawa; Yoshihiro Teshima; Tomonori Dosho; Noriaki Kasai; Yasushi Yoda; Kazuo Masaki; Yuichi Shibazaki
Show Abstract
Advanced light source technologies for memory and logic processes (Conference Presentation)
Author(s): Theodore Cacouris; Josh Thornes; Marc Sells; Aleks Simic; Will Conley
Show Abstract
The illumination design of UV LED array for lithography
Author(s): Jiun-Woei Huang
Show Abstract
Next-generation ArF laser technologies for multiple-patterning immersion lithography supporting leading edge processes
Author(s): Hirotaka Miyamoto; Hiroshi Furusato; Keisuke Ishida; Hiroaki Tsushima; Akihiko Kurosu; Hiroshi Tanaka; Takeshi Ohta; Satoru Bushida; Takashi Saito; Hakaru Mizoguchi
Show Abstract
Characterization of absorptance and thermally induced wavefront deformations in DUV lithography optics (Conference Presentation)
Author(s): Klaus Mann; Uwe Leinhos; Bernd Schäfer
Show Abstract
New open platform software for monitoring lithography process of semiconductor manufacturing
Author(s): Yutaka Igarashi; Satoru Kikuchi; Levi Jordan; Kunihiko Abe; Yuji Minegishi
Show Abstract
Tailing-edge technology applications like broader E95 approach into the cutting edge DUV light source for tool matching on the ArFi lithography (Conference Presentation)
Author(s): Toshihiro Oga; Kenji Takahisa; Takeshi Ohta
Show Abstract
A novel method to fast fix the post OPC weak-points through Calibre eqDRC application
Author(s): YaDong Jin; Shizhi Lyu; ZeXi Deng; Cong Lu
Show Abstract
DUV light source sustainability achievements and next steps
Author(s): Yzzer Roman; Ted Cacouris; Kumar Raja Guvindan Raju; Dinesh Kanawade; Walt Gillespie; Siqi Luo; Eric Mason; David Manley; Saptaparna Das
Show Abstract
The optical design of 3D ICs for smartphone and optro-electronics sensing module
Author(s): Jiun-Woei Huang
Show Abstract
Improving 130nm node patterning using inverse lithography techniques for an analog process
Author(s): Can Duan; Scott Jessen; David Ziger; Mizuki Watanabe; Steve Prins; Chi-Chien Ho; Jing Shu
Show Abstract
The method of optimizing mask parameter suitable for lithography process
Author(s): Jianfang He; Lisong Dong; Libin Zhang; Lijun Zhao; Yayi Wei; Tianchun Ye
Show Abstract
Efficient level-set based mask optimization with a vector imaging model
Author(s): Yijiang Shen
Show Abstract
The partial coherence modulation transfer function in testing lithography lens
Author(s): Jiun-Woei Huang
Show Abstract
Optical design of objectives for reducing photolithography
Author(s): Dmitry N. Frolov; Olga A. Vinogradova; Vladimir N. Frolov; Pavel S. Vakulov
Show Abstract
Enabling proximity mask-aligner lithography with a 193nm CW light source
Author(s): Raoul Kirner; Andreas Vetter; Dmitrijs Opalevs; Matthias Scholz; Patrick Leisching; Toralf Scharf; Wilfried Noell; Carsten Rockstuhl; Reinhard Voelkel
Show Abstract
In-resist pattern shift metrology
Author(s): Anita Bouma; Bart Smeets; Lei Zhang; Thuy T. T. Vu; Peter de Loijer; Maikel Goosen; Willem van Mierlo; Wendy Liebregts; Bart Rijpers
Show Abstract
Inverse lithography recipe optimization using genetic algorithm
Author(s): Le Hong; Fan Jiang; Alexander Tritchkov; James Word; Dan Zhang
Show Abstract
A novel positive tone development method for defect reduction in the semiconductor 193nm immersion lithography process
Author(s): Li Li; Tafsirul Islam; Xuan Liu; David Conklin
Show Abstract
Extremely long life excimer laser technology for multi-patterning lithography
Author(s): Yousuke Fujimaki; Makoto Tanaka; Takashi Itou; Hirotaka Miyamoto; Miwa Igarashi; Hiroaki Tsushima; Takeshi Asayama; Takahito Kumazaki; Akihiko Kurosu; Takeshi Ohta; Satoru Bushida; Hakaru Mizoguchi
Show Abstract
Prediction of lens heating induced aberration via particle filter in optical lithography
Author(s): Yanjie Mao; Sikun Li; Gang Sun; Lifeng Duan; Weijie Shi; Yang Bu; Xiangzhao Wang
Show Abstract
OPC model accuracy enhancement for asymmetrical layouts by incorporating 2D contour extraction methodology
Author(s): Cheng-Huei Lin; Che-Ming Hu; Fred Lo; Elvis Yang; Ta-Hone Yang; K.C. Chen
Show Abstract
Evaluation of resist molds formed for fabricating micro-lens arrays and practicability of replicated epoxy resin lenses
Author(s): Toshiyuki Horiuchi; Noa Kobayashi; Ryunosuke Sasaki
Show Abstract

© SPIE. Terms of Use
Back to Top