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Submicron Lithography I
Editor(s): Phillip D. Blais

*This item is only available on the SPIE Digital Library.

Volume Details

Volume Number: 0333
Date Published: 30 June 1982

Table of Contents
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State Of The Art Of Acrylate Resists: An Overview Of Polymer Structure And Lithographic Performance
Author(s): Wayne M. Moreau
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Application Of Methyl A-Chloroacrylate Copolymers As Electron Sensitive Positive Resists
Author(s): Juey H. Lai
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New Microlithographic Resists
Author(s): Kang I. Lee; Harriet Jopson; Peter Cukor; David Shaver
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Plasma Resist Image Stabilization Technique (PRIST) Update
Author(s): William H-L Ma
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Intralevel Hybrid Resist Process With Submicron Capability
Author(s): J. N. Helbert; P. A. Seese; A. J. Gonzales; C. C. Walker
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Multilevel Ge-Se Film Based Resist Systems
Author(s): K. L. Tai; R. G. Vadimsky; E. Ong
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Quartz - The Ultimate Mask Material For Optical Lithography?
Author(s): Gilbert J. Zinsmeister
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Sources For The Production And Spectral Control Of Deep Ultraviolet Radiation
Author(s): Jerry Bachur
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Practical Deep Ultraviolet - The Multilayer Approach
Author(s): Mary L. Long
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Manufacturing Implications Of Multilevel Resist Processing
Author(s): Patrick H. Lamey, Jr.
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Metal Oxide Semiconductor (MOS) Technology Scaling Issues And Their Relation To Submicron Lithography
Author(s): Al F. Tasch Jr.
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Low Energy Electron Beam Lithography
Author(s): K. J. Polasko; Y. W. Yau; R. F. W. Pease
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Electron Beam Testing And Its Application To Packaging Modules For Very Large Scale Integrated (VLSI) Chip Arrays
Author(s): F. J. Hohn; T. H. P. Chang; D. Kern; W. Bruenger; P. Coane; M. Lindemann
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High Speed Direct Write Electron Beam System
Author(s): Frank Ura; Paul Rissman
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Shaped Beams For Integrated Circuit Fabrication
Author(s): Edward V. Weber
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X-Ray Lithography: Technology For The 1980s
Author(s): C. R. Fencil; G. P. Hughes
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X-Ray Mask Fabrication
Author(s): Daniel L. Brors
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X-Ray Lithography Applied To The Fabrication Of 1 µm N-Channel Metal Oxide Semiconductor (NMOS) Circuits
Author(s): E. N. Fuls
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X-Ray Lithography: Fabrication Of Masks And Very Large Scale Integrated (VLSI) Devices
Author(s): B. B. Triplett; S. Jones
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Application Of Zone Plates To Alignment In X-Ray Lithography
Author(s): M. Feldman; A. D. White; D. L. White
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Trends In X-Ray Lithography
Author(s): Juan R. Maldonado
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Plasma Sources For X-Ray Lithography
Author(s): S. M. Matthews; R. S. Cooper
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Resist Possibilities And Limitations In Ion Beam Lithography
Author(s): A. Macrander; D. Barr; A. Wagner
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Ion Beam Lithography System Using A High Brightness H2+ Ion Source
Author(s): Benjamin M. Siegel; Gary R. Hanson; Miklos Szilagyi; David R. Thomas; Richard J. Blackwell; Hongyul Paik
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Ion-Channelling Effects In Scanning Microscopy And Ion Beam Writing With A 60 keV Ga+ Probe
Author(s): R. Levi-Setti; T. R. Fox; K. Lam
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On The Mechanism Of The Lithographic Sensitivity Enhancement Of Obliquely Deposited Germanium Selenide Films
Author(s): T. Venkatesan; B. Wilkens
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Masked Ion Beam Lithography For Submicrometer Device Fabrication
Author(s): C. W. Slayman; J. L. Bartelt; C. M. McKenna
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