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Integrated Circuit Metrology, Inspection, & Process Control
Editor(s): Kevin M. Monahan

*This item is only available on the SPIE Digital Library.

Volume Details

Volume Number: 0775
Date Published: 17 April 1987

Table of Contents
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Automatic Linewidth Control System
Author(s): Laura J. Uhler
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The Application Of Contour Maps And Statistical Control Charts In Monitoring Dielectric Processes
Author(s): Alan K. Smith; Edward F. Wang
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Using SEM Stereo To Extract Semiconductor Wafer Pattern Topography
Author(s): Ali E. Kayaalp; Ramesh C. Jain
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Comparison Of Exposure Latitude For Single Layer Resist Processes
Author(s): Larry D. Hutchins
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Electrical Method Of Determining Absolute Distortion In A 1X Wafer Stepper Independent Of Stage Precision
Author(s): Robert J. Naber
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Submicrometer Optical Linewidth Metrology
Author(s): Robert D. Larrabee
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A Study Of The Instrumental Errors In Linewidth And Registration Measurements Made With An Optical Microscope.
Author(s): Chris P. Kirk
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Use Of A Confocal Scanning Laser Microscope For The Measurement Of Submicrometer Critical Dimensions
Author(s): Brian R. Stallard; Vefim Bukhman
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Analysis Of Linewidth Measurement Techniques Using The Low Voltage SEM
Author(s): M. G. Rosenfield
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Low Voltage Sem Metrology For Pilot Line Applications
Author(s): T. Ahmed; S-R. Chen; H. M. Naguib; T. A. Brunner; S. M. Stuber
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In-Process Linewidth Measurement Of Polysilicon Gates Using A Scanning Electron Microscope
Author(s): Fran Robb
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Subnanometer-Precision SEM Measurements Of Proximity Effects In Contrast-Enhanced Lithography
Author(s): Kevin M. Monahan; Michael A. Blanco
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A Contactless 3-D Measuring Technique For IC Inspection
Author(s): Bernard C. Breton; John T . L . Thong; William C. Nixon
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A High Resolution Dimensional Metrology System For Masks
Author(s): H. Becker; D. Elliott; W. Hunn
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Microscop.Yap.Piied To Cirs,Registration And Inspection
Author(s): D. Yansen; J. Sardella; F. Madison; P. Knutrud
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A High-Precision, Wide Dynamic Range CCD Based Image Acquisition System
Author(s): Robert E. Melen; Stephen Williams
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Accuracy Of Electron-Optical Measurements Of Critical Dimensions
Author(s): Edwin Trautman; Sheldon Moll; Leo Tometich
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Noise Contributions To Feature Dimension Measurement In A Scanning Electron Microscope (Sem)
Author(s): Jon R. Pearce; Duane C. Holmes
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Improved Accuracy For SEM Linewidth Measurements
Author(s): D. K. Atwood; D. C. Joy
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Submicrometer Dimensional Metrology In The Scanning Electron Microscope
Author(s): Michael T. Postek
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Model Based Inspection Of Integrated Circuit Patterns Using The Scanning Electron Microscope (Sem)
Author(s): Ali E. Kayaalp; Ramesh C. Jain
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Applications Of A High-Speed, High-Resolution Metrology System
Author(s): KarI L. Harris; Sakae Miyauchi; Takao Namae
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Characterization Of Two Level Overlay In X-Ray/Optical Stepper Mix And Match Lithography
Author(s): J. J. LaBrie; B. Fay; S. Bijawat; M. A. Blanco; K. M. Monahan; J. T. Chen; D. F. Kyser
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Differential Linewidth Structures For Overlay Measurements At 0.25 Micron Ground Rules
Author(s): C. J. Ashton
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Electrical And SEM Metrology Analyses Of Pattern Dimension Accuracy And Process Control In Direct Write Electron Beam Lithography
Author(s): Rao M. Nagarajan; Brian R. Lee; Steven D. Rask
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Plasma Etch Characterization Using Electrical Iinewidth Measuring Techniques
Author(s): Roger Patrick; Beth Arden
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Automated Submicrometer Defect Detection During VLSI Circuit Production
Author(s): John R. Dralla; John C. Hoff; Andrew H. Lee
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Automated Product Test Wafer Procedure
Author(s): Andrew Brown; Anna Minvielle; Anita Salugsugan
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An Application Of Interference Microscopy To Integrated Circuit Inspection And Metrology
Author(s): Mark Davidson; Kalman Kaufman; Isaac Mazor; Felix Cohen
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Off-Line Quality Control In Integrated Circuit Fabrication Using Experimental Design
Author(s): M. S. Phadke; R. N. Kackar; D. V. Speeney; M. J. Grieco
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An Efficient Sample/Monte Carlo Methodology For Developing Robust Photolithography Processes
Author(s): Douglas S. Thompson; Francisco A. Leon; Steven G. Duvall
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Statistical Process Control In Photolithography Applications
Author(s): Lois B. Pritchard
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Experimental Design For Photoresist Characterization
Author(s): Larry Luckock
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Use Of Expert Systems In Photolithography
Author(s): Wendy Fong; Terry B. Cline
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Sub-Micron Lithography Characterization Using An Expert System
Author(s): M. W. Cresswell; N. Pessall; R. J. Betsch; L. W. Linholm; D. J. Radack
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An Analysis Procedure For Production Linewidth Data
Author(s): Michael P. C. Watts
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Linewidth Control In Trilevel Etching
Author(s): Avi Kornblit; Michael J. Grieco; Darryl W. Peters; Thomas E. Saunders
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