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PROCEEDINGS VOLUME 10274

Handbook of Critical Dimension Metrology and Process Control: A Critical Review
Editor(s): Kevin M. Monahan

*This item is only available on the SPIE Digital Library.


Volume Details

Volume Number: 10274
Date Published: 1 July 1994

Table of Contents
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Front Matter: Volume 10274
Author(s): Proceedings of SPIE
Parameters characterizing the measurement of a critical dimension
Author(s): Robert D. Larrabee; Michael T. Postek Jr.
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Benchmark procedures for CD measurement system evaluation
Author(s): Kevin M. Monahan
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Scanning electron microscope metrology
Author(s): Michael T. Postek Jr.
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Microelectronic test structures for feature placement and electrical linewidth metrology
Author(s): Loren W. Linholm; Richard A. Allen; Michael W. Cresswell
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Accuracy in integrated circuit dimensional measurements
Author(s): James Potzick
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Machine models and registration
Author(s): Terrence E. Zavecz
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Semiconductor pattern overlay
Author(s): Neal T. Sullivan
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Particle metrology for microelectronics
Author(s): Marylyn Hoy Bennett
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Semiconductor process control
Author(s): Lynda C. Hannemann-Mantalas; Harry J. Levinson
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Metrology models and simulation
Author(s): Mark Davidson
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Sampling considerations for semiconductor manufacture
Author(s): Scott M. Ashkenaz
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Pareto charts for defect analysis with correlation of inline defects to failed bitmap data
Author(s): Louis Breaux; Dave Kolar; Robyn Sue Coleman
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