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Developments in Semiconductor Microlithography V
Editor(s): James W. Dey

*This item is only available on the SPIE Digital Library.

Volume Details

Volume Number: 0221
Date Published: 5 September 1980

Table of Contents
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Step And Repeat Wafer Imaging
Author(s): S. Wittekoek
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A New Step-By-Step Aligner For Very Large Scale Integration (VLSI) Production
Author(s): Herbert E. Mayer; Ernst W. Loebach
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Nearly Perfect Reticles For Direct Wafer Steppers
Author(s): Harry L. Coleman
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Intermachine Registration Errors of Wafer Step-and-Repeat Systems
Author(s): William C. Schneider
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Evaluation Of Deep-UV Proximity Mode Printing
Author(s): D. O. Massetti; M. A. Hockey; D. L. McFarland
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Optics In The Model 900 Projection Stepper
Author(s): Ron Hershel
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Tradeoffs Between Uniformity, Selectivity And Pattern Fidelity In Plasma Etching
Author(s): Marvin Hutt
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Dimensional Control And Profile Contouring Of Plasma Etched Polysilicon
Author(s): Steven C. Selbrede
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Characterization of Al-Si Plasma Etching And Its Affect On Metal Oxide Semiconductor (MOS) Electrical Parameters
Author(s): Barry LeBeau; Bob Wourms
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Ultrathick Photoresist Processing
Author(s): D . R . Ciarlo; N . M. Ceglio
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Macroelectronic Photolithography: I�The Optimization Of Photoresist Application By Roller Coating
Author(s): R. A. Bond; H. M. Naguib
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Optimization Of Photoresist Processing For Step-And-Repeat Exposure Systems
Author(s): T. P. Shaughnessy; R. L. Ruddell
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Registration And Wafer Distortion In The Production Environment
Author(s): J. Hester; C. Vesper; R . Cody; J E. Martin
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Characterization Of In-Plane Wafer Distortion In An N-Channel Metal Oxide Semiconductor (NMOS) Production Process
Author(s): N. H. Tsai; C. N. Ahlquist
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Feature Size Variation Of Electron Beam Exposure System (EBES) Master Masks
Author(s): M. J. Cowan; R. F. Helm
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Calibration Of Optical Systems For Linewidth Measurements On Wafers
Author(s): D. Nyyssonen
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Practical Aspects Of Automatic Mask Inspection
Author(s): Richard P. Speck
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Automatic Yield Prediction From Photomask Inspection Data
Author(s): Arthur P. Schnitzer
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Photoresist Coated Chromium-On-Glass Substrate Parameters And Their Effect On Photomask Yield
Author(s): J. E. Levine; H. C. Schick
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A Comparison Of Silver Halide Systems As Applied To Today's Advanced Semiconductor Requirements
Author(s): Paul H. Johnson; David L. Angel
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Relationship Between Micro And Macro Reproduction Characteristics Of Kodak High Resolution Plates
Author(s): Robert E. Doran
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Experimental Photoresist Sensitometry And Exposure Modeling
Author(s): Donald B. Novotny
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Goal-Oriented Process Tuning
Author(s): Mary L. Long; Michael A. Schmidt
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