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Optical Microlithography II: Technology for the 1980s
Editor(s): Harry L. Stover

*This item is only available on the SPIE Digital Library.

Volume Details

Volume Number: 0394
Date Published: 7 November 1983

Table of Contents
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"Chemical Safety In The 1980s"
Author(s): Robert L. Raleigh
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Printing Sub-Micron Features Beyond The Normal Ootical Resolution Limit Using A Multi-Level Resist Technique
Author(s): A Marsh
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Contrast Enhancement - A Route To Submicron Optical Lithography
Author(s): Paul R. West; Bruce F. Griffing
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Germanium-Selenium (Ge-Se) Based Resist Systems For Submicron VLSI Application
Author(s): E. Ong; K. L. Tai; R. G. Vadimsky; c. T. Kemmerer
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A Two Layer Photoresist Process In A Production Environment
Author(s): K. Bartlett; G. Hillis; M. Chen; R. Trutna; M. Watts
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Manual Alignment Results Using The Perkin-Elmer M341 And Electron-Beam Masks
Author(s): Alex Wat; Kong-Chen Chen
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Overlay Performance Of The Perkin-Elmer Model 500
Author(s): C. P. Ausschnitt; T. A. Brunner; D. J. Cronin
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Image Matching: A Method For Overlay Error Reduction
Author(s): Ronald E. Chappelow
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Registration Analysis Of 1/10 Steppers, 1/1 Orojections And Their Hybrid
Author(s): S. Uoya; W. Wakamiya; H. Abe; H. Nakata
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Image Placement Differences Between 1:1 Projection Aligners And 10:1 Reduction Wafer Steppers
Author(s): William H. Arnold III
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VLSI Lithography Using Canon 1:1 Wafer Stepper
Author(s): Venkat Nagaswami; Gail Ungemach; Wayne Hsueh; Murray Trudel
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Deep Ultraviolet High Resolution Lithography
Author(s): A. W. McCullough; H. Sewell
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Performance Of Merck Selectilux P Positive Photoresist In Aluminium Plasma Etching And High Current Ion Implantation
Author(s): Klaus Thiel
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New Positive Resist Designed For Use In The Mid Ultraviolet
Author(s): R. F. Leonard; W. F. Cordes III
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Edge Sharpening, Contrast Enhancement, And Feature Dependent Amplification In Inorganic Resist - A Simulation Study
Author(s): Wingyu Leung; Andrew R. Neureuther; William G. Oldham
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High Resolution Positive Resist Developers: A Technique Or Functional Evaluation And Process Optimization
Author(s): Vic Marriott
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Improved Novolak-Based Photoresist System For Very Large Scale Integration (VLSI) Lithography.
Author(s): F. P. Alvarez; D. J. Elliott; H. F. Sandford; M. W. Legenza
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A New Negative Resist For Deep UV Microlithography
Author(s): M. A. Toukhy; R. F. Leonard
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Microlithography Techniques Using A Microwave Powered Deep UV Source
Author(s): John C. Matthews; Michael G. Ury; Anthony D. Birch; Mitchell A. Lashman
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Impact Of Mask Defects On Integrated Circuits Yield
Author(s): Jacques Le Carpentier
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Yield Detraction In Simple Photoengraving
Author(s): A Marsh
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The Impact On Wafer Probe Yield Of Photomask Inspection Sensitivity
Author(s): George W. Brooks; Robert K. Meister
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Direct Mask Overlay Inspection
Author(s): Liang-Choo Hsia; Lo-Soun Su
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Automated Chrome Blank Inspection: An Investigation Of Raw Plate Defects And Finished Photomask Quality
Author(s): Dale E. Ewbank; Scott M. Ashkenaz
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A Fully Automated Pattern Inspection System For Reticles & Masks
Author(s): Ian A. Cruttwell
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Automatic Inspection For In-Aligner Reticle Qualification
Author(s): H. Liff; R. Brauner; P. Esrig; J. Fee
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Wafer Pattern Defect Detection: An Automatic Inspection Technique
Author(s): Yasushi Uchiyama; Daikichi Awamura; Katsuyoshi Nakashima
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Automatic Wafer Inspection
Author(s): K. Harris; P. Sandland; R. Singleton
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