Share Email Print


Integrated Circuit Metrology, Inspection, and Process Control II
Editor(s): Kevin M. Monahan

*This item is only available on the SPIE Digital Library.

Volume Details

Volume Number: 0921
Date Published: 1 January 1988

Table of Contents
show all abstracts | hide all abstracts
Technologies For Automated In-Process E-Beam Metrology
Author(s): Israel Nadler-Niv; Uriel Halavee
Show Abstract
Linewidth Measurement By Low Voltage SEM
Author(s): Bhanwar Singh; William H Arnold
Show Abstract
Recent Results From A High Thruput, In-Line Metrology SEM
Author(s): Karl L Harris; Sakae Miyauchi; Takao Namae
Show Abstract
A New Approach To Image Modeling And Edge Detection In The SEM
Author(s): D. Nyyssonen
Show Abstract
SCM Simulation Of Secondary Electron Signals Detected By MCP
Author(s): Ryoh Mimura; Atsushi Yamada; Ryuso Aihara; Mike Hassel Shearer; William Thompson
Show Abstract
Stepper Lens Characterization Using A Field Emission SEM
Author(s): Mike Tipton; Marylyn Hoy Bennett; Jim Pollard; Jack Smith; Ricky Jackson
Show Abstract
Particle Detection By Low Voltage SEM
Author(s): Paul Buysse; Fedor Coopmans
Show Abstract
Laser Scanning Optical Inspection And Metrology
Author(s): R. W. Wijnaendts-van-Resandt; Th. Zapf; M. Fangerau; R. Piepenstock
Show Abstract
Confocal Optical Metrology At 325nm
Author(s): Simon D. Bennett; Eric A. Peltzer; Joan McCall; Richard DeRosa; Ian R. Smith
Show Abstract
Optical Measurement Of Half Micron Critical Dimensions
Author(s): M. Hamashima; K. Kato; T. Ishizeki
Show Abstract
First Results Of A Product Utilizing Coherence Probe Imaging For Wafer Inspection
Author(s): Mark Davidson; Kalman Kaufman; Isaac Mazor
Show Abstract
New Types Of Scanning Optical Microscopes
Author(s): G. S. Kino; T. R. Corle; G. Q. Xiao
Show Abstract
Phase Detection Using Scanning Optical Microscopy
Author(s): Jozef P.H Benschop
Show Abstract
An Improved Fluorescence Technique For Optical Measurements Below One Micron
Author(s): Stephen Williams; Vincent Coates; Roger Ingalls
Show Abstract
Scan Speed Effects In Optical Beam Induced Current Imaging
Author(s): P. D. Pester; T. Wilson
Show Abstract
Metrology With An Atomic Force Microscope
Author(s): P. C.D. Hobbs; H. K. Wickramasinghe
Show Abstract
A New Reticle Set For Electrical Measurement Of Resolution, Proximity, Topography, Sidewall Spacer, And Stacked-Gate Structures
Author(s): W. L. Stevenson
Show Abstract
Electrical Measurement Of Submicrometer Contact Holes
Author(s): B. J. Lin; J. A. Underhill; D. Sundling; B. Peck
Show Abstract
Nanometrology And Super-Resolution Imaging Of Oxide Isolation Structures Using A Confocal Scanning Laser Microscope
Author(s): Kevin M. Monahan; James Chen
Show Abstract
Matching Performance For Multiple Wafer Steppers Using An Advanced Metrology Procedure
Author(s): M. A. van den Brink; C. G.M. de Mol; R. A. George
Show Abstract
Enhancement Of Optical Registration Signals Through Digital Signal Processing Techniques
Author(s): Daniel R. Cote; Jeanne Lazo-Wasem
Show Abstract
Analysis Of Overlay Distortion Patterns
Author(s): John D. Armitage Jr.; Joseph P. Kirk
Show Abstract
A Defect Reduction Methodology For Increased Sort Yield Using Automated Defect Inspection
Author(s): Christopher Radin
Show Abstract
Automated Defect Inspection: A Valuable Tool For Proactive Defect Control
Author(s): Michael Cherniawski; Kam-shui Chan
Show Abstract
Background Defect Density Reduction Using Automated Defect Inspection And Analysis
Author(s): Steven C. Weirauch
Show Abstract
Various Applications Of An Automated Wafer Inspection System In VLSI Manufacturing
Author(s): Kimihiro Matsuda; Isamu Takashima; Yasuo Aoki; Junichi Araki
Show Abstract
Dynamic Statistical Process Control
Author(s): Rahman Azari; Fred Khorasani; Cynthia Bickerstaff
Show Abstract
Reduction Of Critical Dimension Variability In A High Mix Environment
Author(s): James L. McNamara
Show Abstract
Characterization Of Process Variability Using Robust Data Summaries
Author(s): Michael S. Mahaney; G. Rex Bryce
Show Abstract
Statistical Design Approach To Optimized Submicron Lithography
Author(s): R. M. Lazarus; K. C. Peterson; K. A. Fischbach; L. D.H. Christensen
Show Abstract
Photolithography Expert Systems At National Semiconductor
Author(s): Pilla A. Leitner; Robert L. Brown
Show Abstract
A Precise Metrology Tool For Stepper Characterization And Monitor In The One Micron Or Sub-Micron Lithographic Environments
Author(s): Shaunee Cheng; Michael A Lutz
Show Abstract
Characterization Of Submicron Contact Holes Reproduced In Thick Resist By High Numerical Aperture Lenses
Author(s): Wei Lee; John T. Lyon; John H. McCoy; Gil L. Varnell
Show Abstract
Improvements In Photolithography Performance By Controlled Baking
Author(s): Oscar D. Crisalle; Cynthia L. Bickerstaff; Dale E. Seborg; Duncan A. Mellichamp
Show Abstract
An Experimental Method For The Minimization Of Linewidth Variation In Photoresist Patterns Over Polysilicon Topography
Author(s): John S. Petersen; Daniel J.C. Herr; Marvin A Lutz; John L Bontrager
Show Abstract
Strategy For Yield Control And Enhancement In VLSI Wafer Manufacturing
Author(s): B. Neilson; D. Rickey; R. P. Bane
Show Abstract
Automated Data Acquisition For Reduction Stepper Maintenance Control
Author(s): W. Stevenson; J. Lin; M. Zarringhalam; S. Hoeker; S. Lyle; J. Hughes
Show Abstract
Submicron Resolution Automated Track Development Processes, Part 1: Static Puddle Development
Author(s): Michael K. Templeton; James B. Wickman; Ronald L. Fischer Jr.
Show Abstract
Performance Characteristics Of An Automatic Wafer Measurement Station For Wafer Lots
Author(s): R. Eandi; D. Gruebner; W. Hunn
Show Abstract
Reliable Automatic Measurements Of Critical Dimensions Using S.E.M.
Author(s): Herve Martin; Daniel Burlet; Jean Luc Bataillon; Bruno Latombe
Show Abstract
Scanning Color Laser Microscope
Author(s): D. Awamura; T. Ode; M. Yonezawa
Show Abstract
A New Line Width Standard For Reflected Light Inspection
Author(s): Robert Monteverde; Diana Nyyssonen
Show Abstract
Displacement Measurement Repeatability In Tens Of Nanometers With Laser Interferometry
Author(s): Charles R Steinmetz
Show Abstract
An Electrical Test Structure For Routine 10Nm Reticle Overlay.
Author(s): C. M. Cork; E. G. Dobson
Show Abstract
Defect Detection And Classification Using The Euler Number
Author(s): Soo-Ik Chae; James T. Walker; Chong-Cheng Fu; R. Fabian Pease
Show Abstract
An Improved SEM Technique For Accurate Determination Of MOSFET Channel Length
Author(s): Martin P. Karnett; Robert E. Dunham
Show Abstract
Photospeed Quality Control In Photoresist Manufacturing
Author(s): Jeffrey K. Hecht; Barbara J. Brown; Edward J. Reardon
Show Abstract

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?